High efficiency epitaxial chemical vapor deposition (CVD) reactor
The present disclosure presents a chemical vapor deposition reactor having improved chemical utilization and cost efficiency. The wafer susceptors of the present disclosure may be used in a stackable configuration for processing many wafers simultaneously. The reactors of the present disclosure may be reverse-flow depletion mode reactors, which tends to provide uniform film thickness and a high degree of chemical utilization.
1. A depletion mode reactor for depositing a chemical on a first surface of a plurality of wafers simultaneously according to a chemical vapor deposition process, said reactor comprising:
a reversible first port positioned on a first side of a first surface of a wafer and providing the supply or exhaust of a chemical;
a plurality of first baffle channels, each of said first baffle channels coupled to said first port and through each of which a chemical may flow to a wafer insert pocket;
a plurality of vertically stacked susceptor plates, each comprising a wafer insert pocket exposing a first surface of a wafer to said chemical, each of said wafer insert pockets being coupled to a first baffle channel and a second baffle channel, said vertically stacked susceptor plates providing a flow path for said chemical across a first surface of each of said wafers;
a plurality of second baffle channels, each of said second baffle channels coupled to a second reversible port and through each of which a chemical may flow to said wafer insert pocket; and
a reversible second port positioned on a second side of a first surface of a wafer and providing the supply or exhaust of a chemical;
said reversible ports, said baffle channels, and said plurality of vertically stacked susceptor plates providing a chemical flow path;
wherein said first reversible port and said reversible second port are capable of operating in either a supply mode or an exhaust mode to alternate the flow of chemical across said first surface of said wafer.
2. The reactor of claim 1 , further comprising a heating lamp.
3. The reactor of claim 2 , further comprising a quartz muffle.
4. The reactor of claim 1 , further comprising a quartz muffle.
5. The reactor of claim 1 wherein said reactor is a batch stack reactor and said vertically stacked susceptor plates each comprise a plurality of wafer insert pockets arranged in a horizontal matrix.
6. The reactor of claim 1 wherein said reversible first port comprises a plurality of reversible first ports having at least one TCS source port and at least one H 2 source port, and said reversible second port comprises a plurality of second ports having at least one TCS source port and at least one H 2 source port.
7. A depletion mode reactor for depositing a chemical on a first primary surface and a second primary surface of a plurality of wafers simultaneously according to a chemical vapor deposition process, said reactor comprising:
a reversible first port positioned on a first side of said first primary surface and said second primary surface of a wafer and providing the supply or exhaust of a chemical;
a plurality of first double-sided baffle channels, each of said first double-sided baffle channels coupled to said first port and through each of which a chemical may flow to a wafer insert pocket;
a plurality of vertically stacked dual sided susceptor plates each comprising a wafer insert pocket for exposing said first primary surface and said second primary surface of said wafer to said chemical, each of said wafer insert pockets being coupled to said first double-sided baffle channel and a second double-sided baffle channel, said vertically stacked dual sided susceptor plates providing a flow path for said chemical across a first surface of each of said wafers;
a plurality of second double-sided baffle channels, each of said second double-sided baffle channels coupled to a second reversible port and through each of which a chemical may flow to said wafer insert pocket; and
a reversible second port positioned on a second side of said first primary surface and said second primary surface of a wafer and providing the supply or exhaust of a chemical;
said reversible ports, said double-sided baffle channels, and said plurality of vertically stacked susceptor plates providing a chemical flow path;
wherein said reversible first port and said reversible second port are capable of operating in either a supply mode or an exhaust mode to alternate the flow of chemical across said first primary surface and said second primary surface of said wafer.
8. The reactor of claim 7 , further comprising a heating lamp.
9. The reactor of claim 8 , further comprising a quartz muffle.
10. The reactor of claim 7 , further comprising a quartz muffle.
11. The reactor of claim 7 wherein said reactor is a batch stack reactor and said vertically stacked susceptor plates each comprise a plurality of wafer insert pockets arranged in a horizontal matrix.
12. The reactor of claim 7 wherein said reversible first port comprises a plurality of reversible first ports having at least one TCS source port and at least one H 2 source port, and said reversible second port comprises a plurality of second ports having at least one TCS source port and at least one H 2 source port.