IP Library Granted Patent US 9,337,407
Granted Patent B2
US 9,337,407 · App. 12/751,642 · Granted May 10, 2016

Photoelectronic element and the manufacturing method thereof

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Quick Facts
Patent No.
US 9,337,407
App. No.
12/751,642
Granted
May 10, 2016
Kind
B2
Abstract

A photoelectronic element includes an electrically insulative substrate, an electrically conductive substrate, an intermediate layer and a semiconductor stacked layer. The electrically insulative substrate has a top surface. The electrically conductive substrate has a lower portion, and an upper portion surrounded by the electrically insulative substrate and coplanar with the top surface. The intermediate layer has a first portion formed directly under the electrically insulative substrate and above the electrically conductive substrate, a second portion and a bent portion formed between the first portion and the second portion. The semiconductor stacked layer has an light-emitting active layer with a high band gap, disposed on the electrically insulative substrate and the upper portion.

Claims (14)

1. A photoelectronic element, comprising:

an electrically insulative substrate having a top surface;

an electrically conductive substrate having a lower portion, and an upper portion surrounded by the electrically insulative substrate and coplanar with the top surface;

an intermediate layer having a first portion formed directly under the electrically insulative substrate and above the electrically conductive substrate, a second portion and a bent portion formed between the first portion and the second portion; and

a semiconductor stacked layer disposed on the electrically insulative substrate and the upper portion;

wherein the semiconductor stacked layer comprises a light emitting layer with a high band gap.

2. The photoelectronic element of claim 1 , wherein the second portion surrounds the upper portion.

3. The photoelectronic element of claim 1 , wherein the electrically insulative substrate is arranged to cover a part of the lower portion and expose the upper portion.

4. The photoelectronic element of claim 1 , wherein the intermediate layer has an upper maximum width and a lower maximum width greater than the upper maximum width.

5. The photoelectronic element of claim 1 , wherein the upper portion has a thickness substantially equal to that of the electrically insulative substrate.

6. The photoelectronic element of claim 1 , wherein the electrically insulative substrate comprises an opening substantially occupied by the upper portion.

7. The photoelectronic element of claim 1 , wherein the second portion is arranged between the upper portion and the electrically insulative substrate.

8. The photoelectronic element of claim 1 , wherein the first portion is arranged between the lower portion and the electrically insulative substrate.

9. The photoelectronic element of claim 1 , wherein the intermediate layer comprises a reflective layer.

Assignments (2)
CHANGE OF NAME Recorded Apr 22, 2026
From: EPISTAR CORPORATION
To: ENNOSTAR CORPORATION
Reel/Frame 075513/0783 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 31, 2010
From: YAO, CHIU-LIN
To: EPISTAR CORPORATION
Reel/Frame 024169/0552 →