IP Library Granted Patent US 8,379,434
Granted Patent B2
US 8,379,434 · App. 12/782,927 · Granted Feb 19, 2013

SRAM cell for single sided write

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Quick Facts
Patent No.
US 8,379,434
App. No.
12/782,927
Granted
Feb 19, 2013
Kind
B2
Abstract

A first integrated circuit containing a single sided write SRAM cell array, each SRAM cell having a bit passgate and an auxiliary bit-bar driver transistor. A process of operating the first integrated circuit including a single sided read operation in which source nodes of the auxiliary drivers in both addressed cells and half-addressed cells are floated. A second integrated circuit containing an SRAM cell array, in which each SRAM cell includes a bit-side write passgate, a bit-bar-side read passgate and a bit-bar auxiliary driver transistor. A process of operating the second integrated circuit including a single sided read operation in which source nodes of the auxiliary drivers in both addressed cells and half-addressed cells are biased to a low bias voltage.

Claims (34)

1. An integrated circuit, comprising:

an array of SRAM cells configured in rows and columns, each said SRAM cell including:

a bit driver, said bit driver including a drain node, a source node, and a gate node;

a bit-side node connected to said drain node of said bit driver;

a bit load, said bit load including a drain node connected to said bit-side node, a source node, and a gate node;

a bit-bar driver, said bit-bar driver including a drain node, a source node, and a gate node connected to said bit-side node;

a bit-bar side node connected to said drain node of said bit-bar driver, to said gate node of said bit driver and to said gate node of said bit load, said bit-bar side node being free of a connection to a passgate transistor;

a bit-bar load, said bit-bar load including a drain node connected to said bit-bar side node, a source node, and a gate node connected to said bit-side node;

a bit-side passgate, said bit-side passgate including a first source/drain node connected to said bit-side node, a second source/drain node connected to a bit line, and a gate node connected to a word line;

and a bit-bar-side auxiliary driver transistor, said bit-bar-side auxiliary driver transistor including a drain node directly connected to said bit-bar side node, a source node, and a gate node connected to said bit-side node; and node, a source node, and a gate node connected to said bit-side node; and

an auxiliary driver transistor bias circuit coupled to said source node of said bit-bar-side auxiliary driver transistor in said each said SRAM cell, such that said auxiliary driver transistor bias circuit is capable of biasing said source nodes of said bit-bar-side auxiliary driver transistors in said array of SRAM cells.

2. The integrated circuit of claim 1 , in which said auxiliary driver transistor bias circuit is capable of biasing said source nodes of said bit-bar-side auxiliary driver transistors in addressed SRAM cells of said array of SRAM cells independently of said source nodes of said bit-bar-side auxiliary driver transistors in half-addressed SRAM cells of said array of SRAM cells.

3. The integrated circuit of claim 1 , in which a boost voltage is provided during a single sided write high operation on said word line between 100 and 400 millivolts above a bias voltage on said source nodes of said bit loads and said bit-bar loads.

4. The integrated circuit of claim 1 , in which an intermediate write potential is provided during a single sided write high operation on said word line that is substantially equal to a bias voltage on said source nodes of said bit loads and said bit-bar loads for between 0.5 and 2 nanoseconds, followed by a boost voltage on said word line between 100 and 400 millivolts above said bias voltage on said source nodes of said bit loads and said bit-bar loads.

5. A method comprising:

performing a single skied read operation on an addressed SRAM cell in an SRAM cell array, by a process including:

floating a source node of a bit-bar-side auxiliary driver transistor of a half-addressed SRAM cell in said SRAM cell array;

floating a source node of a bit-bar-side auxiliary driver transistor of said addressed SRAM cell; and

subsequently turning on a bit-side passgate of said addressed SRAM cell and turning on a bit-side passgate of said half-addressed SRAM cell;

Performing a single side write low operation on said addressed SRAM cell by a process including floating said source node of said bit-bar-side auxiliary driver transistor of said half addressed SRAM cell, said bit-bar-side auxiliary driver transistor having a drain node directly connected to a bit-bar side node; and

performing a single sided write high operation on said addressed SRAM cell by a process including floating said source node of said bit-bar-side auxiliary driver transistor of said half-addressed SRAM cell.

6. The method of claim 5 , in which said single sided write high operation includes:

biasing said source node of said bit-bar-side auxiliary driver transistor of said addressed SRAM cell to a low bias voltage; and

turning on said bit-side passgate of said addressed SRAM cell.

7. The method of claim 5 , in which said single sided write low operation includes:

floating said source node of said bit-bar-side auxiliary driver transistor of said addressed SRAM cell; and

turning on said bit-side passgate of said addressed SRAM cell.

8. The method of claim 5 , in which said single sided write low operation includes:

biasing said source node of said bit-bar-side auxiliary driver transistor of said addressed SRAM cell to a high bias voltage; and

turning on said bit-side passgate of said addressed SRAM cell.

9. The method of claim 5 , in which said single sided write high operation includes providing a boost voltage on said word line that is between 100 and 400 millivolts above a bias voltage on source nodes of a bit load and a bit-bar load of said addressed SRAM cell.

10. The method of claim 5 , in which said single sided write high operation includes:

biasing said word line to a potential that is substantially equal to a bias voltage on source nodes of a bit load and a bit-bar load of said addressed SRAM cell for a time that is between 0.5 and 2 nanoseconds; and

providing a boost voltage on said word line that is between 100 and 400 millivolts above a bias voltage on said source nodes of said bit load and said bit-bar load.

Assignments (2)
RE-RECORD TO CORRECT THE NAME OF THE SECOND ASSIGNOR, PREVIOUSLY RECORDED ON REEL 024524 FRAME 0879. Recorded Oct 12, 2010
From: HOUSTON, THEODORE W.; SESHADRI, ANAND
To: TEXAS INSTRUMENTS INCORPORATED
Reel/Frame 025130/0666 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 11, 2010
From: HOUSTON, THEODORE W.; SECHADRI, ANAND
To: TEXAS INSTRUMENTS INCORPORATED
Reel/Frame 024524/0879 →