Plasma measurement device, plasma system, and method for measuring plasma characteristics
A plasma measurement device used for measuring plasma characteristics of radio frequency plasma a probe, a connector electronic wire, and a power supply device. The probe is used for entering the radio frequency plasma to measure the plasma characteristics. One end of the connector electronic wire is electrically connected to the probe. The power supply device is electrically connected to another end of the connector electronic wire, and the power supply device is used for providing a voltage to the probe. The connector electronic wire is a specific length, and the connector electronic wire and the radio frequency plasma would generate a standing wave effect. Thus, according to the standing wave effect, the plasma measurement device could eliminate high-frequency interference generated by the radio frequency plasma while measuring the plasma characteristics.
1. A plasma measurement device used for measuring plasma characteristics of radio frequency plasma, with the plasma measurement device comprising:
a probe used for entering the radio frequency plasma to measure the plasma characteristics;
a connector electronic wire, wherein one end of the connector electronic wire is electrically connected to the probe; and
a power supply device electrically connected to another end of the connector electronic wire, wherein the power supply device provides a voltage to the probe;
wherein the connector electronic wire is a specific length, wherein the connector electronic wire and the radio frequency plasma generates a standing wave effect, and wherein according to the standing wave effect, the plasma measurement device eliminates high-frequency interference generated by the radio frequency plasma while measuring the plasma characteristics.
2. The plasma measurement device as claimed in claim 1 , wherein the probe is a single-electrode Langmuir probe.
3. The plasma measurement device as claimed in claim 1 , wherein the specific length is substantially one-fourth as long as a wavelength of the radio frequency plasma.
4. The plasma measurement device as claimed in claim 1 further comprising an adjustment device adjusting the specific length of the conductor electronic wire.
5. The plasma measurement device as claimed in claim 1 further comprising a low-pass filter electrically connected to the power supply device.
6. The plasma measurement device as claimed in claim 1 , wherein the power supply device comprises a signal extraction device receiving a voltage signal and a current signal.
7. The plasma measurement device as claimed in claim 1 further comprising a signal extraction device receiving a voltage signal and a current signal.
8. The plasma measurement device as claimed in claim 1 , wherein the radio frequency plasma is at 13.56 MHz.
9. The plasma measurement device as claimed in claim 8 , wherein the specific length of the connector electronic wire is substantially between 500 centimeters and 600 centimeters.
10. The plasma measurement device as claimed in claim 1 , wherein the plasma characteristics comprise an electron temperature or an electron density.
11. The plasma measurement device as claimed in claim 1 , wherein the connector electronic wire is a coaxial cable.
12. The plasma measurement device as claimed in claim 1 , wherein the voltage is substantially between −40 volts and +40 volts.
13. A plasma system comprising:
a plasma device comprising:
a plasma chamber; and
a radio frequency generator providing energy required for generating radio frequency plasma in the plasma chamber;
and
a plasma measurement device measuring plasma characteristics of the radio frequency plasma and comprising:
a probe entering the radio frequency plasma to measure the plasma characteristics, wherein the probe is a single-electrode Langmuir probe;
a connector electronic wire, wherein one end of the connector electronic wire is electrically connected to the probe; and
a power supply device electrically connected to another end of the connector electronic wire, wherein the power supply device provides a voltage to the probe;
wherein the connector electronic wire is a specific length, wherein the connector electronic wire and the radio frequency plasma generates a standing wave effect, and wherein according to the standing wave effect, the plasma measurement device eliminates high-frequency interference generated by the radio frequency plasma while measuring the plasma characteristics.
14. The plasma system as claimed in claim 13 , wherein the specific length is substantially one-fourth as long as a wavelength of the radio frequency plasma.
15. A method for measuring plasma characteristics comprising:
providing radio frequency plasma;
providing a plasma measurement device, wherein the plasma measurement device comprises a probe and a connector electronic wire, wherein the probe and the connector electronic wire are electrically connected to each other;
adjusting the plasma measurement device to eliminate high-frequency interference generated by the radio frequency plasma comprises adjusting a specific length of the connector electronic wire to eliminate the high-frequency interference generated by the radio frequency plasma; and
measuring the plasma characteristics.
16. The method for measuring plasma characteristics as claimed in claim 15 , wherein the probe is a single-electrode Langmuir probe.
17. The method for measuring plasma characteristics as claimed in claim 15 , wherein the specific length is substantially one-fourth as long as a wavelength of the radio frequency plasma.
18. The method for measuring plasma characteristics as claimed in claim 15 , wherein the radio frequency plasma is at 13.56 MHz.
19. The method for measuring plasma characteristics as claimed in claim 18 , wherein the specific length of the connector electronic wire is substantially between 500 centimeters and 600 centimeters.
20. The method for measuring plasma characteristics as claimed in claim 15 , wherein the plasma characteristics comprise an electron temperature or an electron density.