Method of depositing a thermal barrier by plasma torch

1. An installation for depositing, onto a substrate, a material acting as a thermal barrier, said material being in powder form prior to deposition, the installation comprising:

an enclosure having said substrate disposed therein,

a first plasma torch, which includes a first anode and a first cathode, and

at least one second plasma torch, which includes a second anode and a second cathode, and is disposed in said enclosure in such a manner that when said powder is introduced into the first plasma jet of said first plasma torch at the end of said first plasma torch from which said first plasma jet is ejected and into the second plasma jet of at least said second plasma torch at the end of said second plasma torch from which said second plasma jet is ejected, the first plasma jet of said first plasma torch and the second plasma jet of said second plasma torch cross at an intersection, such that particles of the powder in the first and second plasma jets that do not vaporize at the intersection continue moving through the intersection along respective trajectories of the first and second plasma jets and do not collide with said substrate while moving along the respective trajectories, thereby creating a resultant plasma jet in which said powder is vaporized, said substrate being placed on the axis of said resultant plasma jet.

2. An installation according to claim 1 , wherein the inside diameter of each of said first and second plasma torches is greater than 6 mm.

3. An installation according to claim 1 , wherein said first plasma torch presents a first angle relative to an axis z directed towards said substrate, and wherein said second plasma torch presents a second angle relative to an axis z directed towards said substrate.

4. An installation according to claim 3 , wherein said first and second angles each lies in a range of 20° to 60°.

5. An installation according to claim 4 , wherein said first and second angles are equal to each other.

6. An installation according to claim 4 , wherein said first and second angles are different from each other.

7. An installation according to claim 3 , wherein the end of said first plasma torch is situated at a first distance from said substrate, said first distance being measured parallel to the axis z, and wherein the end of said second plasma torch is situated at a second distance from said substrate, said second distance being measured parallel to the axis z.

8. An installation according to claim 7 , wherein each of said first and second distances lies within a range of 50 mm to 500 mm.

9. An installation according to claim 8 , wherein said first and second distances are equal to each other.

10. An installation according to claim 8 , wherein said first and second distances are different from each other.

11. An installation according to claim 1 , further comprising:

a first powder ejector configured to eject powder at said end of said first plasma torch, said powder ejected from said first ejector having a particle size within a range of 1 μm to 100 μm, and

a second powder ejector configured to eject powder at said end of said second plasma torch, said powder ejected from said second ejector having a particle size within a range of 1 μm to 100 μm.

12. An installation according to claim 1 , wherein the enclosure is maintained at ambient pressure, and the first plasma torch and at least the second plasma torch are configured to operate at the ambient pressure.