Ion implanter for photovoltaic cell fabrication
View Patent ↗Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.
1. An ion implanter adapted to implant ions in semiconductor wafers, comprising:
a. an appliance configured to hold the wafers;
b. an ion source configured to generate ions at a rate;
c. a mass analyzer, having a resolving power less than ten, configured to sort the ions according to their respective mass/charge ratios and further configured to direct selected ions toward the appliance in an ion beam; and
d. voltage apparatus configured to apply a voltage drop of at least 250 kV between the ion source and the appliance, and further configured to propel ions toward the appliance, wherein the rate enables the selected ions to constitute a current of at least 20 mA in the ion beam, and wherein the mass analyzer is the only mass analyzer in the ion implanter.
2. The ion implanter of claim 1 wherein the selected ions are hydrogen ions.
3. The ion implanter of claim 1 wherein the selected ions are helium ions.
4. The ion implanter of claim 1 wherein the mass analyzer has a maximum magnetic rigidity corresponding to selecting a singly-charged ion of mass less than 5 Daltons and energy no greater than 100 keV.
5. The ion implanter of claim 1 wherein the mass analyzer has a maximum magnetic rigidity corresponding to selecting a singly-charged ion of mass less than 2 Daltons and energy no greater than 100 keV.
6. The ion implanter of claim 1 wherein the voltage drop is at least 300 kV.
7. The ion implanter of claim 1 wherein the voltage drop is at least 400 kV.
8. The ion implanter of claim 1 wherein the current is at least 40 mA.
9. An ion implanter adapted to implant ions in semiconductor wafers, comprising:
a. an appliance configured to hold the wafers;
b. an ion source configured to generate ions of a particular species at a rate, the particular species being hydrogen or helium;
c. voltage apparatus applying a voltage drop between the ion source and the appliance, configured to accelerate ions toward the appliance, the voltage drop comprising an extraction voltage drop, not adjustable above a maximum extraction value, configured to extract ions from the ion source; and
d. a mass analyzer, configured to sort ions extracted from the ion source according to their respective mass/charge ratios and further configured to direct selected ions of the particular species toward the appliance in an ion beam, the mass analyzer having a maximum magnetic rigidity corresponding to selecting ions of the particular species having respective energies corresponding to the maximum extraction value, wherein the rate enables the selected ions of the particular species to constitute a current of at least 5 mA in the ion beam.
10. The ion implanter of claim 9 wherein the voltage drop is at least 250 kV.
11. The ion implanter of claim 9 wherein the voltage drop is at least 400 kV.
12. The ion implanter of claim 9 wherein the maximum extraction value is no greater than about 150 kV.
13. The ion implanter of claim 9 wherein the current is greater than 20 mA.
14. The ion implanter of claim 9 wherein the current is greater than 40 mA.
15. The ion implanter of claim 9 wherein the mass analyzer has a resolving power less than ten and is the only mass analyzer in the ion implanter.