IP Library Granted Patent US 9,450,084
Granted Patent B2
US 9,450,084 · App. 12/718,514 · Granted Sep 20, 2016

Wide band gap semiconductor device

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Quick Facts
Patent No.
US 9,450,084
App. No.
12/718,514
Granted
Sep 20, 2016
Kind
B2
Abstract

A semiconductor device having high reliability and high load short circuit withstand capability while maintaining a low ON resistance is provided, by using a WBG semiconductor as a switching element of an inverter circuit. In the semiconductor device for application to a switching element of an inverter circuit, a band gap of a semiconductor material is wider than that of silicon, a circuit that limits a current when a main transistor is short circuited is provided, and the main transistor that mainly serves to pass a current, a sensing transistor that is connected in parallel to the main transistor and detects a microcurrent proportional to a current flowing in the main transistor, and a lateral MOSFET that controls a gate of the main transistor on the basis of an output of the sensing transistor are formed on the same semiconductor.

Claims (8)

1. A wide band gap semiconductor device for application to a switching element of an inverter circuit, the device comprising:

a main transistor;

a sensing transistor connected in parallel to the main transistor that detects a microcurrent proportional to a current flowing in the main transistor; and

a lateral MOSFET that controls a gate of the main transistor on the basis of an output of the sensing transistor;

wherein the main transistor, the sensing transistor and the lateral MOSFET are all formed on the same semiconductor substrate;

wherein a band gap of the semiconductor substrate is wider than that of silicon; and

wherein the main transistor and the sensing transistor each include a gate structure formed in a trench groove, and a surface dopant concentration of a p-well is set to be lower than a dopant concentration at a predetermined depth of the p-well below the surface of the p-well, and

wherein the dopant concentration of the p-well continuously increases in accordance with the depth of the p-well, from the surface of the p-well, to the predetermined depth.

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Aug 26, 2011
From: FUJI ELECTRIC SYSTEMS CO., LTD. (FES); FUJI TECHNOSURVEY CO., LTD. (MERGER BY ABSORPTION)
To: FUJI ELECTRIC CO., LTD.
Reel/Frame 026970/0872 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 18, 2010
From: UENO, KATSUNORI
To: FUJI ELECTRIC SYSTEMS CO., LTD.
Reel/Frame 024558/0718 →