IP Library Granted Patent US 7,999,242
Granted Patent B2
US 7,999,242 · App. 12/754,927 · Granted Aug 16, 2011

Substrate holding apparatus, and inspection or processing apparatus

Assignee: Hitachi High-Technologies Corporation
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Quick Facts
Patent No.
US 7,999,242
App. No.
12/754,927
Granted
Aug 16, 2011
Kind
B2
Abstract

In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.

Claims (34)

1. An inspection apparatus which inspects a defect of a substrate comprising:

a holding unit which holds the substrate;

a light projecting unit which irradiates the substrate with light;

a light receiving unit which receives a light from the substrate; and

a processing unit which detects the defect based on a result in response to the received light, wherein said holding unit comprises:

a rotating unit which rotates the substrate;

a plurality of position restriction units which restrict the substrate corresponding to rotation of the rotating unit;

a plurality of pressing units which press the substrate corresponding to rotation of the rotating unit, and

the position restriction units include first claws, wherein:

the first claws are formed at sides of an outer periphery of each of the restriction units and contact with and press upper sides of the outer peripheral sides of the substrate, and

a contact surface of a first claw that presses the upper side of the outer peripheral side of the substrate and a rotation axis of the substrate forms an acute angle.

2. An inspection apparatus according to claim 1 , wherein the position restriction units are different from the pressing units.

3. An inspection apparatus according to claim 1 , wherein the position restriction units are specialized in positioning.

4. An inspection apparatus according to claim 1 , wherein the pressing units are specialized in pressing.

5. An inspection apparatus according to claim 1 , wherein the position restriction units are formed in a radial fashion toward the outer periphery of the holding unit from a center of the rotating unit.

6. An inspection apparatus according to claim 1 , wherein the pressing units are formed in a radial fashion toward the outer periphery of the holding unit from a center of the rotating unit.

7. An inspection apparatus according to claim 1 , wherein:

the pressing units include second claws, and

the second claws are formed at the sides of the outer periphery of each of the pressing units and contact with and press the upper sides of the outer peripheral sides of the substrate.

8. A substrate holding apparatus, for an inspection apparatus, comprising:

a rotating unit which rotates the substrate;

a plurality of position restriction units which restrict the substrate corresponding to rotation of the rotating unit; and

a plurality of pressing units which press the substrate corresponding to rotation of the rotating unit, wherein:

the position restriction units include first claws,

the first claws are formed at sides of an outer periphery of each of the restriction units and contact with and press the upper sides of the outer peripheral sides of the substrate, and

a contact surface of a first claw that presses the upper side of the outer peripheral side of the substrate and a rotation axis of the substrate forms an acute angle.

9. An inspection apparatus according to claim 8 , wherein the position restriction units are different from the pressing units.

10. An inspection apparatus according to claim 8 , wherein the position restriction units are specialized in positioning.

11. An inspection apparatus according to claim 8 , wherein the pressing units are specialized in pressing.

12. An inspection apparatus according to claim 8 , wherein the position restriction units are formed in a radial fashion toward the outer periphery of the holding unit from a center of the rotating unit.

13. An inspection apparatus according to claim 8 , wherein the pressing units are formed in a radial fashion toward the outer periphery of the holding unit from a center of the rotating unit.

14. An inspection apparatus according to claim 8 , wherein:

the pressing units include second claws, and

the second claws are formed at sides of the outer periphery of each of the pressing units and contact with and press the upper sides of the outer peripheral side of the substrate.

Priority Claims (1)
JP 2006-234631 · Aug 30, 2006 · national
Continuity (2)
Continuation 11896291 · Aug 30, 2007
Related Publication 20100196127A1 · Aug 5, 2010