Nonvolatile memory and methods for manufacturing the same with molecule-engineered tunneling barriers
View Patent ↗Embodiments of tunneling barriers and methods for same can embed modules exhibiting a monodispersion characteristic into a dielectric layer (e.g., between first and second layers forming a dielectric layer). In one embodiment, by embedding C 60 molecules inbetween first and second insulating layers forming a dielectric layer, a field sensitive tunneling barrier can be implemented. In one embodiment, the tunneling barrier can be between a floating gate and a channel in a semiconductor structure. In one embodiment, a tunneling film can be used in nonvolatile memory applications where C 60 provides accessible energy levels to prompt resonant tunneling through the dielectric layer upon voltage application.
1. A semiconductor device comprising:
a semiconductor substrate; and
a nonvolatile memory cell provided on the semiconductor substrate, the nonvolatile memory cell comprising:
a tunnel insulating film provided over a surface of the semiconductor substrate, the tunnel insulating film comprising a layer of monodispersed molecules;
a charge storage layer provided on the tunnel insulating film;
an insulating film provided on the charge storage layer; and
a conductive layer provided on the insulating film.
2. The semiconductor device of claim 1 , wherein said monodispersed molecules include fullerene molecules.
3. The semiconductor device of claim 2 , wherein the fullerene molecules comprise C 60 molecules.
4. The semiconductor device of claim 3 , wherein C 60 molecules include variable prescribed energy level characteristics by chemical functionalization.
5. The semiconductor device of claim 1 , wherein said monodispersed molecules are conductive, and wherein the monodispersed molecules comprise C 60 molecules and a metal molecule, wherein the metal molecule comprises chromium or titanium.
6. The semiconductor device of claim 1 , wherein the layer of monodispersed molecules are between first and second tunnel insulating layers.
7. The semiconductor device according to claim 6 , wherein the first and second tunnel insulating layers or the insulating film comprise a silicon oxide film or a dielectric insulating film.
8. The semiconductor device of claim 1 , wherein the layer of monodispersed molecules is about 0.5 nm thick, less than 1 nm thick, less than 1.2 nm thick, less than 2 nm thick, or less than 3 nm thick, and wherein the first and second tunnel insulating layers are less than 8 nm thick, less than 5 nm thick, less than 3 nm thick, less than 2 nm thick, or less than 1 nm thick.
9. The semiconductor device of claim 1 comprising:
a first electrode coupled to a first impurity region in the semiconductor substrate;
a second impurity region in the semiconductor substrate; and
an electrode coupled to a channel region in the semiconductor substrate between the first impurity region and the second impurity region, wherein the tunnel insulating film is over a portion of the channel region.
10. The semiconductor device according to claim 9 , wherein the conductive layer is a control electrode, the first electrode is a source electrode and the second electrode is a drain electrode, wherein the first and second impurity regions comprise an n-type impurity or a p-type impurity.
11. The semiconductor device according to claim 1 , wherein the nonvolatile memory cell stores more than one bit of data.
12. The semiconductor device according to claim 1 , wherein the semiconductor device comprises an array of memory cells, wherein the nonvolatile memory cell is a NAND type nonvolatile memory cell, or a NOR type nonvolatile memory cell.
13. The semiconductor device of claim 1 , wherein the semiconductor device comprises a flash memory card, an EEPROM device, or a nonvolatile memory device.
14. A nonvolatile flash memory card, comprising:
a random access memory array;
an input/output unit to operatively connect the random access memory to receive or transmit data; and
a microcontroller to control data storage or data retrieval between the input/output unit and the random access memory array, wherein at least one cell of the random access memory array comprises,
a semiconductor region having a source region, a drain region, and a channel region provided between the source region and the drain region,
a first tunnel insulation film formed on the channel region,
a barrier layer formed on the first tunnel insulation film, the barrier layer comprising a layer of monodispersed molecules, the barrier layer including a prescribed energy barrier level,
a second tunnel insulation film formed on the barrier layer,
a charge storage portion formed over the second tunnel insulation film, and
a control electrode on the charge storage portion.
15. The nonvolatile flash memory card of claim 14 , wherein said barrier layer is monodispersed molecules are-fullerene molecules.
16. The nonvolatile flash memory card of claim 15 , wherein the fullerene molecules comprise C 60 molecules.
17. The nonvolatile flash memory card of claim 14 , wherein said monodispersed molecules are conductive.