Liquid crystal display device and method of manufacturing color filter substrate

1. A liquid crystal display device, including:

an array substrate;

a color filter substrate; and

a liquid crystal layer provided between the array substrate and the color filter substrate,

wherein the color filter substrate includes:

a substrate;

a plurality of color filter units provided on the substrate in the form of matrix; and

a black matrix pattern including a lateral structure and a longitudinal structure that are formed integrally to enclose pixals,

wherein the black matrix pattern is provided between the array substrate and the color filter substrate and partially contacts with the array substrate to block light and maintain a cell thickness between the array substrate and the color filter substrate, and

wherein grooves are provided on the black matrix pattern, the grooves are provided on the lateral structure of the black matrix pattern and/or the longitudinal structure of the black matrix pattern, and the depth of the grooves are set to a depth, with which liquid crystal material can freely flow from one pixel to another pixel and the block matrix pattern is capable of blocking light.

2. The liquid crystal display device according to claim 1 , wherein the color filter units are continuously provided on the substrate, and the black matrix pattern spans adjacent color filter units and is provided on the edge portions of each of the adjacent color filter units.

3. The liquid crystal display device according to claim 1 , wherein the color filter units are provided on the substrate with an interval between adjacent color filter units, and the interval between the adjacent color filter units is filled by the black matrix pattern.

4. The liquid crystal display device according to claim 3 , wherein the black matrix pattern spans the adjacent color filter units and is provided on the edge portions of each of the adjacent color filter units.

5. The liquid crystal display device according to claim 1 , wherein the length of the grooves is smaller than or equal to the lateral width of the sub-pixel of each color filter unit when the grooves are provided on the lateral structure of the black matrix pattern.

6. The liquid crystal display device according to claim 1 , wherein the length of the grooves is smaller than or equal to the longitudinal length of the sub-pixel of each color filter unit when the grooves are provided on the longitudinal structure of the black matrix pattern.

7. The liquid crystal display device according to claim 1 , wherein the black matrix pattern is formed by a non-transparent resin material with elasticity.

8. A method of manufacturing a color filter substrate of a liquid crystal display device, including:

Step 1, forming a color filter unit pattern on a substrate in the form of matrix; and

Step 2, forming a black matrix pattern on the substrate after the Step 1, the black matrix pattern protruding from the substrate and including a lateral structure and a longitudinal structure that are formed integrally to enclose pixels,

wherein grooves are provided on the black matrix pattern, and the grooves are provided on the lateral structure of the black matrix pattern and/or the longitudinal structure of the black matrix pattern.

9. The method according to claim 8 , wherein forming the black matrix pattern on the substrate in the Step 2 includes:

applying a photosensitive organic resin material for the black matrix pattern on the substrate after Step 1;

exposing the photosensitive organic resin material by using a mask; and

developing the photosensitive organic resin material for the black matrix pattern which has been exposed to form the black matrix pattern.

10. The method according to claim 8 , wherein forming the black matrix pattern on the substrate in the Step 2 includes:

applying a photosensitive organic resin material for the black matrix pattern on the substrate after Step 1;

exposing the photosensitive organic resin material by using a mask; and

developing the photosensitive organic resin material for the black matrix pattern which has been exposed to form the black matrix pattern.

11. The method according to claim 10 , wherein the mask is a gray-tone mask or a half-tone mask, and the partially exposing portions of the mask corresponds the positions on the black matrix pattern to form the grooves.

12. The method according to claim 8 , wherein the Step 1 further includes:

forming a common electrode layer on the substrate after forming the color filter unit pattern, so that the common electrode layer is provided between the color filter unit pattern and the black matrix pattern.

13. The method according to claim 8 , wherein the Step 1 further includes:

forming a common electrode layer on the substrate after forming the color filter unit pattern, so that the common electrode layer is provided between the color filter unit pattern and the black matrix pattern.