Granted Patent B2

US 8,801,505 · App. 12/825,448 · Granted Aug 12, 2014

Abstract

Claims (31)

1. An abrading device for providing a distressed visible pattern on a top surface of a floor structure, comprising:

a first abrading assembly and a second abrading assembly, the first and second abrading assemblies each having a rotationally driven contact roll and an idler roll, the contact roll being provided with a sleeve having a plurality of cutouts formed in a pattern thereon, and an abrading belt comprising an abrasive material trained over the sleeve of the contact roll and idler roll;

a first oscillation assembly connected to the first abrading assembly that oscillates the contact roll of the first abrading assembly in a first direction via a linear reciprocating motion; and

a second oscillation assembly connected to the second abrading assembly that oscillates the contact roll of the second abrading assembly in a second direction via a linear reciprocating motion, wherein the second direction is different than the first direction;

wherein the contact roll of the second abrading assembly is configured and operable to form an intermittent distressed visible pattern on the floor structure; and

wherein the first and second oscillation assemblies are configured to operate independently so as to oscillate the contact roll of the first abrading assembly in the first direction while oscillating the contact roll of the second abrading assembly in the second direction respectively.

2. The abrading device of claim 1 , wherein the first direction is substantially perpendicular to the second direction.

3. The abrading device of claim 1 , wherein the first direction is substantially parallel to a longitudinal direction of the sleeve and the second direction is substantially perpendicular to a longitudinal direction of the sleeve.

4. The abrading device of claim 1 , wherein the first and second abrading devices are consecutively arranged.

5. The abrading device of claim 1 , wherein the contact roll of the first abrading assembly has a smaller radius than a radius of the contact roll of the second abrading assembly.

6. The abrading device of claim 1 , wherein the cutouts extend radially about the sleeve in a direction substantially perpendicular to a longitudinal direction of the sleeve.

7. The abrading device of claim 1 , wherein the cutouts have a depth of about 0.015-0.020 inches.

8. The abrading device of claim 1 , wherein the cutouts are substantially concave in shape and form a substantially scalloped pattern along a longitudinal direction of the sleeve.

9. The abrading device of claim 1 , wherein the cutouts in the sleeve of the first abrading assembly have a width smaller than a width of the cutouts in the sleeve of the second abrading assembly.

10. The abrading device of claim 9 , wherein the cutouts in the sleeve of the first abrading assembly have a width of about 1.0 inch and the cutouts in the sleeve of the second abrading assembly have a width of about 1.5 inches.

11. A method for providing a distressed visible pattern on a floor structure, comprising:

a) providing a first abrading assembly and a second abrading assembly, the first and second abrading assemblies each having a rotationally driven contact roll, the contact roll being provided with a sleeve having a plurality of cutouts formed in a pattern thereon, and an abrading belt trained over the sleeve;

b) rotating the contact roll of the first abrading assembly while simultaneously oscillating the contact roll of the first abrading assembly in a first direction via a linear reciprocating motion;

c) abrading a top surface of the floor structure with the first abrading assembly while performing step b);

d) rotating the contact roll of the second abrading assembly while simultaneously oscillating the contact roll of the second abrading assembly in a second direction via a linear reciprocating motion, wherein the first direction is different than the second direction, wherein the contact roll of the second abrading assembly comes into and out of contact with the top surface of the floor structure;

e) intermittently abrading the top surface of the floor structure with the second abrading assembly to produce an intermittent distressed pattern on the floor structure while performing step d); and

wherein steps c) and d) are performed concurrently on different positions of the floor structure.

12. The method of claim 11 , wherein the first direction is substantially perpendicular to the second direction.

13. The method of claim 11 , wherein the first direction is substantially parallel to a longitudinal direction of the sleeve and the second direction is substantially perpendicular to a longitudinal direction of the sleeve.

14. The method of claim 11 , wherein the contact roll of at least one of the first and second abrading assemblies is randomly oscillated by a variable frequency drive.

15. The method of claim 11 , wherein the contact roll of the first abrading assembly has a smaller radius than a radius of the contact roll of the second abrading assembly.

16. The method of claim 11 , wherein the cutouts extend radially about the sleeves in a direction substantially perpendicular to a longitudinal direction of the sleeve.

17. The method of claim 11 , wherein the cutouts have a depth of about 0.015-0.020 inches.

18. The method of claim 11 , wherein the cutouts are substantially concave in shape and form a substantially scalloped pattern along a longitudinal direction of the sleeve.

19. The method of claim 11 , wherein the cutouts in the sleeve of the first abrading assembly have a width smaller than a width of the cutouts in the sleeve of the second abrading assembly.

20. The method of claim 19 , wherein the cutouts in the sleeve of the first abrading assembly have a width of about 1.0 inch and the cutouts in the sleeve of the second abrading assembly have a width of about 1.5 inches.

Assignments (11)