Nitride semiconductor, nitride semiconductor crystal growth method, and nitride semiconductor light emitting element
View Patent ↗During the growth of a nitride semiconductor crystal on a nonpolar face nitride substrate, such as an m-face, the gas that constitutes the main flow in the process of heating up to a relatively high temperature range, before growth of the nitride semiconductor layer, (the atmosphere to which the main nitride face of the substrate is exposed) and the gas that constitutes the main flow until growth of first and second nitride semiconductor layers is completed (the atmosphere to which the main nitride face of the substrate is exposed) are primarily those that will not have an etching effect on the nitride, while no Si source is supplied at the beginning of growth of the nitride semiconductor layer. Therefore, nitrogen atoms are not desorbed from near the nitride surface of the epitaxial substrate, thus suppressing the introduction of defects into the epitaxial film. This also makes epitaxial growth possible with a surface morphology of excellent flatness.
1. A method for growing a crystal of a nitride semiconductor on a principal nitride plane of a base at least one principal plane of which is a nonpolar nitride, the method comprising:
heating the base to a predetermined temperature with the principal nitride plane of the base exposed to an atmosphere comprising a first inactive gas for a period t A ;
initially epitaxially growing a first nitride semiconductor layer on the principal nitride plane of the base with the principal nitride plane of the base exposed to an atmosphere comprising a second inactive gas and without intentional supply of a silicon (Si) source material; and
subsequently epitaxially growing a second nitride semiconductor layer on the first nitride semiconductor layer while supplying an n-type dopant source material with the surface of the first nitride semiconductor layer exposed to an atmosphere containing a third inactive gas;
wherein:
each of the first, second, and third inactive gases is independently selected from the group consisting of nitrogen (N 2 ), helium (He), argon (Ar), xenon (Xe), krypton (Kr), a hydrazine compound, an amine compound, an azide compound, and mixtures thereof;
the base is a freestanding substrate of GaN, AlN, InN, BN, or a mixed crystal thereof;
the principal nitride plane of the base is a crystal plane within ±5 degrees inclusive from a (1-100) m-plane; and
when heating the base, a component ratio of the first inactive gas to all constituent gases of the atmosphere is from 0.5 to 1.0 in terms of flow ratio.
2. A method for growing a crystal of a nitride semiconductor on a principal nitride plane of a base at least one principal plane of which is a nonpolar nitride, the method comprising:
heating the base to a predetermined temperature in an atmosphere having a main flow comprising a first inactive gas for a period t A ;
initially epitaxially growing a first nitride semiconductor layer on the principal nitride plane of the base in an atmosphere having a main flow comprising a second inactive gas and without intentional supply of a silicon (Si) source material; and
subsequently epitaxially growing a second nitride semiconductor layer on the first nitride semiconductor layer while supplying an n-type dopant source material in an atmosphere comprising a third inactive gas and constituting a main flow,
wherein:
each of the first, second, and third inactive gases is independently selected from the group consisting of nitrogen (N 2 ), helium (He), argon (Ar), xenon (Xe), krypton (Kr), a hydrazine compound, an amine compound, an azide compound, and mixtures thereof;
the base is a freestanding substrate of GaN, AIN, InN, BN, or a mixed crystal thereof;
the principal nitride plane of the base is a crystal plane within ±5 degrees inclusive from a (1-100) m-plane; and
when heating the base, a component ratio of the first inactive gas to all constituent gases of the atmosphere is from 0.5 to 1.0 in terms of flow ratio.
3. The method according to claim 1 , wherein at least one of the heating, the initially epitaxially growing, and the subsequently epitaxially growing has a period during which the atmosphere comprises ammonia (NH 3 ) gas.
4. The method according to claim 2 , wherein at least one of the heating, the initially epitaxially heating, and the subsequently epitaxially growing has a period during which the atmosphere comprises ammonia (NH 3 ) gas.
5. The method according to claim 2 , wherein before the period t A , the heating has a period t B during which the base is heated in an atmosphere comprising a main flow containing a gas composition different from the main flow of the period t A .
6. The method according to claim 2 , wherein the main flow in the initially and subsequently epitaxially growing comprises at least a first main flow and a second main flow, wherein the first main flow mainly supplies a nitrogen source material for the first and second nitride semiconductor layer, and the at least second main flow mainly supplies at least one source material for at least one non-nitrogen element for the first and second nitride semiconductor layer.
7. The method according to claim 1 , wherein the initially epitaxially growing is carried out without thermally cleaning the principal nitride plane of the base after the heating is finished.
8. The method according to claim 2 , wherein the initially epitaxially growing is carried out without thermally cleaning the principal nitride plane of the base after the heating is finished.
9. A method for growing a crystal of a nitride semiconductor on a principal nitride plane of a base at least one principal plane of which is a nonpolar nitride, the method comprising:
heating the base to a predetermined temperature with the principal nitride plane of the base exposed to an atmosphere comprising a first inactive gas for a period t A ; and
epitaxially growing a nitride semiconductor layer on the principal nitride plane of the base with the principal nitride plane of the base exposed to an atmosphere comprising a second inactive gas and without intentional supply of a silicon (Si) source material,
wherein:
each of the first and second inactive gases is independently selected from the group consisting of nitrogen (N 2 ), helium (He), argon (Ar), xenon (Xe), krypton (Kr), a hydrazine compound, an amine compound, an azide compound, and mixtures thereof;
the base is a freestanding substrate of GaN, AIN, InN, BN, or a mixed crystal thereof;
the principal nitride plane of the base is a crystal plane within ±5 degrees inclusive from a (1-100) m-plane; and
when heating the base, a component ratio of the first inactive gas to all constituent gases of the atmosphere is from 0.5 to 1.0 in terms of flow ratio.
10. The method according to claim 9 , wherein at least one of the heating and the epitaxially growing comprises a period during which the atmosphere comprises ammonia (NH 3 ) gas.
11. A nitride semiconductor light-emitting element fabricated by the method according to claim 1 .
12. A nitride semiconductor light-emitting element fabricated by the method according to claim 2 .
13. A nitride semiconductor light-emitting element fabricated by the method according to claim 9 .
14. The method according to claim 1 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is 0.75 in terms of flow ratio.
15. The method according to claim 1 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is from 0.625 to 0.75 in terms of flow ratio.
16. The method according to claim 1 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is from 0.57 to 0.64 in terms of flow ratio.
17. The method according to claim 2 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is 0.75 in terms of flow ratio.
18. The method according to claim 2 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is from 0.625 to 0.75 in terms of flow ratio.
19. The method according to claim 2 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is from 0.57 to 0.64 in terms of flow ratio.
20. The method according to claim 9 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is 0.75 in terms of flow ratio.
21. The method according to claim 9 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is from 0.625 to 0.75 in terms of flow ratio.
22. The method according to claim 9 , wherein, when heating the base, the component ratio of the first inactive gas to all the constituent gases of the atmosphere is from 0.57 to 0.64 in terms of flow ratio.