Lamination process improvement
A method of laminating a photovoltaic module may include placing an interlayer in contact with a substrate, heating the interlayer with a source of infrared radiation and pressing the interlayer and the substrate together in a vacuum laminator.
1 . A method for laminating a photovoltaic module, the method comprising:
placing an interlayer in contact with a substrate;
heating the interlayer and the substrate with a source of infrared radiation; and
pressing the interlayer and the substrate together.
2 . The method of claim 1 , wherein the substrate comprises glass.
3 . The method of claim 1 , wherein pressing the interlayers and the substrate together includes using a vacuum laminator.
4 . The method of claim 1 , wherein placing the interlayer in contact with a substrate takes place before heating the interlayer and the substrate with a source of infrared radiation.
5 . The method of claim 1 , wherein placing the interlayer in contact with a substrate takes place after heating the interlayer and the substrate with a source of infrared radiation.
6 . The method of claim 1 , wherein heating the interlayer and the substrate with a source of infrared radiation takes place before and after placing the interlayer in contact with the substrate.
7 . The method of claim 1 , wherein the interlayer includes a thermoplastic interlayer.
8 . The method of claim 8 , wherein the thermoplastic interlayer includes an acrylonitrile butadiene styrene, an acrylic, celluloid, a cellulose acetate, a cycloolefin copolymer, a polyvinyl butyral, a silicone, an epoxy, an ethylene vinyl acetate, an ethylene vinyl alcohol, a fluoroplastic, an ionomer, KYDEX®, a liquid crystal polymer, a polyacetal, a polyacrylate, a polyacrylonitrile, a polyamide, a polyamide-imide, a polyaryletherketone, a polybutadiene, a polybutylene, a polybutylene terephthalate, a polycaprolactone, a polychlorotrifluoroethylene, a polyethylene terephthalate, a polycyclohexylene dimethylene terephthalate, a polycarbonate, a polyhydroxyalkanoate, a polyketone, a polyester, a polyethylene, polyetheretherketone, a polyetherketoneketone, a polyetherimide, a polyethersulfone, a polyethylenechlorinate, a polyimide, a polylactic acid, a polymethylpentene, a polyphenylene oxide, a polyphenylene sulfide, a polyphthalamide, a polypropylene, a polystyrene, a polysulfone, a polytrimethylene terephthalate, a polyurethane, a polyvinyl acetate, a polyvinyl chloride, a polyvinylidene chloride, or a styrene-acrylonitrile, or any combination thereof.
9 . The method of claim 9 , wherein the thermoplastic interlayer includes an ethylene vinyl acetate, a polyvinyl butyral, a silicone, or an epoxy.
10 . The method of claim 1 , wherein heating the interlayer and the substrate with a source of infrared radiation takes place before pressing the interlayer and the substrate together.
11 . The method of claim 1 , wherein heating the interlayer and the substrate with a source of infrared radiation takes place after pressing the interlayer and the substrate together.
12 . The method of claim 1 , wherein heating the interlayer and the substrate with a source of infrared radiation takes place before and after pressing the interlayer and the substrate together.
13 . The method of claim 1 , further comprising subjecting the interlayer and a substrate to at least one nip roll.
14 . The method of claim 14 , wherein subjecting the interlayer and a substrate to at least one nip roll takes place before pressing the interlayer and the substrate together.
15 . The method of claim 14 , wherein subjecting the interlayer and a substrate to at least one nip roll takes place after pressing the interlayer and the substrate together.
16 . The method of claim 14 , wherein subjecting the interlayer and a substrate to at least one nip roll takes place before and after pressing the interlayer and the substrate together.
17 . The method of claim 14 , wherein subjecting the interlayer and a substrate to at least one nip roll takes place before heating the interlayer and the substrate with a source of infrared radiation.
18 . The method of claim 14 , wherein subjecting the interlayer and a substrate to at least one nip roll takes place after heating the interlayer and the substrate with a source of infrared radiation.
19 . The method of claim 14 , wherein subjecting the interlayer and a substrate to at least one nip roll takes place before and after heating the interlayer and the substrate with a source of infrared radiation.
20 . The method of claim 14 , wherein heating the interlayer and the substrate with a source of infrared radiation takes place before and after subjecting the interlayer and the substrate to at least one nip roll.
21 . A system of laminating a photovoltaic module comprising:
an interlayer in contact with a substrate;
an IR heater configured to heat an interlayer in contact with a substrate; and
a press configured to force the interlayer and the substrate together.
22 . The system of claim 22 , wherein the press includes a vacuum laminator.
23 . The system of claim 22 , wherein the IR heater is configured to heat the interlayer before the interlayer contacts the substrate.
24 . The system of claim 22 , wherein the IR heater is configured to heat the interlayer after the interlayer contacts the substrate.
25 . The system of claim 22 , the IR heater is configured to heat the interlayer before and after the interlayer contacts the substrate.
26 . The system of claim 22 , wherein the interlayer includes a thermoplastic interlayer.
27 . The system of claim 22 , wherein the IR heater configured to heat the interlayer in contact with the substrate is used before the press configured to force the interlayer and the substrate together is used.
28 . The system of claim 22 , wherein the IR heater configured to heat the interlayer in contact with the substrate is used after the press configured to force the interlayer and the substrate together is used.
29 . The system of claim 22 , wherein the IR heater configured to heat the interlayer in contact with the substrate is used before and after the press configured to force the interlayer and the substrate together is used.
30 . The system of claim 22 , further comprising at least one nip roll to treat the interlayer and the substrate.
31 . The system of claim 35 , wherein at least one nip roll to treat the interlayer and the substrate is configured to force the interlayer and the substrate together before the press.
32 . The system of claim 35 , wherein at least one nip roll to treat the interlayer and the substrate is configured to force the interlayer and the substrate together after the press.
33 . The system of claim 35 , wherein at least one nip roll to treat the interlayer and the substrate is configured to force the interlayer and the substrate together before and after the press.
34 . The system of claim 35 , wherein at least one nip roll to treat the interlayer and the substrate is configured to force the interlayer and the substrate together before the IR heater.
35 . The system of claim 35 , wherein at least one nip roll to treat the interlayer and the substrate is configured to force the interlayer and the substrate together after the IR heater.
36 . The system of claim 35 , wherein at least one nip roll to treat the interlayer and the substrate is configured to force the interlayer and the substrate together before and after the IR heater.