Organic light emitting diode display device and method of manufacturing the same

1. An organic light emitting diode (OLED) display device comprising:

a substrate;

a display unit formed on a display area of the substrate; and

an encapsulating film covering i) the display unit and ii) a non-display area surrounding the display area, wherein the density and thickness of the encapsulating film increase in a direction from a center portion of the encapsulating film to an edge portion of the encapsulating film.

2. The OLED display device of claim 1 , wherein the density and thickness of the encapsulating film in the non-display area are greater than that of the encapsulating film in the display area.

3. The OLED display device of claim 1 , wherein the density and thickness of the encapsulating film increase significantly in the border region between the display area and non-display area.

4. The OLED display device of claim 1 , wherein the encapsulating film is formed of at least one of an inorganic film and an organic film, or formed by alternating the inorganic film and the organic film.

5. The OLED display device of claim 4 , wherein the inorganic film is formed of at least one of the following: SiNx, SiOx, AlOx, SiCxNy, SiOxNy, amorphous carbon, InOx, and YbOx.

6. The OLED display device of claim 1 , wherein the encapsulating film comprises at least three layers which alternate an inorganic layer and an organic layer.

7. A method of manufacturing an organic light emitting diode (OLED) display device, the method comprising:

providing a substrate;

forming a display unit on a display area of the substrate; and

forming an encapsulating film so as to cover i) the display unit and ii) a non-display area surrounding the display area, wherein the density and thickness of the encapsulating film increase in a direction from a center portion of the encapsulating film to an edge portion of the encapsulating film.

8. The method of claim 7 , wherein the forming of the encapsulating film comprises:

forming a temperature gradient on the substrate; and

applying an encapsulating film material to the substrate where the temperature gradient is formed.

9. The method of claim 8 , wherein the forming of the temperature gradient comprises:

placing a mask comprising a hot wire on the substrate; and

heating the hot wire so as to heat the non-display area.

10. The method of claim 9 , wherein a plurality of openings are defined in the mask, wherein at least one of the openings has a size to cover the display unit and a portion of the non-display area.

11. The method of claim 7 , wherein the forming of the encapsulating film comprises:

stacking at least one of an inorganic layer and an organic layer.

12. The method of claim 7 , wherein the forming of the encapsulating film comprises alternately stacking an inorganic layer and an organic layer.

13. The method of claim 7 , wherein the inorganic layer is formed of at least one of the following: SiNx, SiOx, AlOx, SiCxNy, SiOxNy, amorphous carbon, InOx, and YbOx.

14. The method of claim 7 , wherein the encapsulating film is formed by at least one of the following: a sputter, a thermal evaporator, chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), ion beam assisted deposition (IBAD), and atomic layer deposition (ALD).

15. An organic light emitting diode (OLED) display device comprising:

a substrate;

a display area in which at least one OLED is formed;

a non-display area surrounding the display area; and

an encapsulating film substantially completely covering the display area and covering at least part of the non-display area, wherein at least one of the density and thickness of the encapsulating film in the covered non-display area is greater than that of the encapsulating film in the display area.

16. The OLED display device of claim 15 , wherein at least one of the density and thickness of the encapsulating film increases in a direction from a center portion of the encapsulating film to an edge portion of the encapsulating film, and wherein a majority of the edge portion is formed in the covered non-display area.

17. The OLED display device of claim 15 , wherein the thickness of the encapsulating film rapidly increases in the border region between the display area and non-display area.

18. The OLED display device of claim 15 , wherein the encapsulating film comprises a plurality of layers.

19. The OLED display device of claim 18 , wherein the plurality of layers comprise at least one inorganic layer and at least one organic layer.

20. The OLED display device of claim 18 , wherein the plurality of layers include at least three layers which alternate an inorganic layer and an organic layer.