Substrate cutting apparatus and method of cutting substrate using the same
View Patent ↗A substrate cutting apparatus includes a stage configured to support a substrate to be cut along a virtual cutting line, a laser generator configured to emit an ultraviolet (UV)-based laser beam for cutting the substrate by removing part of the substrate along the cutting line, and a beam oscillator disposed on a beam path of the laser beam and configured to perform a beam swing on the laser beam in a direction parallel to the length direction of the cutting line by oscillating a tilt angle of the laser beam toward the cutting line.
1. A substrate cutting apparatus, comprising:
a stage to support a substrate;
a laser generator to emit an ultraviolet (UV)-based laser beam to cut the substrate by removing part of the substrate along a cutting line of the substrate; and
a beam oscillator disposed on a beam path of the laser beam, the beam oscillator being configured to oscillate a tilt angle of the laser beam toward the cutting line so as to perform a beam swing on the laser beam in a direction parallel to a length direction of the cutting line.
2. The substrate cutting apparatus of claim 1 , wherein:
the laser beam is subject to the beam swing within a predetermined beam irradiation section; and
the beam irradiation section has a same length direction as the cutting line and is placed on the cutting line.
3. The substrate cutting apparatus of claim 2 , wherein the laser beam has a wavelength of 200 nm to 900 nm.
4. The substrate cutting apparatus of claim 2 , wherein the laser beam is a pulse laser beam.
5. The substrate cutting apparatus of claim 4 , wherein the laser beam having the tilt angle oscillated by the beam oscillator physically removes the substrate within the beam irradiation section.
6. The substrate cutting apparatus of claim 4 , wherein the laser beam has a unit irradiation time shorter than 50 ps (picoseconds).
7. The substrate cutting apparatus of claim 6 , wherein the laser beam has a pulse frequency ranging from 0.1 MHz to 100 MHz.
8. The substrate cutting apparatus of claim 2 , further comprising:
a transfer unit to transfer one or more of the beam oscillator and the stage in a direction parallel to the cutting line;
wherein the transfer unit moves the beam irradiation section along the cutting line.
9. The substrate cutting apparatus of claim 2 , wherein the beam oscillator includes:
a reflector to reflect the laser beam emitted from the laser generator; and
a driver to drive the reflector.
10. The substrate cutting apparatus of claim 9 , wherein the driver selectively controls a motion of the reflector so that a beam swing speed of the laser beam becomes uniform.
11. The substrate cutting apparatus of claim 1 , further comprising a cleaning unit to clean a region of the cutting line cut by the laser beam.
12. The substrate cutting apparatus of claim 1 , wherein the apparatus is configured to cut a substratehaving a thickness of 0.3 mm or less and being made of a glass-based material.
13. The substrate cutting apparatus of claim 8 , further comprising:
an additional laser generator to emit an additional laser beam, the additional laser generator being located to heat an uncut part of the substrate on the cutting line in advance of the beam irradiation section;
wherein the additional laser beam is an infrared-based laser beam.
14. A substrate cutting method, comprising:
mounting a substrate on a stage;
oscillating a tilt angle of a UV-based laser beam so as to beam-swing the laser beam along a cutting line of the substrate; and
irradiating the laser beam having the oscillating tilt angle along a length direction of the cutting line so as to cut the substrate along the cutting line.
15. The substrate cutting method of claim 14 , wherein:
the laser beam is subject to the beam swing within a predetermined beam irradiation section; and
the beam irradiation section has a same length direction as the cutting line and is placed on the cutting line.
16. The substrate cutting method of claim 15 , wherein the laser beam has a wavelength of 200 nm to 900 nm.
17. The substrate cutting method of claim 15 , wherein the laser beam subject to the beam swing is a pulse laser beam and physically removes the substrate within the beam irradiation section.
18. The substrate cutting method of claim 17 , wherein the laser beam has a unit irradiation time that is shorter than 50 ps (picoseconds) and a pulse frequency ranging from 0.1 MHz to 100 MHz.
19. The substrate cutting method of claim 15 , further comprising:
transferring one or more of a beam oscillator and the stage along a direction parallel to the cutting line;
wherein the beam irradiation section moves along the cutting line when one or more of the beam oscillator and the stage are transferred.
20. The substrate cutting method of claim 19 , further comprising:
irradiating an additional laser beam to the cutting line at a location of the cutting line in advance of the beam irradiation section moving along the cutting line so as to pre-heat the substrate at the location;
wherein the additional laser beam is an infrared-based laser beam.