IP Library Granted Patent US 8,551,299
Granted Patent B2
US 8,551,299 · App. 12/790,613 · Granted Oct 8, 2013

Methods of producing hydrochloric acid from hydrogen gas and chlorine gas

Inventors: Majid Keshavarz (Pleasanton, CA); Saroj Kumar Sahu (Mountain House, CA); Chockkalingam Karuppaiah (Fremont, CA); Ge Zu (San Jose, CA); Suresh Kumar Surapalan Nair (Fremont, CA); Vasanthan Mani (Fremont, CA)
Assignee: Deeya Energy, Inc.
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Quick Facts
Patent No.
US 8,551,299
App. No.
12/790,613
Granted
Oct 8, 2013
Kind
B2
Abstract

A method of producing HCl from H 2 and Cl 2 is provided. In some embodiments, the method comprises at least one photochemical chamber placed in fluid communication with at least one source of H 2 and at least one source of Cl 2 . In some embodiments, the photochemical chamber effects the formation of HCl through the use of at least one source of ultraviolet radiation contained therein. In some embodiments, the HCl product may be captured and used as a gas. In some embodiments, the HCl product may be absorbed into water to form an aqueous HCl solution.

Claims (35)

1. A method of producing hydrogen chloride, comprising:

collecting chlorine gas from a redox flow cell battery system;

introducing hydrogen and the collected chlorine gas into at least one photochemical chamber containing at least one source of ultraviolet radiation;

activating the at least one source of ultraviolet radiation, thereby exposing the hydrogen and the chlorine to ultraviolet radiation to produce chlorine gas; and

collecting the produced hydrogen chloride;

wherein the at least one photochemical

chamber further comprises at least one sensor for monitoring the ratio of the concentration of hydrogen to chlorine in the chamber; and

wherein the method further comprises monitoring the ratio of the concentration of hydrogen to chlorine in the chamber.

2. The method of claim 1 , wherein the at least one source of ultraviolet radiation emits light at wavelengths of about 370 nm to about 430 nm.

3. The method of claim 1 , wherein the at least one photochemical chamber further comprises at least one gauge for monitoring temperature and/or pressure in the chamber; and wherein the method further comprises monitoring the temperature and/or pressure in the photochemical chamber.

4. The method of claim 1 , further comprising absorbing the formed hydrogen chloride into water to form hydrochloric acid.

5. A method of producing hydrogen chloride, comprising:

collecting hydrogen gas from a redox flow cell battery system;

introducing the collected hydrogen gas and chlorine gas into at least one photochemical chamber containing at least one source of ultraviolet radiation and at least one sensor for monitoring a ratio of a molar concentration of hydrogen gas to chlorine gas in the chamber;

activating the at least one source of ultraviolet radiation, thereby exposing the hydrogen gas and the chlorine gas to ultraviolet radiation to produce hydrogen chloride;

monitoring the ratio of the concentration of hydrogen gas to chlorine gas in the chamber; and

collecting the produced hydrogen chloride.

6. The method of claim 5 , wherein the chlorine gas is collected from the redox flow cell battery system.

7. The method of claim 5 , wherein the at least one source of ultraviolet radiation emits light at wavelengths of about 370 nm to about 430 nm.

8. The method of claim 5 , wherein the at least one photochemical chamber further comprises at least one gauge for monitoring temperature and/or pressure in the chamber; and wherein the method further comprises monitoring the temperature and/or pressure in the photochemical chamber.

9. The method of claim 5 , further comprising absorbing the formed hydrogen chloride into water to form hydrochloric acid.

10. The method of claim 5 wherein the process of monitoring the ratio of the concentration of hydrogen gas to chlorine gas in the chamber occurs while the hydrogen gas and chlorine gas are being exposed to the ultraviolet radiation.

11. The method of claim 5 wherein the process of monitoring the ratio of the concentration of hydrogen gas to chlorine gas in the chamber includes monitoring a thermal resistivity of the hydrogen gas and chlorine gas in the chamber.

12. The method of claim 5 wherein the at least one sensor for monitoring the ratio of the concentration of hydrogen gas to chlorine gas includes a heat element and a temperature sensor.

13. The method of claim 12 wherein the process of monitoring the ratio of the concentration of hydrogen gas to chlorine gas in the chamber comprises:

introducing heat using the heat element; monitoring the temperature using the temperature sensor;

determining a thermal resistivity in the chamber based as least on the introduced heat and the monitored temperature; and

determining a ratio of the concentration of hydrogen gas and chlorine gas in the chamber based at least on the thermal resistivity.

14. A redox flow cell battery system comprising:

a redox flow cell, the redox flow cell comprising:

positive and negative electrodes disposed in separate half-cell compartments;

a porous or ion-selective membrane separating the half-cell compartments;

and an electrolyte that is flowed through the half-cell compartments, wherein the electrolyte comprises chromium ions and iron ions; and a

chamber, comprising an ultraviolet light source, coupled to one or both half-cell compartments, wherein during operation of the flow battery system the chamber collects hydrogen and/or chlorine gas from one or both half-cell compartments and produces hydrogen chloride from the collected gas; wherein the

chamber further comprises at least one sensor for monitoring the ratio of the concentration of hydrogen to chlorine in the chamber; and wherein the sensor is configured to monitor the ratio of the concentration of hydrogen to chlorine in the chamber.

Assignments (8)
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NO. 8551299 PREVIOUSLY RECORDED AT REEL: 034172 FRAME: 0948. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE BY SECURED PARTY. Recorded Jun 10, 2016
From: SILICON VALLEY BANK
To: IMERGY POWER SYSTEMS, INC. (FORMERLY KNOWN AS DEEYA ENERGY, INC.)
Reel/Frame 038950/0114 →
CHANGE OF NAME Recorded Oct 7, 2014
From: DEEYA ENERGY, INC.
To: IMERGY POWER SYSTEMS, INC.
Reel/Frame 033908/0957 →
SECURITY INTEREST Recorded Jul 19, 2013
From: DEEYA ENERGY, INC.
To: SILLICON VALLEY BANK
Reel/Frame 030871/0539 →
RELEASE OF SECURITY INTEREST Recorded May 29, 2012
From: SILICON VALLEY BANK
To: DEEYA ENERGY, INC.
Reel/Frame 028314/0741 →
RELEASE OF SECURITY INTEREST Recorded Nov 21, 2011
From: TRIPLEPOINT CAPITAL LLC
To: DEEYA ENERGY, INC.
Reel/Frame 027260/0730 →
SECURITY AGREEMENT Recorded Nov 18, 2011
From: DEEYA ENERGY, INC.
To: SILICON VALLEY BANK
Reel/Frame 027256/0148 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 21, 2010
From: KESHAVARZ, MAJID; SAHU, SAROJ KUMAR; KARUPPAIAH, CHOCKKALINGAM; ZU, GE; NAIR, SURESH KUMAR SURAPALAN; MANI, VASANTHAN
To: DEEYA ENERGY, INC.
Reel/Frame 025538/0883 →
SECURITY AGREEMENT Recorded Aug 24, 2010
From: DEEYA ENERGY, INC.
To: TRIPLEPOINT CAPITAL LLC (AS GRANTEE)
Reel/Frame 024880/0804 →
Continuity (2)
Provisional Application 61182335 · May 29, 2009
Related Publication 20110081561A1 · Apr 7, 2011