IP Library Granted Patent US 8,247,811
Granted Patent B2
US 8,247,811 · App. 12/694,354 · Granted Aug 21, 2012

Thin-film transistor and display device

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,247,811
App. No.
12/694,354
Granted
Aug 21, 2012
Kind
B2
Abstract

A thin-film transistor includes: a gate electrode formed on a substrate; an oxide semiconductor layer forming a channel region corresponding to the gate electrode; a first gate insulating film formed on the substrate and the gate electrode, and including a silicon nitride film; a second gate insulating film selectively formed to contact with the oxide semiconductor layer in a region, on the first gate insulating film, corresponding to the oxide semiconductor layer, and including one of a silicon oxide film and a silicon oxynitride film; a source/drain electrode; and a protecting film. An upper surface and a side surface of the oxide semiconductor layer and a side surface of the second gate insulating film are covered, on the first gate insulating film, by the source/drain electrode and the protecting film.

Claims (29)

1. A thin-film transistor, comprising:

a gate electrode formed on a substrate;

an oxide semiconductor layer forming a channel region corresponding to the gate electrode;

a first gate insulating film formed on the substrate and the gate electrode, and including a silicon nitride film;

a second gate insulating film selectively formed to contact with the oxide semiconductor layer in a region, on the first gate insulating film, corresponding to the oxide semiconductor layer, and including one of a silicon oxide film and a silicon oxynitride film;

a source/drain electrode; and

a protecting film,

wherein an upper surface and a side surface of the oxide semiconductor layer and a side surface of the second gate insulating film are covered, on the first gate insulating film, by the source/drain electrode and the protecting film.

2. The thin-film transistor according to claim 1 , wherein the protecting film includes one of aluminum oxide and silicon nitride.

3. The thin-film transistor according to claim 2 , wherein the protecting film includes a stacked film having at least one layer of one of an aluminum oxide film and a silicon nitride film.

4. The thin-film transistor according to claim 1 , wherein the protecting film includes a channel protecting film provided at least in a region corresponding to the channel region.

5. The thin-film transistor according to claim 1 , wherein the protecting film includes a passivation film formed to cover an entire outermost surface of the thin-film transistor.

6. The thin-film transistor according to claim 1 , wherein

the source/drain electrode includes a stacked configuration having a plurality of metal layers, and

a metal layer, which is in contact with the oxide semiconductor layer, of the plurality of metal layers includes a metal material containing oxygen.

7. The thin-film transistor according to claim 1 , wherein

the source/drain electrode includes a stacked configuration having a plurality of metal layers, and

a metal layer, which is in contact with the oxide semiconductor layer, of the plurality of metal layers includes molybdenum.

8. A display device, comprising

a display element, and

a thin-film transistor driving the display element, the thin-film transistor including:

a gate electrode formed on a substrate;

an oxide semiconductor layer forming a channel region corresponding to the gate electrode;

a first gate insulating film formed on the substrate and the gate electrode, and having a silicon nitride film;

a second gate insulating film selectively formed to contact with the oxide semiconductor layer in a region, on the first gate insulating film, corresponding to the oxide semiconductor layer, and having one of a silicon oxide film and a silicon oxynitride film;

a source/drain electrode; and

a protecting film,

wherein an upper surface and a side surface of the oxide semiconductor layer and a side surface of the second gate insulating film are covered, on the first gate insulating film, by the source/drain electrode and the protecting film.

9. The display device according to claim 8 , wherein the display element includes an organic light-emitting element having an anode, an organic layer including a light-emitting layer, and a cathode.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 18, 2025
From: JDI DESIGN AND DEVELOPMENT G.K.
To: MAGNOLIA BLUE CORPORATION
Reel/Frame 072039/0656 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2024
From: JOLED, INC.
To: JDI DESIGN AND DEVELOPMENT G.K.
Reel/Frame 066382/0619 →
CORRECTION BY AFFIDAVIT FILED AGAINST REEL/FRAME 063396/0671 Recorded Jun 12, 2023
From: JOLED, INC.
To: JOLED, INC.
Reel/Frame 064067/0723 →
SECURITY INTEREST Recorded Apr 20, 2023
From: JOLED, INC.
To: INCJ, LTD.
Reel/Frame 063396/0671 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 15, 2015
From: SONY CORPORATION
To: JOLED INC.
Reel/Frame 036106/0355 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 27, 2010
From: MOROSAWA, NARIHIRO; FUJIMORI, TAKASHIGE
To: SONY CORPORATION
Reel/Frame 023852/0837 →