Method of manufacturing field-effect transistor, field-effect display device and electromagnetic wave detector
There is provided a method of manufacturing a field-effect transistor, in which on a electroconductive layer including a source electrode, a drain electrode and pixel electrode formed by a conductive layer-forming, an inorganic insulating layer containing an inorganic material as a main component is formed so as to cover the electroconductive layer and an oxide semiconductive layer, and after a photoresist film is formed on the inorganic insulating layer and is exposed in a pattern shape, a resist pattern is formed by being developed using a developer in development, and by removing the area exposed from the resist pattern in the inorganic insulating layer by using the developer as an etching liquid, a part of the electroconductive layer is exposed, thereby forming a contact hole; a field-effect transistor, a display device and an electromagnetic wave detector.
1. A method of manufacturing a field-effect transistor including a substrate, a gate electrode, a gate insulating film, a source electrode, a drain electrode, a pixel electrode, an oxide semiconductor layer containing an oxide semiconductor, and an inorganic insulating layer containing a Ga-containing oxide, the method comprising:
forming an electroconductive layer containing at least one selected from the group consisting of the source electrode, the drain electrode and the pixel electrode;
forming the inorganic insulating layer, by a vapor phase film-forming method, so as to cover the electroconductive layer and the oxide semiconductor layer;
resist-forming a photoresist film on the inorganic insulating layer;
exposing the photoresist film in a pattern shape; and
developing, using a developer, the exposed photoresist film to form a resist pattern, and removing an area of the inorganic insulating layer exposed from the resist pattern by using the developer as an etching liquid, wherein the etching liquid is an alkaline solution, thereby exposing a part of the electroconductive layer,
wherein the gate electrode is provided on the substrate, the gate insulating film is provided between the gate electrode and the electroconductive layer, the oxide semiconductor layer is provided to contact at least the electroconductive layer, and the inorganic insulating layer covers the electroconductive layer and the oxide semiconductor layer.
2. The method of manufacturing the field-effect transistor according to claim 1 , the method further comprising:
forming an electrode layer such that the electrode layer is electrically connected to the electroconductive layer, through the exposed part of the electroconductive layer;
wherein the electrode layer contains a metal oxide.
3. The method of manufacturing the field-effect transistor according to claim 1 , wherein the oxide semiconductor layer comprises an amorphous oxide semiconductor represented by InGaO 3 (ZnO) m , m representing a natural number less than 6.
4. The method of manufacturing the field-effect transistor according to claim 1 , wherein the Ga-containing oxide is amorphous.
5. A method of manufacturing a field-effect transistor including a substrate, a gate electrode, a gate insulating film, a source electrode, a drain electrode, a pixel electrode, an oxide semiconductor layer containing an oxide semiconductor, and an inorganic insulating layer containing a Ga-containing oxide, the method comprising:
forming an electroconductive layer containing at least one selected from the group consisting of the source electrode, the drain electrode and the pixel electrode;
forming the inorganic insulating layer, by a vapor phase film-forming method, so as to cover the electroconductive layer and the oxide semiconductor layer;
resist-forming a photoresist film on the inorganic insulating layer;
exposing the photoresist film in a pattern shape;
forming a resist pattern by developing, using a developer, the exposed photoresist film; and
processing an area of the inorganic insulating layer exposed from the resist pattern by using an etching liquid, wherein the etching liquid is an alkaline solution, to remove the exposed area, thereby exposing a part of the electroconductive layer,
wherein the gate electrode is provided on the substrate, the gate insulating film is provided between the gate electrode and the electroconductive layer, the oxide semiconductor layer is provided to contact at least the electroconductive layer, and the inorganic insulating layer covers the electroconductive layer and the oxide semiconductor layer.
6. The method of manufacturing the field-effect transistor according to claim 5 , the method further comprising:
forming an electrode layer such that the electrode layer is electrically connected to the electroconductive layer, through the exposed part of the electroconductive layer;
wherein the electrode layer contains a metal oxide.
7. The method of manufacturing the field-effect transistor according to claim 5 , wherein the oxide semiconductor layer comprises an amorphous oxide semiconductor represented by InGaO 3 (ZnO) m , m representing a natural number less than 6.
8. The method of manufacturing the field-effect transistor according to claim 5 , wherein the Ga-containing oxide is amorphous.