Cyclic self-limiting CMP removal and associated processing tool
A cyclic method of chemical mechanical polishing (CMP) a wafer having a surface includes placing the wafer on a platen in a CMP apparatus and then performing a multi-step CMP comprising process. The multi-step CMP process includes delivering a first chemical composition onto the wafer while on the platen for a first time duration, and without removing the wafer from the platen, delivering a second chemical composition different from the first composition onto the wafer for a second time duration after the first time duration. The multi-step CMP comprising process includes CMP removal using a slurry during one of the first and second time durations and a non-polishing process during the other of the first and second time durations. The multi-step CMP comprising process is repeated a plurality of times.
1. A cyclic method of chemical mechanical polishing (CMP) a wafer having a surface, comprising:
placing said wafer on a platen in a CMP apparatus which includes a polishing pad;
performing a multi-step CMP comprising process, comprising the steps of:
delivering a first chemical composition onto said surface of said wafer while on said platen for a first time duration, and
without removing said wafer from said platen, delivering a second chemical composition different from said first chemical composition onto said surface of said wafer for a second time duration after said first time duration,
performing a CMP removal process with contact of said polishing pad to said surface of said wafer using a slurry including said first chemical composition during said first time duration or said second chemical composition during said second time duration, and a non-polishing process without any contact of said polishing pad to said surface of said wafer using the other of said first chemical composition and said second chemical composition during the other of said first and said second time durations, and
repeating said multi-step CMP comprising process a plurality of times on said wafer.
2. The method of claim 1 , wherein said surface of said wafer comprises a metal surface and said first chemical composition includes at least one chemical component that reacts with said metal surface to form a reacted layer, further wherein said CMP removal process removes said reacted layer during said second time duration.
3. The method of claim 2 , wherein said reacted layer is softer as compared to said metal surface.
4. The method of claim 2 , wherein said metal surface comprises copper.
5. The method of claim 2 , wherein said reacted layer comprises a metal halide.
6. The method of claim 5 , wherein said metal halide comprises copper iodide (CuI).
7. The method of claim 1 , wherein said surface of said wafer comprises a dielectric surface and said first chemical composition includes at least one surfactant or surface active polymer, said CMP removal process occurring during said first time duration, said surfactant or surface active polymer forming a surface passivation layer on said dielectric surface, formation of said surface passivation layer on said dielectric surface reducing a removal rate of said CMP removal process, wherein said non-polishing process comprises removing said surface passivation layer.
8. The method of claim 7 , wherein said dielectric surface comprises an ultra low-k (ULK) dielectric.
9. The method of claim 7 , wherein said surfactant is at least one selected from the group consisting of non-ionic, anionic, cationic and zwitterionic surfactants.
10. The method of claim 7 , wherein said surface active polymer additive comprises polyethylene oxide (PEO), polyacrylic acid (PAA), polyacryamide (PAM), polyvinylalcohol (PVA) or polyalkylamine (PAH).
11. The method of claim 1 , wherein said slurry comprises a plurality of soft particles, and wherein said soft particles are softer as compared to a hardness of copper.
12. The method of claim 11 , wherein said plurality of soft particles comprise polymer or nano-porous particles.
13. The method of claim 11 , wherein said plurality of soft particles comprise at least one selected from the group consisting of polystyrene, polytetrafluoroethylene, polyamide, silver and porous silica.
14. The method of claim 1 , wherein said plurality of times includes at least four (4) times.