Miniaturized microparticles
View Patent ↗A system and method for forming encoded microparticles is described. One embodiment includes a system for forming encoded microparticles, the system comprising a step and repeat exposure system capable of performing a method comprising: printing at a first time a first portion of a code of a microparticle; and printing at a second time after the first time a second portion of the code of the microparticle; and a computer readable medium having a sequence of computer executable instructions for controlling the step and repeat exposure system to perform said method.
1. A system for forming encoded microparticles, the system comprising:
a step and repeat exposure system capable of performing a method comprising:
printing a code pattern at a first time to form a first portion of a code of a microparticle; and
printing the code pattern at a second time after the first time to form a second portion of the code of the microparticle; and
a computer readable medium having a sequence of computer executable instructions for controlling the step and repeat exposure system to perform said method.
2. The system of claim 1 , wherein the step and repeat exposure system is capable of performing the method further comprising:
printing the code pattern at the second time to form the second portion of the code of the microparticle, wherein the second portion of the code is printed at a lateral offset to the first portion of the code.
3. The system of claim 1 , wherein the step and repeat exposure system includes a reticle, and wherein the reticle contains the code pattern.
4. The system of claim 3 , wherein the reticle has the code pattern for multiple microparticles.
5. The system of claim 3 , wherein the step and repeat exposure system is capable of performing the method comprising:
exposing a substrate to light transmitted through the reticle, thereby printing the first portion of the code of the microparticle;
moving the reticle; and
exposing the substrate to light transmitted through the reticle, thereby printing the second portion of the code of the microparticle.
6. The system of claim 5 , wherein the step and repeat exposure system is capable of performing the method comprising:
exposing a substrate to light transmitted through the reticle, thereby printing the first portion of the code of the microparticle;
moving the reticle;
exposing the substrate to light transmitted through the reticle, thereby printing the second portion of the code of the microparticle; and
successively moving the reticle and exposing the substrate to light transmitted through the reticle to complete the code of the microparticle.
7. The system of claim 3 , wherein the step and repeat exposure system is capable of performing the method comprising:
exposing a substrate to light transmitted through the reticle, thereby printing the first portion of the code of the microparticle;
moving the substrate; and
exposing the substrate to light transmitted through the reticle, thereby printing the second portion of the code of the microparticle.
8. A system for forming encoded microparticles, the system comprising:
a step and repeat exposure system capable of performing a method comprising:
printing a code pattern at a first time to form a first portion of a first code for a first set of microparticles;
printing the code pattern at a second time after the first time to form a second portion of the first code for the first set of microparticles;
printing successive portions of the first code with the code pattern to complete the first code for the first set of microparticles;
printing the code pattern at a third time to form a first portion of a second code of a second set of microparticles;
printing the code pattern at a fourth time after the third time to form a second portion for the second code of the second set of microparticles; and
printing successive portions of the second code with the code pattern to complete the second code for the second set of microparticles; and
a computer readable medium having a sequence of computer executable instructions for controlling the step and repeat exposure system to perform said method.
9. The system of claim 8 , wherein the step and repeat exposure system is capable of performing the method wherein the first code and the second code are printed on a single wafer.
10. The system of claim 8 , wherein the step and repeat exposure system is capable of performing the method wherein a reticle is moved between printing steps.
11. The system of claim 10 , wherein the step and repeat exposure system of capable of performing the method wherein the reticle is moved laterally between printing steps for the first code, and wherein the reticle is moved laterally between printing steps for the second code.
12. The system of claim 8 , wherein the step and repeat exposure system is capable of performing the method wherein a substrate is moved between printing steps.
13. The system of claim 8 , wherein the step and repeat exposure system includes a reticle, and wherein the reticle contains the code pattern.