Composition for treating acid gas
View Patent ↗This invention provides novel compositions comprising substituted polyamines as acid gas scrubbing solutions and methods of using the compositions in an industrial system. The invention relates to the use of such polyamine compounds in industrial processes to remove acidic contaminants from natural and industrial fluid streams, such as natural gas, combustion gas, natural gas, synthesis gas, biogas, and other industrial fluid streams. The compositions and methods of the invention are useful for removal, absorption, or sequestration of acidic contaminants and sulfide contaminants including CO 2 , H 2 S, RSH, CS 2 , COS, and SO 2 .
1. A process for reducing acidic contaminants in an industrial fluid stream, the process comprising: (A) contacting the fluid stream with a composition to form a washed fluid stream and an acid gas scrubbing liquid, the composition comprising:
(a) at least one absorbent component having a general formula, including carbonates, bicarbonates, carbamates, ureas, and amides thereof, and salts thereof:
(i) each R 1 is independently selected from the group consisting of: H, alkyl, and the following structure (A);
(ii) R 2 is structure B, C, or D;
(iii) each R 3 is an alkyl, wherein the alkyl for each occurrence of R 3 is independently selected;
(iv) each R 4 and R 5 are independently H, alkyl, or structure A;
(v) each m is independently an integer from 0 to 2;
(vi) n is an integer from 2 to 6;
(vii) each k is independently an integer from 0 to 2; and
(viii) a solvent,
and (B) regenerating at least a portion of the composition including at least a portion of the absorbent compound(s) from the acid gas scrubbing liquid.
2. The process of claim 1 , wherein step (A) is carried out in a temperature range from about 0 to about 200° C.
3. The process of claim 1 , wherein step (A) is carried out at a pressure range from about 0 to about 150 atm.
4. The process of claim 1 , wherein step (B) is carried out in a temperature range from about 0 to about 500° C.
5. The process of claim 1 , wherein step (B) is carried out at a pressure range from about 0 to about 10 atm.
6. The process of claim 1 , wherein step (B) is carried out via a steam-assisted reboiler.
7. The process of claim 1 , wherein step (B) is carried out via fractional regeneration.
8. The process of claim 1 , wherein each of the alkyls is independently selected from the group consisting of: methyl, ethyl, and propyl.
9. The process of claim 1 , wherein said absorbent component is selected from the group consisting of (I), (II), (III), (IV), (V), (VI), (VII) and combinations thereof:
10. The process of claim 1 , wherein said absorbent component is selected from the group consisting of (VIII), (IX), (X) (XI), (XII), (XIII), (XIV) and combinations thereof:
11. The process of claim 1 , wherein said absorbent component is selected from the group consisting of (XV), (XVI), (XVII), (XVIII), (XIX), (XX), (XXI), (XXII) and combinations thereof:
12. The process of claim 1 , wherein the composition further comprises, further comprising one or more components selected from the group consisting of: 2-aminopropyl-piperazine; 2-aminobutyl-piperazine; 1-acetylpiperazine; 1-formylpiperazine; 1,4-bis-aminoethyl-piperazine; 1,4-bis-aminopropyl-piperazine; 1,4-bisaminobutyl-piperazine; 1,4-bis-(2-aminopropyl)-piperazine; 1,4-bis-(2-aminobutyl)-piperazine; 1,4-bis-(N-methyl-aminoethyl)-piperazine; 1-(2-aminobutyl)-4-methylpiperazine; 1-(2-aminopropyl)-4-methylpiperazine; 1-(2-aminopropyl)-4-ethylpiperazine; 1-aminoethyl-4-(2-aminobutyl)-piperazine; 1-aminoethyl-4-(2-aminopropyl)-piperazine; 1-aminoethyl-4-(N-methyl-aminoethyl)-piperazine; 2-morpholinoethanamine; 2-aminopropyl-morpholine; 2-(1H-imidazol-1-yl)ethanamine; 2-aminopropyl-piperidine; 2-aminopropyl-pyrolidine; N1-(2-aminopropyl)butane-1,4-diamine; N1-(3-aminopropyl)propane-1,2-diamine; water; sulfolane, N-methylpyrrolidone; N-alkylated pyrrolidones, piperidones and morpholines corresponding to the foregoing; methanol; mixtures of dialkyl ethers of polyethylene glycols; C 1 to C 4 dialkylether monoethylene glycols; C 1 to C 4 monoether monoethylene glycols; C 1 to C 4 dialkylether poly ethylene glycols; C 1 to C 4 monoether polyethylene ethylene glycols; C 1 to C 4 ; ethylene glycol; diethylene glycol; triethylene glycol; N,N-dimethyl formamide; N-acetyl morpholine; N-formyl morpholine; N,N-dimethyl imidazolidin-2-one; N-methyl imidazole; and combinations thereof.
13. The process of claim 1 , wherein the acidic contaminant is selected from the group consisting of CO 2 , H 2 S, RSH, CS 2 , COS, SO 2 , and combinations thereof.
14. The process of claim 1 , wherein said absorbent compound is present in an amount ranging from about 0.01 to about 100 wt %.
15. The process of claim 1 , wherein the composition further comprises, further comprising one or more components selected from the group consisting of amines, activators, antifoaming agents, co-absorbents, corrosion inhibitors, coloring agents, and combinations thereof.
16. The process of claim 1 , wherein the solvent is selected from the group consisting of: water, alcohols, polyols, other acid gas solvents organic solvents, and combinations thereof.