IP Library Granted Patent US 8,056,421
Granted Patent B2
US 8,056,421 · App. 12/719,977 · Granted Nov 15, 2011

Apparatus for measuring a mechanical quantity

Assignee: Hitachi, Ltd.
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Quick Facts
Patent No.
US 8,056,421
App. No.
12/719,977
Filed
Mar 9, 2010
Granted
Nov 15, 2011
Kind
B2
Examiner
ROY, PUNAM P
Art Unit
2855
USPC
73/777
Abstract

An apparatus structure and measurement method are provided to retain high precision and high reliability of a semiconductor mechanical quantity measuring apparatus which senses a mechanical quantity and transmits measured information wirelessly. As to a silicon substrate of the semiconductor mechanical quantity measuring apparatus, for example, a ratio of a substrate thickness to a substrate length along a measurement direction is set small, and a ratio of a substrate thickness to a substrate length along a direction perpendicular to the measurement direction is set small. The apparatus upper surface is covered with a protective member. It is possible to measure a strain along a particular direction and realize mechanical quantity measurement with less error and high precision. An impact resistance and environment resistance of the apparatus itself can be improved.

Claims (10)

1. A mechanical quantity measuring apparatus having a strain detector formed on a principal surface of a single crystal semiconductor substrate for detecting a strain and bonded to or buried in an object to be measured to measure a strain, comprising:

an amplifier circuit disposed on the principal surface of the single crystal semiconductor substrate for amplifying a signal of the strain detector, and

a communication control unit for transmitting a signal amplified by the amplifier circuit, the communication control unit disposed on the principal surface of the single crystal semiconductor substrate toward a periphery of the mechanical quantity measuring apparatus,

wherein the strain detector includes a Wheatstone bridge circuit disposed on the principal surface, the Wheatstone bridge circuit comprising a pair of sensor resistor layers and a pair of dummy resistors, wherein a resistance value of each sensor resistor layer being equal to a resistance value of each dummy resistor, a surface of the single crystal semiconductor substrate opposite to the principal surface on which the strain detector has been formed being flat and adhered to a surface of the object,

wherein the strain detector is located closer to a central part of the principal surface of the single crystal semiconductor substrate than both the amplifying circuit and the communication control unit,

wherein a longitudinal direction of the pair of sensor resistor layers is parallel to a strain measurement direction, and a longitudinal direction of the pair of dummy resistors is substantially at 90° or 45° to the strain direction.

2. The mechanical quantity measuring apparatus according to claim 1 , wherein both the amplifier circuit and the communication control unit are located at a side edge part of the principal surface.

3. The mechanical quantity measuring apparatus according to claim 1 , wherein a ratio “t/L 1 ” is 0.3 or smaller, where

“t” is a thickness of the semiconductor substrate and

“L 1 ” is a length of the semiconductor substrate along a strain detection direction of the strain detector.

Continuity (3)
Continuation 12210261 · Sep 15, 2008
Division 11303730 · Dec 16, 2005
Related Publication 20100154555A1 · Jun 24, 2010