X-ray target and method of making same
View Patent ↗In one example, an x-ray target comprises a target track, a substrate, and an optional backing. The target track includes a base material and a grain growth inhibitor to reduce or prevent microstructure grain growth in the base material. The target track can be included as part of an x-ray tube anode, either of a rotary form or a stationary form.
1. A method for manufacturing an x-ray target, the method comprising:
combining a base material and a grain growth inhibitor material;
depositing the combined base material and grain growth inhibitor material onto a substrate; and
processing the combined base material and the grain growth inhibitor material to form a target track material by heat treating the target track material in a vacuum furnace at a temperature of 1,700 degrees Celsius for a period of about four to twelve hours to increase the density of the target track material.
2. The method as recited in claim 1 , wherein the combining comprises combining the base material and the grain growth inhibitor material in a feedstock powder form before depositing the feedstock powder on the substrate.
3. The method as recited in claim 2 , further comprising processing the feedstock powder to achieve a feedstock particle size of about 0.5 μm or smaller.
4. The method as recited in claim 1 , wherein the combining comprises combining the base material and the grain growth inhibitor material in a feedstock powder form and depositing comprises a Vacuum Plasma Spray (VPS) process.
5. The method as recited in claim 1 , further comprising placing a backing in thermal communication with the substrate,
6. The method as recited in claim 1 , further comprising affixing a backing to the substrate with a bond layer.
7. The method as recited in claim 6 , wherein the bond layer is formed with a braze process.
8. The method as recited in claim 7 , wherein the braze process comprises:
placing one or more washers between the substrate and the backing;
heating the one or more washers for a predetermined time and at a predetermined temperature so as to form a braze bond layer.
9. The method as recited in claim 7 , wherein the braze process comprises:
placing a hydride paste containing a braze material between the substrate and the backing
10. The method as recited in claim 6 , wherein the bond layer is formed with a carbon management layer.
11. The method as recited in claim 10 , wherein the carbon management layer is formed by:
coating the backing with a carbide forming metal to a predetermined thickness that is sufficient to retard carbon diffusion from the backing; and
processing the coating to form the carbon management layer.
12. The method as recited in claim 11 , wherein the processing of the coating comprises a vacuum outgassing process.
13. The method as recited in claim 1 , wherein the depositing comprises depositing the combined base material and grain growth inhibitor material onto the substrate as a single layer.
14. A method for manufacturing an x-ray target, the method comprising:
combining a base material and a grain growth inhibitor material;
depositing the combined base material and grain growth inhibitor material onto a substrate;
processing the combined base material and the grain growth inhibitor material to form a target track material; and
affixing a backing to the substrate with a bond layer, the bond layer formed with a braze process by placing a hydride paste containing a braze material between the substrate and the backing.
15. The method as recited in claim 14 , wherein the base material and the grain growth inhibitor material are combined in a feedstock powder form before depositing the feedstock powder on the substrate.
16. The method as recited in claim 15 , further comprising processing the feedstock powder to achieve a feedstock particle size of about 0.5 μm or smaller.
17. The method as recited in claim 14 , wherein the base material and the grain growth inhibitor material are combined in a feedstock powder form and then deposited onto a substrate with a Vacuum Plasma Spray (VPS) process.
18. A method for manufacturing an x-ray target, the method comprising:
combining a base material and a grain growth inhibitor material;
depositing the combined base material and grain growth inhibitor material onto a substrate;
processing the combined base material and the grain growth inhibitor material to form a target track material; and
affixing a backing to the substrate with a bond layer, the bond layer formed with a carbon management layer and wherein the carbon management layer is formed by:
coating the backing with a carbide forming metal to a predetermined thickness that is sufficient to retard carbon diffusion from the backing; and
processing the coating to form the carbon management layer with a vacuum outgassing process.