Method of forming a dielectric layer on a semiconductor light emitting device

1. A device comprising:

a semiconductor structure comprising a light emitting layer disposed between an n-type region and a p-type region;

a first metal contact disposed on a portion of the n-type region and a second metal contact disposed on a portion of the p-type region, wherein:

the first and second metal contacts are formed on a same side of the semiconductor structure;

the first and second metal contacts are substantially planar; and

the first metal contact is in direct contact with the n-type region and the second metal contact is in direct contact with the p-type region; wherein the first metal contact is formed on a portion of the n-type region exposed by etching away a portion of the p-type region and the light emitting layer

a dielectric material disposed between the first and second metal contacts, wherein the dielectric material is in direct contact with a portion of the semiconductor structure, a portion of the first metal contact, and a portion of the second metal contact; and

a top surface of the device, including a surface of the first metal contact, a surface of the second metal contact, and a surface of the dielectric material, is sufficiently planar to support the semiconductor structure during removal of a growth substrate.

2. The device of claim 1 wherein the first metal contact substantially surrounds the second metal contact.

3. The device of claim 1 wherein a top surface of the dielectric layer is less than 500 nm below a top surface of the second metal contact.

4. The device of claim 1 wherein the first metal contact surrounds the light emitting layer and includes a plurality of fingers which extend toward a center of the device.

5. The device of claim 1 wherein first metal contact is thicker than the second metal contact.

6. The device of claim 1 wherein the dielectric material is one of a polymer, polyimide, and benzocyclobutene.