Methods for heating with lamps
View Patent ↗Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor deposition reactor system includes exposing a lower surface of a substrate susceptor, such as a wafer carrier, to energy emitted from a heating lamp assembly, and heating the substrate susceptor to a predetermined temperature. The heating lamp assembly generally contains a lamp housing disposed on an upper surface of a support base and contains at least one lamp holder, a plurality of lamps extending from the lamp holder, and a reflector disposed on the upper surface of the support base, next to the lamp holder, and below the lamps. The plurality of lamps may have split filament lamps and/or non-split filament lamps for heating inner and outer portions of the substrate susceptor.
1. A method for heating a substrate or a substrate susceptor within a flow vapor deposition reactor system by a heating lamp assembly, comprising:
exposing a lower surface of a substrate susceptor to energy emitted from a heating lamp assembly disposed beneath a wafer carrier track, and
heating the substrate susceptor to a predetermined temperature, wherein the heating lamp assembly comprises:
a first elongate lamp holder and a second elongate lamp holder parallel to the first elongate lamp holder, the first and second elongate lamp holders having a plurality of pairs of spaced apart posts on one side of each of the lamp holders, the first and second lamp holders disposed on an upper surface of a support base within a vertical flow vapor deposition reactor, wherein the first lamp holder and the second lamp holder each have a thickness within a range from about 0.001 inches to about 0.1 inches and the first lamp holder and the second lamp holder are each independently maintained at a temperature within a range from about 275° C. to about 375° C.;
a plurality of lamps, each lamp extending from a position in between a pair of posts from the first lamp holder to a position in between a pair of posts of the second lamp holder; and
a reflector disposed on the upper surface of the support base, in between the first and second elongate lamp holders and below the lamps, wherein the substrate susceptor is adapted to move along the wafer carrier track while being heated by the heating lamp assembly.
2. The method of claim 1 , wherein each of the lamps comprises a split filament lamp, and the split filament lamp comprises a center between a first end and a second end.
3. The method of claim 2 , wherein the first and second ends of the split filament lamps are maintained warmer than the centers of the split filament lamps.
4. The method of claim 3 , wherein outer edges of the substrate susceptor are maintained warmer than a center point of the substrate susceptor.
5. The method of claim 1 , wherein each of the lamps comprises a non-split filament lamp, and the non-split filament lamp comprises a center between a first end and a second end.
6. The method of claim 5 , wherein the centers of the non-split filament lamps are maintained warmer than the first and second ends of the non-split filament lamps.
7. The method of claim 6 , wherein a center point of the substrate susceptor is maintained warmer than the outer edges of the substrate susceptor.
8. The method of claim 1 , wherein the plurality of lamps comprises split filament lamps and non-split filament lamps.
9. The method of claim 8 , wherein each of the split filament lamps and each of the non-split filament lamps are alternately disposed between each other.
10. The method of claim 8 , wherein each lamp is independently in electric contact to a power source and a controller.
11. The method of claim 8 , further comprising independently adjusting the amount of electricity flowing to each lamp.
12. The method of claim 8 , wherein the split filament lamp comprises a center between a first end and a second end, and the first and second ends of the split filament lamps are maintained warmer than the centers of the split filament lamps.
13. The method of claim 12 , wherein outer edges of the substrate susceptor are maintained warmer than a center point of the substrate susceptor.
14. The method of claim 8 , wherein the non-split filament lamp comprises a center between a first end and a second end, and the centers of the non-split filament lamps are maintained warmer than the first and second ends of the non-split filament lamps.
15. The method of claim 14 , wherein a center point of the substrate susceptor is maintained warmer than the outer edges of the substrate susceptor.
16. The method of claim 1 , wherein the substrate susceptor is a substrate carrier, a wafer carrier, or a levitating wafer carrier.
17. The method of claim 1 wherein the reflector is a plate disposed between the first lamp holder and the second lamp holder.
18. The method of claim 17 , wherein the reflector plate comprises gold or a gold alloy.
19. The method of claim 1 , wherein the temperature is within a range from about 300° C. to about 350° C.