Diffuser having detachable vanes with positive lock
View Patent ↗A system, in certain embodiments, includes a centrifugal compressor diffuser that includes an elliptical plate including multiple vane receptacles disposed about an axis of the plate and multiple detachable vanes attached to the plate. Each vane receptacle includes a first two dimensional (2D) projection along a plane of the elliptical plate and each detachable vane includes a second two dimensional (2D) projection along a base portion of the vane, where each detachable vane is disposed in a respective vane receptacle with the first and second 2D projections blocking movement of the detachable vane in at least a first axial direction relative to the elliptical plate. In certain embodiments, the first and second 2D projections may include a first tab to fit in a recess between a pair of second tabs, respectively, or vice versa. However, in other embodiments, the first and second 2D projections may include alternative mating surfaces.
1. A system, comprising:
a centrifugal compressor diffuser, comprising:
an elliptical plate comprising a plurality of vane receptacles disposed in the elliptical plate about an axis, wherein each vane receptacle has a first two-dimensional (2D) projection along a plane of the elliptical plate; and
a plurality of detachable vanes attached to the elliptical plate, wherein each detachable vane comprises a cross-sectional profile that varies along a span of the detachable vane, each detachable vane comprises a second two dimensional (2D) projection along a base portion of the respective detachable vane, and each detachable vane is disposed in a respective vane receptacle with the first and second 2D projections blocking movement of the detachable vane in at least a first axial direction relative to the elliptical plate.
2. The system of claim 1 , wherein the first and second 2D projections block movement of the detachable vane in the first axial direction and an opposite second axial direction relative to the elliptical plate.
3. The system of claim 2 , wherein the first 2D projection comprises a first tab that fits in a recess between a pair of second tabs of the second 2D projection, or the second 2D projection comprises the first tab that fits in the recess between the pair of second tabs of the first 2D projection.
4. The system of claim 1 , comprising a blocking structure disposed along a face of the elliptical plate, wherein the blocking structure blocks at least one pair of first and second 2D projections from moving in a second axial direction opposite from the first axial direction.
5. The system of claim 4 , wherein the blocking structure extends along the face of the elliptical plate across the plurality of vane receptacles to block a plurality of pairs of the first and second 2D projections from moving in the second axial direction opposite from the first axial direction.
6. The system of claim 1 , comprising a blocking structure disposed along at least one circumference of the elliptical plate, wherein the plurality of vane receptacles extend through, and are open to, the at least one circumference of the elliptical plate, wherein the blocking structure blocks radial movement of the detachable vanes away from the respective vane receptacles.
7. The system of claim 1 , wherein the elliptical plate comprises an inner circumference, and the plurality of vane receptacles extend through, and are open to, the inner circumference.
8. The system of claim 1 , wherein the elliptical plate comprises an outer circumference, and the plurality of vane receptacles extend through, and are open to, the outer circumference.
9. The system of claim 1 , wherein the elliptical plate is an annular plate having an inner circumference and an outer circumference, and the plurality of vane receptacles are disposed between the inner and outer circumferences.
10. The system of claim 1 , wherein the first and second 2D projections comprise mating tapered surfaces.
11. The system of claim 1 , wherein the first and second 2D projections comprise mating contoured surfaces.
12. The system of claim 1 , wherein each detachable vane is attached to the respective vane receptacle via welds, screws, or dowels.
13. A system, comprising:
a centrifugal compressor diffuser vane, wherein the centrifugal compressor diffuser vane comprises a cross-sectional profile that varies along a span of the centrifugal compressor diffuser vane, the centrifugal compressor diffuser vane comprises a first two dimensional (2D) projection along a base portion, the base portion is configured to mount in a vane receptacle of a diffuser plate having a axis, the first 2D projection is configured to interface with a second 2D projection in the vane receptacle to block movement of the centrifugal compressor diffuser vane through the diffuser plate.
14. The system of claim 13 , comprising the diffuser plate and a plurality of centrifugal compressor diffuser vanes, wherein each centrifugal compressor diffuser vane has one of the first 2D projections, the diffuser plate has a plurality of vane receptacles disposed about the axis, and each vane receptacle has one of the second 2D projections.
15. The system of claim 13 , wherein the first and second 2D projections comprise mating tapered surfaces.
16. The system of claim 13 , wherein the first and second 2D projections comprise mating contoured surfaces.
17. The system of claim 13 , wherein the first and second 2D projections comprise mating stepped surfaces.
18. A system, comprising:
a rotary machine, comprising:
a plate comprising a plurality of vane receptacles disposed in the plate, wherein each vane receptacle has a first two-dimensional (2D) projection along a plane of the plate; and
a plurality of detachable vanes attached to the plate, wherein each detachable vane comprises a second two dimensional (2D) projection along a base portion of the respective detachable vane, and each detachable vane is disposed in a respective vane receptacle with the first and second 2D projections blocking movement of the detachable vane in at least a first axial direction relative to the plate.
19. The system of claim 18 , wherein the first and second 2D projections comprise mating tapered surfaces, mating contoured surfaces, mating stepped surfaces, or a combination thereof.
20. The system of claim 18 , wherein the plate comprises an outer perimeter and an inner perimeter, wherein the plurality of vane receptacles comprise outer edge receptacles open to the outer perimeter, inner edge receptacles open to the inner perimeter, intermediate receptacles between the inner and outer perimeters, or a combination thereof.