Nanoimprint lithography

1. A molding system, comprising:

a base;

a plurality of protuberances that extend from the base, wherein each protuberance has an end surface and side surfaces, and wherein a valley with a bottom is formed between each pair of the protuberances;

a first photo-catalyst layer on the end surface and on the side surfaces of the protuberances and on bottoms of the valleys formed between pairs of protuberances, wherein the first photo-catalyst layer is configured to at least partially break down a residual layer on a substrate in response to activation of the first photo-catalyst layer by a first radiation at a first wavelength or range of wavelengths;

a second photo-catalyst layer on top of portions of the first photo-catalyst layer at the side surfaces of the protuberances and at the bottoms of the valleys formed between the pairs of the protuberances, wherein the second photo-catalyst layer is absent from the end surfaces of the protuberances, wherein the second photo-catalyst layer is activated by a second radiation at a second wavelength or range of wavelengths to at least partially break down a resist layer on the substrate, and wherein the first wavelength or range of wavelengths is different than the second wavelength or range of wavelengths,

wherein the activation of the first photo-catalyst layer by the first radiation causes a reaction between the first photo-catalyst layer and the residual layer on the substrate only at points of contact of the end surfaces of the protuberances with the residual layer, so as to at least partially break down the residual layer at the points of contact, and

wherein the second photo-catalyst layer shields the portions of the first photo-catalyst layer, at the side surfaces of the protuberances and at the bottoms of the valleys between the pairs of protuberances, from reaction with the resist layer when the first photo-catalyst layer is activated by the first radiation source to cause the reaction between the first photo-catalyst layer and the residual layer at the points of contact of the end surfaces of the protuberances with the residual layer;

a first stage configured to hold the molding system;

a second stage configured to hold the substrate; and

a radiation source mounted to the first stage and configured to apply the first radiation to the first photo-catalyst layer and the second radiation to the second photo-catalyst layer.

2. The molding system of claim 1 , wherein the base and the plurality of protuberances are radiation transmissive.

3. The molding system of claim 1 , wherein the first radiation has a wavelength of between approximately 10 nanometers (nm) and approximately 400 nm.

4. The molding system of claim 1 , wherein the second photo-catalyst layer is configured to at least partially break a bond between the molding system and the substrate or the resist layer on the substrate.

5. The molding system of claim 1 , wherein the first photo-catalyst layer comprises at least one of titanium oxide, silicon oxide, zinc oxide, ferric oxide, tungsten oxide, gallium phosphide, gallium arsenide, cadmium sulfide, or strontium titanate.

6. A nanoimprinting template, comprising:

a base;

a plurality of protuberances extending from the base, wherein each of the plurality of protuberances has an end surface and side surfaces, and wherein a valley with a bottom is formed between each pair of the plurality of protuberances;

a first photo-catalyst layer on the end surface and the side surfaces of each of the plurality of protuberances and on bottoms of the valleys formed between the protuberances, wherein the first photo-catalyst layer is configured to at least partially break down a residual layer on a substrate in response to activation of the first photo-catalyst layer by a first radiation at a first wavelength or range of wavelengths; and

a second photo-catalyst layer on a top of portions of the first photo-catalyst layer at the side surfaces of the plurality of protuberances and at the bottoms of the valleys between the pairs of protuberances, wherein the second photo-catalyst is absent from the end surfaces of the protuberances, wherein the second photo-catalyst layer is activated by a second radiation at a second wavelength or range of wavelengths, and wherein the first wavelength or range of wavelengths is different than the second wavelength or range of wavelengths.

7. The nanoimprinting template of claim 6 , wherein the activation of the first photo-catalyst layer by the first radiation causes a reaction between the first photo-catalyst layer and the residual layer on the substrate only at points of contact of the end surfaces of the protuberances with the residual layer, so as to at least partially break down the residual layer at the points of contact, and

wherein the second photo-catalyst layer shields the portions of the first photo-catalyst layer, at the side surfaces of the protuberances and at the bottoms of the valleys between the pairs of protuberances, from reaction with the resist layer when the first photo-catalyst layer is activated by the first radiation source to cause the reaction between the first photo-catalyst layer and the residual layer at the points of contact of the end surfaces of the protuberances with the residual layer.

8. The nanoimprinting template of claim 6 , wherein the nanoimprinting template comprises part of a molding system, the molding system including:

a first stage configured to hold the nanoimprinting template;

a second stage configured to hold the substrate; and

a radiation source mounted to the first stage and configured to apply the first radiation to the first photo-catalyst layer and the second radiation to the second photo-catalyst layer.