IP Library Granted Patent US 8,504,311
Granted Patent B2
US 8,504,311 · App. 12/757,582 · Granted Aug 6, 2013

Method and mass flow controller for enhanced operating range

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Quick Facts
Patent No.
US 8,504,311
App. No.
12/757,582
Granted
Aug 6, 2013
Kind
B2
Abstract

A mass flow controller (MFC), a method for calibrating an MFC, and a method for operating an MFC are disclosed. The method for calibrating the MFC includes obtaining data relative to two signals from a thermal mass flow sensor when operating the mass flow controller at different flow rates with a calibration gas, and storing the data relating to the two signals in connection with corresponding flow-rate values. The method for operating the MFC includes obtaining data relative to the two signals from the thermal mass flow controller and accessing the calibration data to determine an unknown flow rate for a process gas that may be the same gas as the calibration gas or may be another gas that is different from the calibration gas.

Claims (22)

1. A mass flow controller comprising:

a bridge circuit including a first, second, third, and fourth nodes, a first resistive component being connected between the first and second nodes, a second resistive component being connected between the second and third nodes, a first sensing element being connected between the first and fourth nodes, a second sensing element being connected between the fourth and third nodes;

a first processing portion to provide a first output that is indicative of a differential voltage between the second and fourth nodes;

a second processing portion to provide a second output indicative of a top voltage between the first node and the third node;

a look-up table that maps flow values of a calibration gas with calibration data, the calibration data being based upon values of the differential voltage and the top voltage that correspond to the flow values of the calibration gas; and

a control portion configured to:

identify a flow value fcal in the calibration data that has a calibration ratio Rcal that corresponds to an operational ratio R, wherein the operational ratio R is based upon the ratio of the top voltage to the differential voltage and the calibration ratio Rcal is based upon a ratio of a calibration-top-voltage to a calibration-differential-voltage;

obtain a saturation factor SF, the saturation factor SF defined by a ratio of amplitudes of a calibration vector Vcal and an operational vector V such that SF=abs(Vcal)/abs(V), the direction of the calibration vector defined by the calibration ratio Rcal and the direction of the operational vector V defined by the operational ratio R; and

calculate an unknown flow f=fcal/SF.

2. The mass flow controller of claim 1 , wherein the look-up table maps the flow values of the calibration gas with the calibration data that includes, for each particular flow value of the calibration gas, a value indicative of the first output at the particular flow value, and a value indicative of the second output at the particular flow value.

3. The mass flow controller of claim 2 , wherein the look-up table includes, for each particular flow value, the calibration ratio Rcal is based upon a ratio of an adjusted value indicative of the second output at the particular flow value to an adjusted value indicative of the first output at the particular flow value, the adjusted values are values adjusted to remove zero-offset values.

4. The mass flow controller of claim 2 , wherein the look up table includes, for each particular flow value, an amplitude of the calibration vector Vcal that is defined by an adjusted value indicative of the second output at the particular flow value and an adjusted value indicative of the first output at the particular flow value, the adjusted values are values adjusted to remove zero-offset values.

5. The mass flow controller of claim 1 , wherein the processing portions each include an amplifier and an analog to digital converter.

6. The mass flow controller of claim 1 , wherein the control portion includes a component selected from the group consisting of a processor and memory.

7. A mass flow controller, comprising:

a thermal mass flow sensor including a bridge circuit that includes a first, second, third, and fourth nodes, a first resistive component being connected between the first and second nodes, a second resistive component being connected between the second and third nodes, a first sensing element being connected between the first and fourth nodes, a second sensing element being connected between the fourth and third nodes;

means for obtaining data indicative of a differential voltage between the second and the fourth nodes of the bridge circuit and a top voltage between the first node and the third node of the bridge circuit at an unknown flow rate;

means for determining an operational ratio R that is based upon a ratio of the top voltage to the differential voltage;

memory including a look-up table that maps flow values of a calibration gas with the calibration data, the calibration data being based upon values of the differential voltage between the second and the fourth nodes and the top voltage between the first node and the third node that correspond to the flow values of the calibration gas;

means for identifying a flow value fcal in calibration data that has a calibration ratio Rcal that corresponds to the operational ratio R, wherein the operational ratio is R is based upon the ratio of the top voltage to the differential voltage and the calibration ratio Rcal is based upon a ratio of a calibration-top-voltage to a calibration-differential-voltage;

means for obtaining a saturation factor SF, the saturation factor SF defined by a ratio of amplitudes of a calibration vector Vcal and an operational vector V such that SF=abs(Vcal)/abs(V), the direction of the calibration vector defined by the calibration ratio Rcal and the direction of the operational vector V defined by the operational ratio R; and

means for calculating an unknown flow f=fcal/SF.

Assignments (7)
CORRECTIVE ASSIGNMENT TO CORRECT THE CHANGING PATENT NUMBER 8671972 TO 8504311 PREVIOUSLY RECORDED AT REEL: 68943 FRAME: 854. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF ADDRESS. Recorded Jan 21, 2025
From: HITACHI METALS, LTD.
To: HITACHI METALS, LTD.
Reel/Frame 069959/0507 →
CORRECTIVE ASSIGNMENT TO CORRECT THE THE PATENT NUMBER FROM 8671972 TO 8504311 PREVIOUSLY RECORDED ON REEL 68943 FRAME 622. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF ADDRESS. Recorded Jan 21, 2025
From: HITACHI METALS, LTD.
To: HITACHI METALS, LTD.
Reel/Frame 069959/0644 →
CORRECTIVE ASSIGNMENT TO CORRECT THE PATENT NUMBER FROM 8671972 TO 8504311 PREVIOUSLY RECORDED ON REEL 68944 FRAME 752. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF NAME. Recorded Jan 21, 2025
From: HITACHI METALS, LTD.
To: PROTERIAL, LTD.
Reel/Frame 069959/0902 →
CHANGE OF NAME Recorded Sep 11, 2024
From: HITACHI METALS, LTD.
To: PROTERIAL, LTD.
Reel/Frame 068944/0752 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 31, 2010
From: ADVANCED ENERGY INDUSTRIES, INC.
To: HITACHI METALS, LTD.
Reel/Frame 025217/0675 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNOR PREVIOUSLY RECORDED ON REEL 024240 FRAME 0165. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF ASSIGNOR'S INTEREST. DOCKET NUMBER: AE2008.029US. Recorded Apr 21, 2010
From: ALEXEI, SMIRNOV V; ZOLOCK, MICHAEL J
To: ADVANCED ENERGY INDUSTRIES
Reel/Frame 024266/0091 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 15, 2010
From: SMIRNOV, ALEXEI V.
To: ADVANCED ENERGY INDUSTRIES
Reel/Frame 024240/0165 →