Plasma generation apparatus
View Patent ↗Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.
1. An apparatus comprising:
a first plasma generation device comprising:
a first electrode;
a base electrode that is spaced apart from said first electrode;
a second electrode that opposes and is spaced apart from said base electrode;
a high voltage, low current energy source configured to generate a potential difference between said first electrode and said base electrode sufficient to cause an arc therebetween, wherein said arc between said first electrode and said base electrode is configured to reduce an impedance of an area between said second electrode and said base electrode; and
a low voltage, high current energy source connected between said second electrode and said base electrode and configured to cause a breakdown of air between said second electrode and said base electrode when said impedance is reduced and transfer said arc between said first electrode and said base electrode to and sustain between said second electrode and said base electrode;
a second plasma generation device; and
a conduit configured to direct plasma between said first and second plasma generation devices.
2. The apparatus of claim 1 , further comprising a third plasma generation device, wherein said conduit is further configured to direct plasma between said first and third plasma generation devices.
3. The apparatus of claim 1 , wherein said first and second plasma generation devices are configured to emit plasma generated therein so as to provide a plasma bridge between main electrodes that are separated by at least about 50 mm.
4. The apparatus of claim 1 , further comprising main electrodes that are separated by at least about 50 mm, wherein each of said first and second plasma generation devices is configured to emit plasma generated therein so as to provide a plasma bridge between said main electrodes.
5. The apparatus of claim 1 , wherein said second plasma generation device includes
a pair of opposing and spaced apart electrodes; and
a low voltage, high current energy source connected between said pair of opposing electrodes.
6. The apparatus of claim 5 , wherein said second plasma generation device is configured to receive plasma generated by said first plasma generation device; wherein said plasma is configured to reduce an impedance of an area between said pair of opposing electrodes sufficiently to allow an arc to be established between said pair of opposing electrodes due to said low voltage, high current energy source.
7. The apparatus of claim 5 , wherein said second plasma generation device includes an ablative material configured to be ablated when an arc exists between said pair of opposing electrodes.
8. The apparatus of claim 1 , wherein said first plasma generation device includes an ablative material configured to be ablated when an arc exists between said second and base electrodes.
9. The apparatus of claim 1 , wherein said high voltage, low current energy source is configured to produce a voltage of at least about 8 kV and a current less than or equal to about 1 A.
10. The apparatus of claim 1 , wherein said low voltage, high current energy source is configured to produce a voltage less than or equal to about 1 kV and a current of at least about 4 kA.
11. An apparatus comprising:
a first plasma generation device comprising:
a first electrode;
a base electrode that is spaced apart from said first electrode;
a second electrode that opposes and is spaced apart from said base electrode;
a high voltage, low current energy source configured to generate a potential difference between said first electrode and said base electrode sufficient to cause an arc therebetween, wherein said arc between said first electrode and said base electrode is configured to reduce an impedance of an area between said second electrode and said base electrode; and
a low voltage, high current energy source connected between said second electrode and said base electrode and configured to cause a breakdown of air between said second electrode and said base electrode when said impedance is reduced and transfer said arc between said first electrode and said base electrode to and sustain between said second electrode and said base electrode;
a second plasma generation device including
a pair of opposing and spaced apart electrodes; and
a low voltage, high current energy source connected between said pair of opposing electrodes; and
a conduit configured to direct plasma between said first and second plasma generation devices,
wherein said second plasma generation device is configured to receive plasma generated by said first plasma generation device; wherein said plasma is configured to reduce an impedance of an area between said pair of opposing electrodes sufficiently to allow an arc to be established between said pair of opposing electrodes due to said low voltage, high current energy source.
12. The apparatus of claim 11 , further comprising a third plasma generation device, wherein said conduit is further configured to direct plasma between said first and third plasma generation devices.
13. The apparatus of claim 11 , further comprising main electrodes that are separated by at least about 50 mm, wherein each of said first and second plasma generation devices is configured to emit plasma generated therein so as to provide a plasma bridge between said main electrodes.
14. The apparatus of claim 11 , wherein said first plasma generation device includes an ablative material configured to be ablated when an arc exists between said second and base electrodes.