High-productivity porous semiconductor manufacturing equipment
This disclosure enables high-productivity fabrication of semiconductor-based separation layers (made of single layer or multi-layer porous semiconductors such as porous silicon, comprising single porosity or multi-porosity layers), optical reflectors (made of multi-layer/multi-porosity porous semiconductors such as porous silicon), formation of porous semiconductor (such as porous silicon) for anti-reflection coatings, passivation layers, and multi-junction, multi-band-gap solar cells (for instance, by forming a variable band gap porous silicon emitter on a crystalline silicon thin film or wafer-based solar cell). Other applications include fabrication of MEMS separation and sacrificial layers for die detachment and MEMS device fabrication, membrane formation and shallow trench isolation (STI) porous silicon (using porous silicon formation with an optimal porosity and its subsequent oxidation). Further the disclosure is applicable to the general fields of Photovoltaics, MEMS, including sensors and actuators, stand-alone, or integrated with integrated semiconductor microelectronics, semiconductor microelectronics chips and optoelectronics.
1. An apparatus for producing a layer of porous semiconductor on a plurality of semiconductor wafers, comprising:
a first electrode and a second electrode for producing an electrical current, wherein said first electrode and said second electrode are operable to alternate or modulate current and voltage polarity at least one cycle after a predetermined period of time;
a plurality of semiconductor wafers in a stacked arrangement, wherein each said semiconductor wafer is held in place by a perimeter wafer seal disposed around a perimeter of said semiconductor wafer, and wherein said stacked arrangement may be at any angle relative to vertical;
an electrolyte supply for providing an electrolyte to said apparatus; and
a plurality of electrolyte channels or electrolyte compartments disposed between each of said plurality of semiconductor wafers for providing said electrolyte to at least a surface of each said semiconductor wafer and for removing a gas from said surface.
2. The apparatus of claim 1 , wherein said plurality of semiconductor wafers comprises a plurality of silicon wafers.
3. The apparatus of claim 1 , wherein said plurality of semiconductor wafers comprises either a plurality of square semiconductor wafers or a plurality of pseudo-square semiconductor wafers.
4. The apparatus of claim 1 , wherein said plurality of semiconductor wafers comprises a plurality of substantially circular semiconductor wafers.
5. The apparatus of Claim 1 , wherein said first electrode and said second electrode are operable to produce said electrical current at a plurality of predetermined levels for producing a plurality of layers having distinct porosities.
6. The apparatus of claim 5 , wherein said plurality of predetermined levels comprises a set of discrete levels for multi-layer porosity.
7. The apparatus of claim 5 , wherein said plurality of predetermined levels comprises a continuum of levels for graded porosity.
8. The apparatus of claim 1 , wherein each said wafer seal comprises a conforming edge seal for adapting to a range of wafer diameters and wafer thicknesses.
9. An apparatus for producing a layer of porous semiconductor on a plurality of semiconductor wafers, comprising:
a first electrode and a second electrode for producing an electrical current, wherein said first electrode and said second electrode are operable to alternate or modulate current and voltage polarity at least one cycle after a predetermined period of time;
a plurality of arrays of semiconductor wafers in a stacked arrangement, wherein each said semiconductor wafer is held in place by a perimeter wafer seal disposed around a perimeter of said semiconductor wafer, and wherein said stacked arrangement may be at any angle relative to vertical;
an electrolyte supply for providing an electrolyte to said apparatus; and
a plurality of electrolyte channels or electrolyte compartments disposed between each of said plurality of arrays of semiconductor wafers for providing said electrolyte to at least a surface of each said semiconductor wafer and for removing a gas from said surface.
10. The apparatus of claim 9 , wherein each said semiconductor wafer of said plurality of arrays of semiconductor wafers comprises either a square semiconductor wafer or a pseudo-square semiconductor wafer.
11. The apparatus of claim 9 , wherein each said semiconductor wafer of said plurality of arrays of semiconductor wafers comprises a substantially circular semiconductor wafer.
12. The apparatus of Claim 9 , wherein said first electrode and said second electrode are operable to produce said electrical current at a plurality of predetermined levels for producing a plurality of layers having distinct porosities.
13. The apparatus of claim 12 , wherein said plurality of predetermined levels comprises a set of discrete levels for multi-layer porosity.
14. The apparatus of claim 12 , wherein said plurality of predetermined levels comprises a continuum of levels for graded porosity.
15. The apparatus of claim 9 , wherein each said wafer seal comprises a conforming edge seal for adapting to a range of wafer diameters and wafer thicknesses.