VAPOR DEPOSITION REACTOR SYSTEM
Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor is provided which includes a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support. The CVD reactor further contains first and second faceplates disposed on opposite ends of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly and the exhaust assembly is disposed between the second showerhead assembly and the second faceplate. The reactor body has a wafer carrier disposed on a wafer carrier track and a lamp assembly disposed below the wafer carrier track and containing a plurality of lamps which may be utilized to heat wafers disposed on the wafer carrier.
1 . A chemical vapor deposition reactor, comprising:
a reactor lid assembly disposed on a reactor body, wherein the reactor lid assembly comprises:
a first chamber comprising a first showerhead assembly and an isolator assembly disposed next to each other on a lid support; and
a second chamber comprising a second showerhead assembly and an exhaust assembly disposed next to each other on the lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies and the second showerhead assembly is disposed between the isolator assembly and the exhaust assembly.
2 . The chemical vapor deposition reactor of claim 1 , wherein the reactor body further comprises a wafer carrier disposed on a wafer carrier track, and the wafer carrier track comprises quartz.
3 . The chemical vapor deposition reactor of claim 2 , wherein the wafer carrier is a levitating wafer carrier disposed on a levitating wafer carrier track.
4 . The chemical vapor deposition reactor of claim 3 , wherein the levitating wafer carrier track is configured to flow a gas to at least one indentation pocket disposed within a lower surface of the levitating wafer carrier.
5 . The chemical vapor deposition reactor of claim 1 , wherein the reactor body further comprises a lamp assembly comprising a plurality of lamps disposed below the wafer carrier track.
6 . The chemical vapor deposition reactor of claim 5 , wherein the lamp assembly further comprises a reflector disposed below the plurality of lamps.
7 . The chemical vapor deposition reactor of claim 6 , wherein the reflector comprises gold or a gold alloy.
8 . The chemical vapor deposition reactor of claim 1 , further comprising:
a first faceplate disposed on one end of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly; and
a second faceplate disposed on the other end of the reactor body, wherein the exhaust assembly is disposed between the second showerhead assembly and the second faceplate.
9 . The chemical vapor deposition reactor of claim 1 , further comprising a temperature regulation system, comprising:
a first fluid passageway extending throughout the reactor lid and containing a first inlet and a first outlet coupled to and in fluid communication with the first fluid passageway; and
a second fluid passageway extending throughout the reactor body and containing a second inlet and a second outlet coupled to and in fluid communication with the second fluid passageway.
10 . The chemical vapor deposition reactor of claim 1 , wherein the first showerhead assembly or the second showerhead assembly is a modular showerhead assembly.
11 . The chemical vapor deposition reactor of claim 1 , wherein the isolator assembly or the exhaust assembly is a modular isolator assembly.
12 . A chemical vapor deposition reactor, comprising:
a reactor lid assembly disposed on a reactor body, wherein:
the reactor lid assembly comprises a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support; and
the reactor body comprises a levitating wafer carrier disposed on a levitating wafer carrier track, and a lamp assembly comprising a plurality of lamps and disposed below the wafer carrier track.
13 . The chemical vapor deposition reactor of claim 12 , further comprising:
a first faceplate disposed on one end of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly; and
a second faceplate disposed on the other end of the reactor body, wherein the exhaust assembly is disposed between the second showerhead assembly and the second faceplate.
14 . The chemical vapor deposition reactor of claim 12 , further comprising a temperature regulation system, comprising:
a first fluid passageway extending throughout the reactor lid and containing a first inlet and a first outlet coupled to and in fluid communication with the first fluid passageway; and
a second fluid passageway extending throughout the reactor body and containing a second inlet and a second outlet coupled to and in fluid communication with the second fluid passageway.
15 . The chemical vapor deposition reactor of claim 12 , wherein the first showerhead assembly or the second showerhead assembly is a modular showerhead assembly.
16 . The chemical vapor deposition reactor of claim 12 , wherein the isolator assembly or the exhaust assembly is a modular isolator assembly.
17 . The chemical vapor deposition reactor of claim 12 , wherein the lamp assembly further comprises a reflector disposed below the plurality of lamps.
18 . The chemical vapor deposition reactor of claim 17 , wherein the reflector comprises gold or a gold alloy.
19 . The chemical vapor deposition reactor of claim 12 , wherein the levitating wafer carrier track is configured to flow a gas to at least one indentation pocket disposed within a lower surface of the levitating wafer carrier.
20 . A chemical vapor deposition reactor, comprising:
a reactor lid assembly disposed on a reactor body, wherein the reactor lid assembly comprises:
a first chamber comprising a first showerhead assembly and an isolator assembly disposed next to each other on a lid support;
a second chamber comprising a second showerhead assembly and an exhaust assembly disposed next to each other on the lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies; and
a temperature regulation system comprising at least one fluid passageway extending throughout the lid support and at least one inlet and at least one outlet coupled to and in fluid communication with the fluid passageway.
21 . The chemical vapor deposition reactor of claim 20 , wherein the reactor body further comprises a wafer carrier disposed on a wafer carrier track, and the wafer carrier track comprises quartz.
22 . The chemical vapor deposition reactor of claim 21 , wherein the wafer carrier is a levitating wafer carrier disposed on a levitating wafer carrier track.
23 . The chemical vapor deposition reactor of claim 22 , wherein the levitating wafer carrier track is configured to flow a gas to at least one indentation pocket disposed within a lower surface of the levitating wafer carrier.
24 . The chemical vapor deposition reactor of claim 20 , wherein the reactor body further comprises a lamp assembly comprising a plurality of lamps disposed below the wafer carrier track.
25 . The chemical vapor deposition reactor of claim 24 , wherein the lamp assembly further comprises a reflector disposed below the plurality of lamps.
26 . The chemical vapor deposition reactor of claim 25 , wherein the reflector comprises gold or a gold alloy.
27 . The chemical vapor deposition reactor of claim 20 , further comprising:
a first faceplate disposed on one end of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly; and
a second faceplate disposed on the other end of the reactor body, wherein the exhaust assembly is disposed between the second showerhead assembly and the second faceplate.
28 . The chemical vapor deposition reactor of claim 20 , wherein the temperature regulation system further comprises:
a first fluid passageway extending throughout the reactor lid and containing a first inlet and a first outlet coupled to and in fluid communication with the first fluid passageway; and
a second fluid passageway extending throughout the reactor body and containing a second inlet and a second outlet coupled to and in fluid communication with the second fluid passageway.
29 . The chemical vapor deposition reactor of claim 20 , wherein the first showerhead assembly or the second showerhead assembly is a modular showerhead assembly.
30 . The chemical vapor deposition reactor of claim 20 , wherein the isolator assembly or the exhaust assembly is a modular isolator assembly.
31 . A chemical vapor deposition reactor, comprising:
a reactor lid assembly disposed on a reactor body, wherein the reactor lid assembly comprises:
a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies and the second showerhead assembly is disposed between the isolator assembly and the exhaust assembly.
32 . The chemical vapor deposition reactor of claim 31 , wherein the reactor body further comprises a wafer carrier disposed on a wafer carrier track.
33 . The chemical vapor deposition reactor of claim 32 , wherein the wafer carrier is a levitating wafer carrier disposed on a levitating wafer carrier track.
34 . The chemical vapor deposition reactor of claim 33 , wherein the levitating wafer carrier track is configured to flow a gas to at least one indentation pocket disposed within a lower surface of the levitating wafer carrier.
35 . The chemical vapor deposition reactor of claim 31 , wherein the reactor body further comprises a lamp assembly comprising a plurality of lamps disposed below the wafer carrier track.
36 . The chemical vapor deposition reactor of claim 35 , wherein the lamp assembly further comprises a reflector disposed below the plurality of lamps.
37 . The chemical vapor deposition reactor of claim 36 , wherein the reflector comprises gold or a gold alloy.