IP Library Granted Patent US 8,260,473
Granted Patent B1
US 8,260,473 · App. 12/758,225 · Granted Sep 4, 2012

Managing the operation of a semiconductor device under varying load conditions

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Quick Facts
Patent No.
US 8,260,473
App. No.
12/758,225
Granted
Sep 4, 2012
Kind
B1
Abstract

A system for managing the operation of a semiconductor device in accordance with varying load conditions that affect the power being dissipated by the semiconductor device, includes a sensor for measuring a temperature related to the junction temperature of an operating semiconductor device; electronic components for measuring the real-time operating load conditions of the operating semiconductor device; and a computer that is adapted by computer executable program instructions to perform the steps of: (a) determining the power being dissipated by the operating semiconductor device in accordance with the measured real-time operating load conditions of the semiconductor device; (b) determining a dynamic temperature cutback threshold for the operating semiconductor device in accordance with the determination of the power being dissipated; and (c) managing the operation of the semiconductor device in accordance with the measured temperature and the dynamic temperature cutback threshold.

Claims (58)

1. A method of managing the operation of a semiconductor device in accordance with varying load conditions that affect the power being dissipated by the semiconductor device, comprising the steps of:

(a) measuring a temperature related to the junction temperature of an operating semiconductor device;

(b) measuring the real-time operating load conditions of the operating semiconductor device;

(c) determining the power being dissipated by the operating semiconductor device in accordance with the measured real-time operating load conditions of the semiconductor device;

(d) determining a dynamic temperature cutback threshold for the operating semiconductor device in accordance with the determination of the power being dissipated; and

(e) managing the operation of the semiconductor device in accordance with the measured temperature and the dynamic temperature cutback threshold.

2. A method according to claim 1 , wherein step (b) comprises the steps of;

(f) measuring the power being supplied to the semiconductor device;

(g) measuring the forward power from the semiconductor device to a load;

(h) measuring the power reflected back to the semiconductor device from the load; and

wherein step (c) comprises the step of:

(i) processing signals representative of the power (V DC )(I DC ) being supplied to the semiconductor device, the forward power P FWD from the semiconductor device to a load, and the power reflected P RFL back to the semiconductor device from the load to determine the power being dissipated P DISP by the semiconductor device in accordance with:

P DISP =( V DC ) (I DC )−{( P FEW −P RFL )/ IL FACTOR },

wherein IL FACTOR is the insertion loss factor from the semiconductor device to the load.

3. A method according to claim 2 , wherein step (a) comprises the step of:

(j) using a temperature sensor mounted on or adjacent the case of the semiconductor device to measure said temperature related to the internal junction temperature of the semiconductor device; and

wherein step (d) comprises the step of;

(k) processing signals representative of the power being dissipated P DISP by the semiconductor device, the specified thermal resistance R θ(J-C) from the semiconductor junction to the case of the semiconductor device, the specified thermal resistance R θ(C-S) from the case of the semiconductor device to the temperature sensor, and a specified maximum attainable junction temperature T JMAX of the semiconductor device to determine the dynamic temperature cutback threshold T CB in accordance with:

T CB =T JMAX −{P DISP }{R θ(J-C) }−{R θ(C-S) }.

4. A method according to claim 1 , wherein step (a) comprises the step of:

(f) using a temperature sensor mounted on or adjacent the case of the semiconductor device to measure said temperature related to the internal junction temperature of the semiconductor device; and

wherein step (d) comprises the step of;

(g) processing signals representative of the power being dissipated P DISP by the semiconductor device, the specified thermal resistance R θ(J-C) from the semiconductor junction to the case of the semiconductor device, the specified thermal resistance R θ(C-S) from the case of the semiconductor device to the temperature sensor, and a specified maximum attainable junction temperature T JMAX of the semiconductor device to determine the dynamic temperature cutback threshold T CB in accordance with:

T CB =T JMAX −{P DISP }{R θ(J-C) }−{P DISP }{R θ(C-S) }.

5. A system for managing the operation of a semiconductor device in accordance with varying load conditions that affect the power being dissipated by the semiconductor device, comprising:

means for measuring a temperature related to the junction temperature of an operating semiconductor device;

means for measuring the real-time operating load conditions of the operating semiconductor device;

computer means adapted for determining the power being dissipated by the operating semiconductor device in accordance with the measured real-time operating load conditions of the semiconductor device;

computer means adapted for determining a dynamic temperature cutback threshold for the operating semiconductor device in accordance with the determination of the power being dissipated; and

computer means adapted for managing the operation of the semiconductor device in accordance with the measured temperature and the dynamic temperature cutback threshold.

6. A system according to claim 5 , wherein the means for measuring said operating conditions comprises:

means for measuring the power being supplied to the semiconductor device;

means for measuring the forward power from the semiconductor device to a load;

means for measuring the power reflected back to the semiconductor device from the load; and

wherein the computer that is adapted for determining the power being dissipated is adapted for processing signals representative of the power (V DC )(I DC ) being supplied to the semiconductor device, the forward power P FWD from the semiconductor device to a load, and the power reflected P RFL back to the semiconductor device from the load to determine the power being dissipated P DISP by the semiconductor device in accordance with:

P DISP =( V DC )( I DC )−{( P FWD −P RFL )/ IL FACTOR },

wherein IL FACTOR is the insertion loss factor from the semiconductor device to the load.

7. A system according to claim 5 , wherein the means for measuring said temperature related to the internal junction temperature of the semiconductor device comprises a temperature sensor disposed on or adjacent the case of the semiconductor device; and

wherein the computer that is adapted for determining a dynamic temperature cutback threshold is adapted for processing signals representative of the power being dissipated P DISP by the semiconductor device, the specified thermal resistance R θ(J-C) from the semiconductor junction to the case of the semiconductor device, the specified thermal resistance R θ(C-S) from the case of the semiconductor device to the temperature sensor, and a specified maximum attainable junction temperature T JMAX of the semiconductor device to determine the dynamic temperature cutback threshold T CB in accordance with:

T CB =T JMAX −{P DISP }{R θ(J-C) }−{P DISP }{R θ(C-S) }.

8. A system according to claim 5 , wherein the means for measuring said temperature related to the internal junction temperature of the semiconductor device comprises a temperature sensor disposed on or adjacent the case of the semiconductor device; and

wherein the computer that is adapted for determining a dynamic temperature cutback threshold is adapted for processing signals representative of the power being dissipated P DISP by the semiconductor device, the specified thermal resistance R θ(J-C) from the semiconductor junction to the case of the semiconductor device, the specified thermal resistance R θ(C-S) from the case of the semiconductor device to the temperature sensor, and a specified maximum attainable junction temperature T JMAX of the semiconductor device to determine the dynamic temperature cutback threshold T CB in accordance with:

T CB =T JMAX −{P DISP }{R θ(J-C) }−{P DISP }{R θ(C-S) }.

9. A non-transitory computer readable storage medium for use with a computer in a system for managing the operation of a semiconductor device in accordance with varying load conditions that affect the power being dissipated by the semiconductor device; said system comprising: means for measuring a temperature related to the junction temperature of an operating semiconductor device; means for measuring the real-time operating load conditions of the operating semiconductor device; and said computer,

wherein the computer readable storage medium contains computer executable program instructions for causing the computer to perform the steps of:

(a) determining the power being dissipated by the operating semiconductor device in accordance with the measured real-time operating load conditions of the semiconductor device;

(b) determining a dynamic temperature cutback threshold for the operating semiconductor device in accordance with the determination of the power being dissipated; and

(c) managing the operation of the semiconductor device in accordance with the measured temperature and the dynamic temperature cutback threshold.

10. A non-transitory computer readable storage medium according to claim 9 , wherein the means for measuring the real-time operating load conditions of the operating semiconductor device is adapted for measuring the power being supplied to the semiconductor device, the forward power from the semiconductor device to a load; and the power reflected back to the semiconductor device from the load; and

wherein the computer readable storage medium contains computer executable program instructions for causing the computer to perform step (a) by processing signals representative of the power (V DC )(I DC ) being supplied to the semiconductor device, the forward power P FWD from the semiconductor device to a load, and the power reflected P RFL back to the semiconductor device from the load to determine the power being dissipated P DISP by the semiconductor device in accordance with:

P DISP =( V DC )( I DC )−{( P FWD −P RFL )/ IL FACTOR },

wherein IL FACTOR is the insertion loss factor from the semiconductor device to the load.

11. A non-transitory computer readable storage medium according to claim 10 , wherein the temperature related to the internal junction temperature of the semiconductor device is measured by using a temperature sensor mounted on or adjacent the case of the semiconductor device; and

wherein the computer readable storage medium contains computer executable program instructions for causing the computer to perform step (b) by processing signals representative of the power being dissipated P DISP by the semiconductor device, the specified thermal resistance R θ(J-C) from the semiconductor junction to the case of the semiconductor device, the specified thermal resistance R θ(C-S) from the case of the semiconductor device to the temperature sensor, and a specified maximum attainable junction temperature T JMAX of the semiconductor device to determine the dynamic temperature cutback threshold T CB in accordance with:

T CB =T JMAX −{P DISP }{R θ(J-C) }−{P DISP }{R θ(C-S) }.

12. A non-transitory computer readable storage medium according to claim 9 , wherein the temperature related to the internal junction temperature of the semiconductor device is measured by using a temperature sensor mounted on or adjacent the case of the semiconductor device; and

wherein the computer readable storage medium contains computer executable program instructions for causing the computer to perform step (b) by processing signals representative of the power being dissipated P DISP by the semiconductor device, the specified thermal resistance R θ(J-C) from the semiconductor junction to the case of the semiconductor device, the specified thermal resistance R θ(C-S) from the case of the semiconductor device to the temperature sensor, and a specified maximum attainable junction temperature T JMAX of the semiconductor device to determine the dynamic temperature cutback threshold T CB in accordance with:

T CB =T JMAX −{P DISP }{R θ(J-C) }−{P DISP }{R θ(C-S) }.

Assignments (6)
RELEASE (REEL 039675 / FRAME 0908) Recorded Oct 1, 2018
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: DYNAMICS RESEARCH CORPORATION; ENGILITY LLC
Reel/Frame 047169/0188 →
CHANGE OF NAME Recorded Aug 26, 2016
From: L-3 SERVICES, INC.
To: ENGILITY LLC
Reel/Frame 039849/0615 →
CHANGE OF NAME Recorded Aug 26, 2016
From: L-3 SERVICES, INC.; L-3 SERVICES, INC./ENGILITY COPRORATION
To: ENGILITY LLC
Reel/Frame 039849/0714 →
SECURITY AGREEMENT Recorded Aug 15, 2016
From: ENGILITY CORPORATION; ENGILITY LLC; DYNAMICS RESEARCH CORPORATION
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039675/0908 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 16, 2014
From: L-3 SERVICES, INC.
To: L-3 COMMUNICATIONS SERVICES, INC.
Reel/Frame 033747/0431 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2010
From: O'BRIEN, THOMAS DANIEL; RODZINKA, MARK DAVID; TRABOLD, JOSEPH GERARD
To: L-3 SERVICES, INC.
Reel/Frame 024220/0957 →