SOLUTION DEPOSITION ASSEMBLY
Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
1 . A deposition system for use with a solution and a substrate.
2 . The system of claim 1 wherein the system comprises:
a solution deposition apparatus;
at least one heating chamber;
at least one assembly for holding a solution over the substrate; and
a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate.
3 . The system of claim 2 wherein the assembly curls at least two edges of the substrate.
4 . The system of claim 2 wherein the assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to about 10 mm.
5 . The system of claim 2 wherein the assembly for holding solution over the substrate to allow for a depth of at least about 1 mm to about 5 mm.
6 . The system of claim 2 wherein the curling apparatus curls opposing edges of the substrate.
7 . The system of claim 6 wherein the curling apparatus is configured to transition a planar substrate to a substrate with curls along two edges, wherein the transition occurs over a distance sufficient prevent permanent deformation of the substrate when the substrate is uncurled.
8 . The system of claim 6 wherein the curling apparatus is configured to transition a planar substrate to a substrate with curls along two edges over a distance of at least 4 inches.
9 . The system of claim 6 wherein the curling apparatus is configured to transition a planar substrate to a substrate with curls along two edges over a distance of at least 6 inches.
10 . The system of claim 6 wherein the curling apparatus creates curls of sufficient height to contain the volume of solution therein without allowing the solution to spill over an upper of the curl.
11 . The system of claim 6 wherein the assembly for holding solution further comprises of an uncurling apparatus for uncurling at least two edges of the substrate to return the substrate to a substantially planar configuration.
12 . The system of claim 6 wherein the curling apparatus comprise of a web guide.
13 . The system of claim 6 wherein the curling apparatus comprise of a shaped web guide.
14 . The system of claim 2 wherein the solution deposition apparatus comprises of a spray deposition system to deposit the solution over the substrate.
15 . The system of claim 2 wherein the solution deposition apparatus comprises of an ultrasonic spray deposition system to deposit the solution over the substrate.
16 . The system of claim 2 wherein the substrate comprises of a flexible material.
17 . The system of claim 2 wherein the substrate comprises of a metal foil.
18 . The system of claim 2 wherein the solution comprises a precursor for forming a junction partner for a group IB-IIIA-VIA absorber layer.
19 . The system of claim 2 wherein the solution comprises a precursor for forming a Group IIB-VIA junction partner.
20 . The system of claim 2 wherein the solution comprises a precursor for forming a junction partner selected from the group consisting of: cadmium sulfide (CdS), zinc sulfide (ZnS), zinc hydroxide, zinc selenide (ZnSe).
21 . The system of claim 2 wherein the solution comprises of a Group IIB ionic species is obtained from an aqueous solution of one or more of the following: sulfate, acetate, bromide, fluoride, chloride, iodide, hydroxide, nitrate, oxalate, citrate, phosphate, tungstate, or hydrates of the Group IIB species.
22 . The system of claim 2 wherein the solution comprises of a Group VIA ionic species is obtained from an aqueous solution of one or more of the following: oxides, halides, sulfates, nitrates, or ureates of the Group VIA species.
23 . The system of claim 2 wherein the solution has a pH of from about 9 to about 14.
24 . The system of claim 2 wherein the solution has a pH of from about 11 to about 12.
25 . The system of claim 2 wherein the assembly for holding solution is at least partially contained in the heating chamber.