Method and system for providing a full wrap-around shield using a frame configured wet etch in a damascene process

1. A method for fabricating a magnetic recording transducer having a main pole including a plurality of sides, an intermediate layer adjacent to the plurality of sides of the main pole, and a field region distal from the main pole, the method comprising:

providing at least one trench in the intermediate layer, the at least one trench residing between the main pole and the field region;

providing a stop layer, a portion of the stop layer residing in at least part of the at least one trench and on at least part of the field region, the stop layer having at least one edge in the at least one trench;

removing a portion of the intermediate layer using a wet etch, the stop layer being resistant to removal by the wet etch;

depositing a wrap-around shield layer on the main pole.

2. The method of claim 1 further comprising:

depositing a nonmagnetic layer covering the wrap-around shield layer;

planarizing the magnetic transducer, the stop layer being a stop layer for the planarizing.

3. The method of claim 2 further comprising:

providing a gap layer on the main pole; and

providing a top shield covering at least the gap layer.

4. The method of claim 3 wherein the top shield is in contact with the wrap-around shield layer.

5. The method of claim 1 wherein the step of providing the at least one trench further includes:

providing a mask for including at least one aperture corresponding to the at least one trench; and

performing at least one reactive ion etch to form the at least one trench.

6. The method of claim 5 wherein the step of providing the at least one trench further includes:

performing a touch wet etch after the at least one reactive ion etch.

7. The method of claim 1 further comprising:

providing a mask before the step of providing the stop layer, the mask having a plurality of mask edges and covering the main pole, the plurality of mask edges residing in the at least one trench; and

wherein the step of providing the stop layer further includes

blanket depositing the stop layer; and

removing the mask before the wet etch.

8. The method of claim 1 further including:

providing a wet etch mask having an aperture therein, wherein the aperture of the wet etch mask exposes a portion of the transducer including a region covered by the wrap-around shield.

9. The method of claim 1 wherein the stop layer includes Ru.

10. The method of claim 1 wherein the main pole has a bottom and a top wider than the bottom.

11. A method for fabricating a magnetic recording transducer having a main pole including a plurality of sides, an intermediate layer adjacent to the plurality of sides of the main pole, and a field region distal from the main pole, the method comprising:

providing at least one trench in the intermediate layer, the at least one trench residing between the main pole and the field region;

providing a stop layer, a portion of the stop layer residing in at least part of the at least one trench and on at least part of the field region, the step of providing the stop layer further including

blanket depositing the stop layer;

providing a frame mask covering the portion of the stop layer and having an aperture therein, the aperture exposing the main pole and a portion of the intermediate layer; and

removing an exposed portion of the stop layer uncovered by the frame mask;

removing a portion of the intermediate layer using a wet etch, the stop layer being resistant to removal by the wet etch; and

depositing a wrap-around shield layer on the main pole.

12. The method of claim 11 wherein the step of removing the exposed portion further includes:

performing an ion mill.

13. The method of claim 11 wherein the step of removing the portion of the intermediate layer using the wet etch further includes:

performing the wet etch while the frame mask is in place.

14. The method of claim 11 wherein a portion of the wrap-around shield layer is deposited in the aperture of the frame mask.

15. A method for fabricating a magnetic recording transducer having a main pole including a plurality of sides, an intermediate layer adjacent to the plurality of sides of the main pole, and a field region distal from the main pole, the method comprising:

providing a mask including at least one trench aperture between the main pole and the field region;

performing at least one reactive ion etch to form at least one trench in the intermediate layer between the main pole and the field region;

blanket depositing a Ru layer;

providing a frame mask covering a portion of the Ru layer and having an aperture therein, the portion of the Ru layer residing in at least part of the at least one trench and on at least part of the field region, the aperture exposing the main pole and a portion of the intermediate layer;

removing an exposed portion of the Ru layer uncovered by the aperture in the frame mask;

removing the portion of the intermediate layer using a wet etch while the frame mask is in place, the Ru layer being resistant to removal by the wet etch;

provide wrap-around shield mask having a pole aperture;

providing a wrap-around shield on the main pole and in the pole aperture;

removing the wrap-around shield mask;

providing a nonmagnetic layer covering at least the wrap-around shield;

performing a chemical mechanical polish (CMP) of the transducer, the Ru layer being a stop layer for the CMP;

providing a gap layer on the main pole; and

providing a top shield covering at least the gap layer.

16. A method for fabricating a magnetic recording transducer having a main pole including a plurality of sides, an intermediate layer adjacent to the plurality of sides of the main pole, and a field region distal from the main pole, the method comprising:

providing a mask for including at least one trench aperture between the main pole and the field region; and

performing at least one reactive ion etch to form at least one trench in the intermediate layer between the main pole and the field region;

providing a mask, the mask having a plurality of mask edges and covering the main pole, the plurality of mask edges residing in the at least one trench;

blanket depositing a Ru layer;

removing the mask after deposition of the Ru layer;

removing the portion of the intermediate layer using a wet etch, the Ru layer being resistant to removal by the wet etch;

providing a wrap-around shield mask having an aperture therein, the aperture corresponding to a location of a wrap-around shield;

providing the wrap-around shield on the main pole and in the aperture;

removing the wrap-around shield mask;

providing a nonmagnetic layer covering at least the wrap-around shield;

performing a chemical mechanical polish (CMP) of the transducer, the Ru layer being a stop layer for the CMP;

providing a gap layer on the main pole; and

providing a top shield covering at least the gap layer.