IP Library Granted Patent US 8,480,991
Granted Patent B2
US 8,480,991 · App. 12/670,263 · Granted Jul 9, 2013

Use of acid washing to provide purified silicon crystals

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,480,991
App. No.
12/670,263
Granted
Jul 9, 2013
Kind
B2
Abstract

A method for purifying silicon wherein silicon is crystallized from a solvent metal. The method comprises the steps of providing a molten liquid containing silicon, a solvent metal and impurities, cooling the molten liquid to form first silicon crystals and a first mother liquor, separating the first silicon crystals from the first mother liquor, contacting the first silicon crystals with compound which will dissolve the first mother liquor and separating the washed crystals from the wash solution.

Claims (40)

1. A method for purifying metallurgical grade silicon with a phosphorous level below 60 ppmw and boron level below 15 ppmw, the method comprising:

(a) forming a first molten liquid from a source silicon and a solvent metal selected from the group of copper, tin, zinc, antimony, silver, bismuth, aluminum, cadmium, gallium, indium, magnesium, lead, an alloy thereof, and combinations thereof;

(b) contacting the first molten liquid with a first gas, such that a vortex is formed in the melt, to provide dross and a second molten liquid, wherein the first gas is selected from the group consisting of oxygen (O 2 ), nitrogen (N 2 ), helium (He), argon (Ar), hydrogen (H 2 ), sulfur hexafluoride (SF 6 ), water vapor (H 2 O), oxygen (O 2 ), carbon dioxide (CO 2 ), carbon monoxide (CO), tetrafluorosilane (SiF4), and combinations thereof;

wherein the contacting the first molten liquid with the first gas employs a gas rotary degasser, thereby creating a vortex of the second molten liquid, which effectively mixes the dross in the second molten liquid;

(c) separating the dross and the second molten liquid;

(d) cooling the second molten liquid to form first silicon crystals and a first mother liquor;

(e) separating the first silicon crystals and the first mother liquor;

(f) contacting the first silicon crystals with an acid to provide washed silicon crystals and used acid; and

(g) separating the washed silicon crystals and the used acid;

wherein the washed silicon crystals have a boron level below 3 ppmw and a phosphorous level below 9 ppmw.

2. The method of claim 1 , further comprising before forming a first molten liquid, pre-treating source silicon by slagging, gas injection, plasma torch, vacuum treatment, or a combination thereof.

3. The method of claim 1 , wherein in step (a), the first molten liquid is formed by heating above the liquidus temperature.

4. The method of claim 1 , wherein in step (a), metallurgical grade silicon is employed that includes about 5 ppm wt % to about 15 ppm wt % boron and about 30 ppm wt % to about 60 ppm wt % phosphorous.

5. The method of claim 1 , wherein in step (a), silicon is employed in about 20 wt. % to about 60 wt. %.

6. The method of claim 1 , wherein in step (a), aluminum, or an alloy thereof, is employed as the solvent metal, in about 40 wt. % to about 80 wt. %.

7. The method of claim 1 , wherein after step (a) and before step (b), the first molten liquid is cooled to above the liquidus temperature.

8. The method of claim 1 , wherein in step (d), the second molten liquid is cooled to above the solidus temperature and below the liquidus temperature.

9. The method of claim 1 , wherein the washed silicon crystals includes less than about 4 ppmw phosphorous (P) and less than about 2 ppmw boron (B).

10. A method for purifying metallurgical grade silicon with a phosphorous level below 60 ppmw and boron level below 15 ppmw, the method comprising:

(a) forming a first molten liquid from source silicon and aluminum;

(b) contacting the first molten liquid with a first gas, such that a vortex is formed in the melt, to provide dross and a second molten liquid, wherein the first gas is selected from the group consisting of oxygen (O 2 ), nitrogen (N 2 ), helium (He), argon (Ar), hydrogen (H 2 ), sulfur hexafluoride (SF 6 ), water vapor (H 2 O), oxygen (O 2 ), carbon dioxide (CO 2 ), carbon monoxide (CO), tetrafluorosilane (SiF4), and combinations thereof;

wherein the contacting the first molten liquid with the first gas employs a gas rotary degasser, thereby creating a vortex of the second molten liquid, which effectively mixes the dross in the second molten liquid;

(c) separating the dross and the second molten liquid;

(d) cooling the second molten liquid to form first silicon crystals and a first mother liquor;

(e) separating the first silicon crystals and the first mother liquor;

(f) optionally melting the first silicon crystals with a solvent metal and repeating steps (a)-(e);

(g) contacting the first silicon crystals with an acid, to provide washed silicon crystals and used acid; and

(h) separating the washed silicon crystals and the used acid, to provide purified silicon crystals;

(i) melting the purified silicon crystals, to provide a silicon melt;

(j) contacting the silicon melt with a second gas; and

(k) directionally solidifying the silicon melt; wherein the washed silicon crystals have a boron level below 3 ppmw and a phosphorous level below 9 ppmw.

11. The method of claim 10 , wherein an ingot or boule is produced.

12. The method of claim 11 , further comprising removing the top of the ingot.

13. The method of claim 11 , further comprising directionally solidifying the ingot or boule to form a multicrystalline ingot or monocrystalline boule.

14. The method of claim 1 or 10 , wherein the washed silicon crystals have a boron level below 2 ppmw, and a phosphorous level below 4 ppmw.

15. The method of claim 1 or 10 , wherein the first gas comprises at least one of helium (He), Neon (Ne), Argon (Ar) and nitrogen (N 2 ).

16. The method of claim 1 or 10 , wherein the first gas comprises bubbles of about 1 mm to about 5 mm.

17. The method of claim 1 or 10 , wherein the acid is hydrochloric (HCl).

18. The method of claim 1 or 10 , wherein at least about 240 kg of purified silicon crystals is obtained.

19. The method of claim 1 or 10 , wherein the first gas is selected from the group consisting of oxygen (O 2 ), nitrogen (N 2 ), helium (He), argon (Ar), hydrogen (H 2 ), water vapor (H 2 O), carbon dioxide (CO 2 ), carbon monoxide (CO), and combinations thereof.

Assignments (11)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2023
From: SUNNUVELLIR SLHF
To: HIGHLAND MATERIALS, INC.
Reel/Frame 064388/0757 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 25, 2023
From: SILICOR MATERIALS, INC.
To: SUNNUVELLIR SLHF
Reel/Frame 062511/0046 →
LIEN Recorded May 26, 2017
From: SILICOR MATERIALS, INC.
To: SCHWEGMAN, LUNDBERG & WOESSNER, P.A.
Reel/Frame 042592/0974 →
SECURITY INTEREST Recorded Dec 27, 2016
From: SILICOR MATERIALS, INC.
To: SUNNUVELLIR SLHF
Reel/Frame 040777/0104 →
LICENSE Recorded Oct 13, 2015
From: SILICOR MATERIALS, INC.
To: SMS GROUP GMBH
Reel/Frame 036811/0327 →
CHANGE OF NAME Recorded Nov 20, 2012
From: CALISOLAR INC.
To: SILICOR MATERIALS INC.
Reel/Frame 029405/0900 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 29, 2011
From: CALISOLAR CANADA INC.
To: CALISOLAR, INC.
Reel/Frame 027321/0555 →
SECURITY AGREEMENT Recorded Oct 27, 2011
From: CALISOLAR CANADA INC.
To: SILICON VALLEY BANK
Reel/Frame 027131/0243 →
SECURITY AGREEMENT Recorded Oct 25, 2011
From: CALISOLAR CANADA INC.
To: GOLD HILL CAPITAL 2008, LP
Reel/Frame 027119/0936 →
CHANGE OF NAME Recorded Jul 15, 2011
From: 6N SILICON INC.
To: CALISOLAR CANADA INC.
Reel/Frame 026598/0425 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2010
From: NICHOL, SCOTT; CHEN, JIAN J.
To: 6N SILICON INC.
Reel/Frame 024679/0746 →