Low-irritation compositions and methods of making the same
View Patent ↗Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.
1. A composition comprising a low molecular weight, hydrophobically-modified polymeric material derived from cellulose, such material having a molecular weight of from about 3,500 to about 100,000 g/mol and having one or more hydrophobes comprising six carbons or more, and at least one betaine surfactant.
2. The composition of claim 1 wherein said low molecular weight polymeric material and surfactant exhibit a C 90 value of greater than 250 mg/L.
3. The composition of claim 1 wherein said composition has a Delta CMC of at least about 80.
4. The composition of claim 1 wherein said reduced irritation composition has a TEP of about 1.5 or greater.
5. The composition of claim 1 wherein said betaine comprises an alkyl betaine.
6. The composition of claim 1 wherein said betaine comprises an amidoalkyl betaine.
7. The composition of claim 6 wherein said betaine comprises cocamidopropyl betaine.
8. A method of cleansing the skin comprising contacting the skin with a composition of claim 1 .