Substrate processing apparatus
View Patent ↗A substrate processing apparatus that forms thin films on a plurality of substrates and thermally processes the substrates, by uniformly heating the substrates. The substrate processing apparatus includes a processing chamber, a boat in which substrates are stacked, an external heater located outside of the processing chamber, a feeder to move the boat into and out of the processing chamber, a lower heater located below the feeder, and a central heater located in the center of the boat.
1. A substrate processing apparatus, comprising:
a processing chamber;
a boat to house substrates;
an external heater having a shape of a furnace and surrounding at least 3 sides of the processing chamber;
a feeder to move the boat in and out of the processing chamber, the feeder comprising a lower heater disposed below the boat; and
a central heater located in a center of the boat,
wherein the external heater comprises a first heater disposed along a top surface of the processing chamber, the first heater being parallel to the top surface of the processing chamber, and
wherein the center of the boat is substantially at a center of a height between a top and a bottom of the boat, the bottom of the boat corresponding to a side of the processing chamber that is not surrounded by the external heater.
2. The substrate processing apparatus according to claim 1 , wherein long axes of the substrates and a long axis of the central heater are parallel.
3. The substrate processing apparatus according to claim 2 , further comprising a thermal insulator located under the lower heater.
4. The substrate processing apparatus according to claim 3 , wherein the thermal insulator comprises insulation plates and holders to support the insulation plates.
5. The substrate processing apparatus according to claim 1 , wherein the processing chamber comprises a manifold comprising:
an inlet pipe to supply a reaction gas;
an outlet pipe through which discharge gas is pumped out of the processing chamber; and
a cover disposed on the manifold, to enclose the processing chamber.
6. The substrate processing apparatus according to claim 5 , further comprising a gas supply to supply the reaction gas to the inlet pipe.
7. The substrate processing apparatus according to claim 6 , further comprising a gas sprayer connected to the inlet pipe and extending along a length of the boat, when the boat is provided in the processing chamber.
8. The substrate processing apparatus according to claim 5 , further comprising a shutter located under the manifold, to open and close the processing chamber.
9. The substrate processing apparatus according to claim 5 , further comprising a discharge pump connected to the outlet pipe, to pump the discharge gas through the outlet pipe.
10. The substrate processing apparatus according to claim 5 , further comprising a first tube disposed between the cover and the boat.
11. The substrate processing apparatus according to claim 10 , further comprising a second tube disposed around the feeder and between the feeder and the first tube.
12. The substrate processing apparatus according to claim 11 , wherein the second tube comprises a length equal to an overlapped area of the first tube and the feeder.
13. The substrate processing apparatus according to claim 11 , wherein the second tube comprises a hole through which the reaction gas passes.
14. A substrate processing apparatus, comprising:
a processing chamber comprising a manifold and a cover disposed on the manifold;
a boat to house substrates;
an external heater having a shape of a furnace and surrounding at least 3 sides of the cover;
a feeder to move the boat in and out of the processing chamber, the feeder comprising a lower heater; and
a boat heater disposed between at least two substrates at a center of the boat,
wherein the external heater comprises a first heater disposed along a top surface of the processing chamber, the first heater being parallel to the top surface of the processing chamber, and
wherein the center of the boat is substantially at a center of a height between a top and a bottom of the boat, the bottom of the boat corresponding to a side of the processing chamber that is not surrounded by the external heater.
15. The substrate processing apparatus according to claim 14 , wherein the manifold comprises:
an inlet pipe to supply a reaction gas to the processing chamber; and
an outlet pipe through which a discharge gas is pumped out of the processing chamber.
16. The substrate processing apparatus according to claim 15 , further comprising:
a first tube disposed inside the cover and the manifold, to insulate the processing chamber;
a second tube disposed around the feeder and between the feeder and the first tube, the second tube having a hole connected to the inlet pipe; and
a sprayer connected to the hole, to feed the reaction gas to the substrates.
17. The substrate processing apparatus according to claim 16 , further comprising:
a shutter located under the manifold, to open and close the processing chamber; and
a thermal insulator located under the lower heater and comprising insulation plates and holders to support the insulation plates.
18. The substrate processing apparatus according to claim 7 , wherein a height of the gas sprayer is substantially equal to a height of a first tube located between the boat and a side of the processing chamber.