Silica glass crucible
A silica glass crucible used for pulling up silicon single crystal at a high temperature. The silica glass crucible may have at least an outer surface of a wall part of the crucible covered with fine grooves having a length of less than 200 μm, a width of less than 30 μm and a depth of from more than 3 μm to less than 30 μm. The fine groves may be formed by carrying out a sand-blast treatment and a hydrofluoric acid etching and may exist on more than 10% of the outer surface of the crucible, and a sliding frictional coefficient of the outer surface of the crucible to a carbon at 1500° C. is more than 0.6.
1. A process for forming fine grooves on at least an outer surface of a wall part of a silica glass crucible used for pulling silicon single crystal, wherein the silica glass crucible has a wall part, an open diameter, an inner surface, and the outer surface; and a graphite susceptor adhered to the outer surface of the silica glass crucible, comprising
carrying out a sand-blast treatment and a hydrofluoric acid etching on the said surface;
wherein after the sand blast treatment and the hydrofluoric acid etching at least the outer surface of the wall part of the crucible is covered with fine grooves having a length of from 10 μm, to 200 μm, a width of from 10 μm to 30 μm and a depth of from more than 3 μm to less than 30 μm; and
wherein a sliding frictional coefficient of the outer surface of the crucible to the graphite susceptor at 1500° C. is more than 0.6, and wherein a number of projections having a height of 0.1 mm or more is an average of less than 5/mm 2 per unit area on the outer surface of the crucible.
2. The process for forming fine grooves according to claim 1 ,
wherein the sand-blast treatment includes spraying hard particles having a higher hardness than that of the silica glass crucible with a pressurized gas against the outer surface of the wall part of the silica glass crucible.
3. The process for forming fine grooves according to claim 2 ,
wherein the hard particles are crystalline quartz particles.
4. The process of claim 1 , wherein the fine grooves are present on more than 10% of the whole outer surface of the silica glass crucible.
5. The process of claim 1 , wherein the fine grooves have a depth of from more than 3 μm to 10 μm.
6. The process of claim 1 , wherein the fine grooves have a length of from 10 μm to 100 μm.
7. The process of claim 1 , wherein the fine grooves are present only on the outer surface of the silica glass crucible.
8. The process of claim 1 , wherein the fines grooves are present on more than 50% of the whole outer surface of the silica glass crucible.
9. A process for forming fine grooves on an outer surface of a wall part of a silica glass crucible having the wall part, an open diameter, an inner surface, the outer surface, and a graphite susceptor adhered to the outer surface of the silica glass crucible; comprising:
sand-blasting and hydrofluoric acid etching the outer surface of the wall part of the silica glass crucible,
wherein the sand-blasting and the hydrofluoric acid etching form fine grooves on at least the outer surface of the wall part of the silica glass crucible,
wherein the fine grooves having a length of from 10 μm to 200 μm, a width of from 10 μm to 30 μm and a depth of from more than 3 μm to less than 30 μm, and
wherein the outer surface of the wall part of the silica glass crucible has an average of less than 5 projections having a height of 0.1 mm or more per mm 2 unit area, and
wherein a sliding frictional coefficient of the outer surface of the crucible to the graphite susceptor at 1500° C. is more than 0.6.