Liquid crystal display device and method of fabrication for the same

1. A liquid crystal display device, comprising:

a first substrate;

a thin film transistor formed on the first substrate and disposed in a first, non-transmissive region, the thin film transistor comprising a gate electrode, a source electrode and a drain electrode;

a storage capacitor comprising a first electrode and a second electrode formed in a second, transmissive region on the first substrate, wherein the first electrode and the second electrode of the storage capacitor are made of a transparent conductive material; and

a pixel electrode formed on the second, transmissive region, overlapping the first and second electrodes of the storage capacitor,

wherein the whole of the pixel electrode overlaps with both the first and second electrodes, and

wherein at least one of the first electrode and the second electrode extends to the outside of the transmissive region.

2. The liquid crystal display device as claimed in claim 1 , wherein a domain forming layer having a depressed pattern for forming a liquid crystal domain is formed between the pixel exectrode and the second electrode of the storage capacitor.

3. The liquid crystal display device as claimed in claim 1 , further comprising: a second substrate comprising a common electrode formed throughout the surface facing the first substrate; and

a liquid crystal layer, comprising a reactive mesogen, wherein the reactive mesogen is disposed between the first substrate and the second substrate and aligns liquid crystal molecules forming the liquid crystal domain.

4. The liquid crystal display device as claimed in claim 1 , wherein the source electrode and the drain electrode are spaced apart from the gate electrode by an insulating layer.

5. The liquid crystal display device as claimed in claim 4 , wherein the gate electrode is formed on the same layer as the first electrode, and comprises a transparent conductive material and a low-resistance metal, stacked together.

6. The liquid crystal display device as claimed in claim 4 , wherein the drain electrode is formed to overlap a portion of the second electrode and is electrically connected to the second electrode and the drain electrode.

7. The liquid crystal display device as claimed in claim 2 , wherein a contact electrode is further formed on the second electrode exposed by the depressed pattern, and comprises the same material as the source electrode and the drain electrode of the thin film transistor.

8. The liquid crystal display device as claimed in claim 1 , wherein the transparent conductive material comprises at least one of indium tin oxide, tin oxide, indium zinc oxide, and indium tin zinc oxide.

9. A liquid crystal display device, comprising:

a first substrate comprising:

a thin film transistor disposed in a non-transmissive region;

a storage capacitor comprising a transparent first electrode, a dielectric film, and a transparent second electrode which are sequentially formed, wherein the transparent first electrode and the transparent second electrode are formed in a transmissive region and wherein at least one of the first electrode and the second electrode extends to the outside of the transmissive region; and

a pixel electrode formed on the transmissive region, wherein the whole of the pixel electrode overlaps with both the first and second electrodes;

a second substrate facing the first substrate and having a common electrode; and

a liquid crystal layer disposed between the first substrate and the second substrate,

wherein the pixel electrode overlaps the common electrode.

10. The liquid crystal display device as claimed in claim 9 , wherein the pixel electrode includes a transparent conductive material and forms capacitance with the storage capacitor by overlapping at least one of the first electrode and the second electrode.

11. The liquid crystal display device as claimed in claim 9 , further comprising a backlight disposed under the first substrate, wherein transmittance of light emitted from the backlight unit and passing through the first substrate, the liquid crystal layer, and the second substrate within the transmissive region is 80% to 99.5%.

12. The liquid crystal display device as claimed in 9 , wherein the dielectric film comprises at least one of silicon nitride and silicon oxide.

13. The liquid crystal display device as claimed in 12 , wherein the thickness of the first electrode is between about 150 Å and about 1500 Å, the thickness of the insulating layer is between about 400 Å and 6000 Å, and the thickness of the second electrode is between about 150 Å and about 1500 Å.