Wafer based optical chassis and associated methods

1. A method of creating a plurality of optical apparatuses, comprising:

patterning a conductive material on a mount wafer;

populating the mount wafer with optoelectronic devices in accordance with the patterning;

stacking and securing a spacer substrate on the mount wafer;

stacking and securing a sealer substrate on the spacer substrate, the sealer substrate being separate from the spacer substrate, wherein stacking and securing of the spacer substrate and the sealer substrate on the mount wafer seal the optoelectronic devices, the spacer substrate including a hole over the optoelectronic device and a bottom surface of the sealer substrate sealing the hole; and

vertically separating the mount wafer to form the plurality of optical apparatuses, the vertically separating including exposing a portion of the conductive material outside the seal, each optical apparatus includes a mount substrate, an optoelectronic device, a spacer substrate, a sealer substrate, and exposed conductive material provided outside the seal.

2. The method as claimed in claim 1 , wherein stacking and securing of the sealer substrate to the spacer substrate occurs before stacking and securing of the spacer substrate stacked to the mount substrate.

3. The method as claimed in claim 1 , wherein stacking and securing of the spacer substrate and the sealer substrate on the mount wafer hermetically seal the optoelectronic devices.

4. The method as claimed in claim 1 , wherein the exposed conductive material is in a trench.

5. The method as claimed in claim 1 , wherein the trench is in the mount substrate.

6. The method as claimed in claim 5 , wherein the mount substrate and the spacer substrate are flush.

7. The method as claimed in claim 4 , further comprising forming a ledge formed by differing widths between the mount substrate and the spacer substrate, the trench being in the ledge.

8. The method as claimed in claim 1 , wherein the mount substrate and the spacer substrate are flush.

9. The method as claimed in claim 1 , further comprising forming a ledge formed by differing widths between the mount substrate and the spacer substrate, the exposed conductive material being in the ledge.

10. The method as claimed in claim 1 , wherein patterning the conductive material on the mount wafer includes forming a conductive via on a bottom surface of the mount substrate.

11. The method as claimed in claim 10 , further comprising providing a conductive material in the via.

12. The method as claimed in claim 11 , further comprising providing a conductive material is a solder ball.

13. The method as claimed in claim 1 , further comprising forming a passive optical element formed on a surface of the sealer substrate.

14. The method as claimed in claim 1 , wherein patterning the conductive material include providing conductive material on at least two non-parallel surfaces of the mount substrate.

15. The method as claimed in claim 1 , wherein at least two of the mount substrate, the spacer substrate and the sealer substrate are of materials with approximately same coefficients of thermal expansion.

16. The method as claimed in claim 1 , further comprising forming a mating feature for mating the optical apparatus with another structure on a terminal surface of the optical apparatus.

17. The method as claimed in claim 16 , wherein the another structure is a ferrule.

18. The method as claimed in claim 1 , further comprising stacking another spacer substrate above the sealer substrate.

19. The method as claimed in claim 1 , further comprising stacking an optical block having a passive optical element on at least one surface thereof above the sealer substrate.