Laser patterning process
View Patent ↗In a laser irradiation device, a patterning method and a method of fabricating an Organic Light Emitting Display (OLED) using the same. The laser irradiation device includes a light source, a mask, a projection lens, and a Fresnel lens formed at a predetermined portion of the mask to change an optical path. When an organic layer pattern is formed using the laser irradiation device, laser radiation is irradiated onto a region of an organic layer, which is to be cut, and the laser radiation is appropriately irradiated onto a region of the organic layer, which is to be separated from a donor substrate. The laser radiation irradiated onto an edge of the organic layer pattern has a laser energy density greater than that of the laser radiation irradiated onto other portions of the organic layer pattern. As a result, it is possible to form a uniform organic layer pattern and reduce damage of the organic layer.
1. A patterning method, comprising:
providing a substrate;
providing a donor substrate having a transfer layer;
laminating the donor substrate and the substrate; and
irradiating laser radiation onto a region of the donor substrate, which is to be transferred to form a transfer layer pattern on the substrate, the laser radiation irradiated onto an edge of the irradiated region having an energy density greater than that of the laser radiation irradiated onto other portions of the irradiated region,
wherein the laser radiation is generated by a light source, a mask arranged under the light source and a projection lens arranged under the mask, and wherein the mask includes an element adapted to change an optical path of the laser radiation, the mask has two surfaces and Fresnel lenses are arranged on both of the two surfaces of the mask.
2. The method according to claim 1 , wherein the mask comprises a transparent material.
3. The method according to claim 1 , wherein the Fresnel lens is formed by machining a predetermined portion of the mask to have a Fresnel lens shape.
4. The method according to claim 1 , wherein the transfer layer pattern is formed in an N 2 atmosphere.
5. The method according to claim 4 , wherein the N 2 atmosphere is formed by charging N 2 gas until each of O 2 and H 2 O is less than 100 ppm.
6. The method according to claim 1 , wherein the transfer layer pattern is formed in a vacuum atmosphere.
7. A method of fabricating an organic light emitting display (OLED), the method comprising:
providing a substrate;
providing a donor substrate having an organic layer;
laminating the donor substrate on the substrate; and
irradiating laser radiation onto the donor substrate corresponding to an organic layer pattern region to form the organic layer pattern on the substrate,
the laser radiation irradiated onto an edge of the organic layer pattern of the donor substrate having a laser energy density greater than that of the laser radiation irradiated onto other portions of the organic layer pattern, wherein the laser radiation is generated by a light source, a mask arranged under the light source and a projection lens arranged under the mask, and wherein the mask includes an element adapted to change an optical path of the laser radiation, the mask has two surfaces and Fresnel lenses are arranged on both of the two surfaces of the mask.
8. The method according to claim 7 , wherein the organic layer pattern is formed in a N 2 atmosphere.
9. The method according to claim 1 , wherein the mask includes a first region that encloses a second region, wherein only the first region includes the Fresnel lens.
10. The method according to claim 9 , wherein laser radiation that passes through the first region of the mask overlaps laser radiation that passes through the second region of the mask at the edge of the irradiation region of the donor substrate.
11. The method according to claim 7 , wherein the mask includes a first region that encloses a second region, wherein only the first region includes the Fresnel lens.
12. The method according to claim 11 , wherein laser radiation that passes through the first region of the mask overlaps laser radiation that passes through the second region of the mask at the edge of the irradiation region of the donor substrate.