Forming soldering surfaces without requiring a solder mask
View Patent ↗The present invention relates to a multi-layer laminate or substrate manufacturing process for forming soldering surfaces on a substrate of a module without requiring a solder mask. In one embodiment, a substrate is provided having a substrate body, soldering pads, and a metal segment. A patterned mask is formed over the substrate such that soldering surfaces of the soldering pads remain exposed. The soldering surfaces of the soldering pads are plated to create plated soldering surfaces over the soldering pads. The plated soldering surfaces are the regions for solder placement. The patterned mask is then removed from the substrate. Next, an anti-wetting treatment is applied to the substrate such that any unplated metal surfaces react to the anti-wetting treatment to form treated surfaces. As such, the plated soldering surfaces will wet solder while the treated surface will not wet solder. In a preferred embodiment, the anti-wetting treatment is an oxidation process.
1. A method comprising:
providing a substrate having a substrate body, soldering pads, and a metal segment;
forming a patterned mask over the substrate such that soldering surfaces of the soldering pads remain exposed;
plating the soldering surfaces of the soldering pads to create plated soldering surfaces over the soldering pads;
removing the patterned mask from the substrate;
providing an anti-wetting treatment to the substrate such that exposed surfaces of the metal segments as well as any exposed and unplated surfaces react with the anti-wetting treatment to form treated surfaces that will not wet solder, and the plated soldering surfaces react with the anti-wetting treatment in such a way as to remain able to wet solder.
2. The method of claim 1 wherein the soldering pads and metal segment are formed from the same material.
3. The method of claim 2 wherein the soldering pads and metal segment are formed from a single metal layer on the substrate.
4. The method of claim 1 wherein the plated soldering surfaces may be one of a group consisting of electroless nickel (Ni), electroless palladium (Pd) and immersion gold (Au) (ENEPIG), electroless nickel (Ni) and immersion gold (Au) (ENIG), direct immersion gold (Au) (DIG), electrolytic silver (EAg), direct immersion silver (DIAg), electrolytic nickel (Ni) and autocatalytic gold (Au) (ENAG), and solder.
5. The method of claim 1 wherein a thickness of the plated soldering surfaces is between about 1 μm to 10 μm.
6. The method of claim 1 wherein the anti-wetting treatment is an oxidation process that oxidizes the exposed surfaces of the metal segments as well as the any exposed and unplated surfaces of the soldering pads to form the treated surfaces.
7. The method of claim 6 wherein the oxidation process is one of a group consisting of a cupric oxide (CuO) process and a cuprous oxide (Cu 2 O) process and the treated surface comprises one of a group consisting of cupric oxide (CuO) and cuprous oxide (Cu 2 O).
8. The method of claim 1 wherein the substrate is connected to another component by solder bumps created over the plated soldering surfaces.
9. The method of claim 8 wherein the another component may be one of the group consisting of a flip chip component, a surface mount device, and a wire bond.
10. The method of claim 1 wherein the soldering surfaces are formed without a separate solder mask.
11. A substrate formed by a process comprising:
providing a substrate having a substrate body, soldering pads, and a metal segment;
forming a patterned mask over the substrate such that soldering surfaces of the soldering pads remain exposed;
plating the soldering surfaces of the soldering pads to create plated soldering surfaces over the soldering pads;
removing the patterned mask from the substrate; and
providing an anti-wetting treatment to the substrate such that exposed surfaces of the metal segments as well as any exposed and unplated surfaces react with the anti-wetting treatment to form treated surfaces that will not wet solder, and the plated soldering surfaces react with the anti-wetting treatment in such a way as to remain able to wet solder, wherein solder will wet to the plated soldering surfaces, but not to the treated surfaces.
12. The substrate of claim 11 wherein the soldering pads and metal segment are formed from the same material.
13. The substrate of claim 12 wherein the soldering pads and metal segment are formed from a single metal layer on the substrate.
14. The substrate of claim 11 wherein the plated soldering surfaces may be one of a group consisting of electroless nickel (Ni), electroless palladium (Pd) and immersion gold (Au) (ENEPIG), electroless nickel (Ni) and immersion gold (Au) (ENIG), direct immersion gold (Au) (DIG), electrolytic silver (EAg), direct immersion silver (DIAg), electrolytic nickel (Ni) and autocatalytic gold (Au) (ENAG), and solder.
15. The substrate of claim 11 wherein a thickness of the plated soldering surfaces is between about 1 μm to 10 μm.
16. The substrate of claim 11 wherein the anti-wetting treatment is an oxidation process that oxidizes the exposed surfaces of the metal segments as well as the any exposed and unplated surfaces of the soldering pads to form the treated surfaces.
17. The substrate of claim 16 wherein the oxidation process is one of a group consisting of a cupric oxide (CuO) process and a cuprous oxide (Cu 2 O) process and the treated surface comprises one of a group consisting of cupric oxide (CuO) and cuprous oxide (Cu 2 O).
18. The substrate of claim 11 wherein the substrate is connected to another component by solder bumps created over the plated soldering surfaces.
19. The substrate of claim 18 wherein the another component may be one of a group consisting of a flip chip component, a surface mount device, and a wire bond.
20. The substrate of claim 11 wherein the soldering surfaces are formed without a separate solder mask.