Laser light source

1. A laser light source, comprising:

a semiconductor layer sequence having an active layer having at least two active regions which are suitable for emitting electromagnetic radiation during operation via a side area of the semiconductor layer sequence along an emission direction, said side area being embodied as a radiation coupling-out area;

a respective electrical contact area above each of the at least two active regions on a main surface of the semiconductor layer sequence; and

a surface structure in the main surface of the semiconductor layer sequence, wherein

the at least two active regions are arranged in a manner spaced apart from one another in the active layer transversely with respect to the emission direction,

each of the electrical contact areas has a first partial region and a second partial region having a width that increases along the emission direction toward the radiation coupling-out area,

the surface structure has, between the at least two electrical contact areas, at least one first depression along the emission direction and also second depressions,

the first partial regions of the electrical contact areas are in each case arranged between at least two second depressions,

the main surface comprises ridge-type structures with the electrical contact areas,

each of the ridge-type structures has a first depth in the first partial region of the electrical contact areas and a second depth in the second partial region of the electrical contact areas, and

the first depth is greater than the second depth.

2. The laser light source as claimed in claim 1 , wherein the second partial regions in each case have a trapezoidal form and in each case adjoin the radiation coupling-out area.

3. The laser light source according to claim 1 , wherein the first partial regions in each case extend with a constant width on the main surface along the emission direction.

4. The laser light source as claimed in claim 1 , wherein the active layer is arranged between two waveguide layers on a substrate and the first depression extends from the main surface into at least one layer selected from the active layer, the waveguide layers and the substrate.

5. The laser light source as claimed in claim 1 , wherein the first depression extends on the main surface from the radiation coupling-out area to a side area of the semiconductor layer sequence, said side area lying opposite the radiation coupling-out area.

6. The laser light source as claimed in claim 1 , wherein the first depression has at least one trench parallel to the emission direction.

7. The laser light source as claimed in claim 1 , wherein the first depression has sidewalls which form an angle of greater than or equal to 90° with the main surface.

8. The laser light source as claimed in claim 1 , wherein an absorbent material is arranged in the first depression and/or in the second depression.

9. The laser light source as claimed in claim 1 , wherein at least one second depression has an extension direction which forms an angle of greater than 0° and less than or equal to 90° with the emission direction.

10. The laser light source as claimed in claim 1 , wherein at least one second depression is at a distance of less than or equal to 4 μm from an electrical contact area.

11. The laser light source as claimed in claim 1 , wherein the active layer is arranged between two waveguide layers on a substrate and at least one second depression extends from the main surface right into at least one layer selected from the active layer, the waveguide layers and the substrate.

12. The laser light source as claimed in claim 1 , wherein at least one second depression has sidewalls which form an angle of greater than or equal to 90° with the main surface.

13. The laser light source as claimed in claim 1 , wherein the main surface comprises an etching stop layer, which adjoins the ridge-type structures.

14. The laser light source as claimed in claim 1 , wherein

the semiconductor layer sequence comprises, at a distance from the at least two active regions, at least one further active region in the active layer,

the main surface has a further electrical contact area having a first and second partial region above the further active region,

the surface structure has at least one further first depression along the emission direction, which is arranged between the at least two electrical contact areas and the further electrical contact area, and

the surface structure has two further second depressions between which the first partial region of the further electrical contact area is arranged.

15. The laser light source as claimed in claim 1 , wherein the first depth of the ridge-type structures extends to a waveguide layer of the semiconductor layer sequence and creates an index guidance, and the second depth of the ridge-type structures extends to a semiconductor contact layer or a cladding layer above the waveguide layer in the semiconductor layer sequence and creates a gain guidance.