Method for aligning elongated nanostructures
View Patent ↗A method of depositing elongated nanostructures that allows accurate positioning and orientation is described. The method involves printing or otherwise depositing elongated nanostructures in a carrier solution. The deposited droplets are also elongated, usually by patterning the surface upon which the droplets are deposited. As the droplet evaporates, the fluid flow within the droplets is controlled such that the nanostructures are deposited either at the edge of the elongated droplet or the center of the elongated droplet. The described deposition technique has particular application in forming the active region of a transistor.
1. A method comprising:
depositing gate lines over a substrate;
depositing a dielectric material over the gate lines;
patterning an area on the dielectric material between the gate lines; and
ejecting a droplet of solution containing nanowires into the area.
2. The method of claim 1 further comprising:
treating surface of the dielectric material to cause elongating the droplet.
3. The method of claim 2 further comprising:
allowing a substantial portion of the droplet to evaporate such that the nanowires accumulate at outer perimeter of the droplet.
4. A method comprising:
depositing gate lines on a substrate;
depositing a dielectric material over the gate lines;
depositing a droplet of solution containing nanowires on an area of the dielectric material around center of each of the gate lines; and
treating surface of the dielectric material such that a region between the gate lines become hydrophobic, the hydrophobic region elongating the droplet.
5. A method comprising:
forming an array of gate lines;
patterning a dielectric layer to form a hydrophilic region running approximately perpendicular to the gate lines; and
depositing droplets containing nanowires on the hydrophilic region.
6. The method of claim 5 further comprising:
aligning the nanowires with the hydrophilic region such that the nanowires become perpendicularly oriented with respect to the array of the gate line.
7. The method of claim 6 further comprising:
depositing source lines and drain lines on the array of gate lines to form a transistor array.
8. The method of claim 7 wherein shortest distance between the source and drain lines is less than length of the nanowires.
9. A method of depositing elongated nanostructures comprising the operations of:
forming a solution of elongated nanostructures suspended in a printable liquid;
aligning a printhead over a patterned substrate;
printing droplets of the solution into predetermined positions on the substrate, the substrate patterned such that the droplets form an elongated shape, the elongated shape to approximately align the elongated nanostructures, wherein the elongation direction of the droplet approximately matches the orientation of the elongated nanostructures.
10. The method of claim 9 wherein the substrate is patterned such that hydrophobic portions of the substrate cause the droplets to form the elongated shape.
11. The method of claim 9 wherein the substrate is patterned with raised portions to cause the droplets to form the elongated shape.
12. The method of claim 9 wherein the printhead is a nozzleless printhead and the length of the elongated nanostructure exceeds 2 microns.
13. The method of claim 9 wherein the elongated nanostructures are nanowires.
14. The method of claim 9 wherein the elongated nanostructures are nanotubes.
15. The method of claim 9 wherein the center of the droplet is positioned where the elongated nanostructures are to be deposited.
16. The method of claim 9 wherein the edge of the droplet is positioned where the elongated nanostructures are to be deposited.
17. The method of claim 9 wherein the elongated nanostructures have a length exceeding 1 micron and a diameter less than 100 nm.
18. The method of claim 9 wherein the solution includes a carrier solution includes surfactant molecules that prevent aggregation of the elongated nanoparticles.
19. The method of claim 9 wherein the nanostructure surface undergoes derivatization to prevent aggregation.