Volumetrically oscillating plasma flows
View Patent ↗Volumetrically oscillating plasma flows, the volume of which controllably expands and contracts with time, are disclosed. Volumetrically oscillating plasma flows are generated by providing an energy with a power density that changes with time to the plasma-generating gas to form a plasma flow. The changes in the energy power density result in plasma flow volumetric oscillations. Volumetric oscillations with a frequency of above 20,000 Hz results in ultrasonic acoustic waves, which are known to be beneficial for various medical applications. System for providing volumetrically oscillating plasma flows and a variety of surgical non-surgical applications of such flows are also disclosed.
1. A method of generating a volumetrically oscillating plasma flow using a plasma-generating-device having an outlet, the method comprising:
a. supplying a plasma-generating gas to the plasma-generating device;
b. providing an energy with a power density to the plasma-generating gas to form the plasma flow, wherein the power density changes according to a controlled pattern between a low level and a high level; and
c. discharging from the outlet of the plasma-generating device the plasma flow alternating between
i. a low intensity plasma flow with a temperature at the outlet of at least 10,000 K and occupying a first volume, and
ii. a high intensity plasma flow with a temperature at the outlet of at least 10,000 K above the temperature of the low intensity plasma at the outlet and occupying a second volume larger than the first volume,
wherein volumetric oscillations of the plasma flow due to the discharge of low intensity plasma flow and high intensity plasma flow correlate with the controlled pattern changes between the low level and the high level of the power density of the provided energy.
2. The method of claim 1 , wherein the controlled pattern is a modulated biased pulse wave, wherein a high frequency biased pulse wave is modulated by a low frequency biased pulse wave.
3. The method of claim 2 , wherein the discharged plasma undergoes radial volumetric variations and large-scale axial volumetric variations.
4. The method of claim 2 , wherein the energy is provided by an electric arc passing through the plasma-generating gas.
5. The method of claim 4 further comprising generating an electric current wave, wherein the current changes according to the controlled pattern.
6. The method of claim 5 further comprising monitoring a flow rate of the plasma-generating gas.
7. The method of claim 4 , wherein the electric arc has a low level current of 3-10 A and a high level current of 25-30 A.
8. The method of claim 7 , wherein the frequency of the high-frequency biased pulse wave is 20,000 Hz or above.
9. The method of claim 8 , wherein the duty cycle of the high-frequency biased pulse wave is 0.35-0.65.
10. The method of claim 9 , wherein the frequency of the low-frequency biased pulse wave is 20-100 Hz.
11. The method of claim 10 , wherein the duty cycle of the low-frequency biased pulse wave is 0.05-0.15.
12. The method of claim 11 , wherein the plasma-generating gas is supplied to the plasma-generating device at a flow rate of 0.1-0.6 L/min at room temperature.
13. The method of claim 12 , wherein the discharged plasma undergoes large-scale axial volumetric variations.
14. The method of claim 1 , wherein the controlled pattern is a biased pulse wave.
15. The method of claim 14 , wherein the discharged plasma undergoes radial volumetric variations.
16. The method of claim 14 , wherein the energy is provided by an operational current of an intermittent plasma flow.
17. The method of claim 14 , wherein the energy is provided by an electric arc passing through the plasma-generating gas.
18. The method of claim 17 , wherein the frequency of the biased pulse wave is 2,000 Hz or above.
19. The method of claim 17 , wherein the electric arc has a low level of current of 3-10 A and a high level of current of 25-30 A.
20. The method of claim 19 , wherein the frequency of the biased pulse wave is 20-200 Hz.
21. The method of claim 20 , wherein the duty cycle of the biased pulse wave is 0.05-0.15.
22. The method of claim 21 , wherein the plasma-generating gas is supplied to the plasma-generating device at a flow rate of 0.1-0.6 L/min at room temperature.
23. The method of claim 17 , wherein the frequency of the biased pulse wave is 20,000 Hz or above.
24. The method of claim 23 , wherein the duty cycle of the biased pulse wave is 0.05-0.15.
25. The method of claim 24 , wherein the plasma-generating gas is supplied to the plasma-generating device at a flow rate of 0.1-0.6 L/min at room temperature.
26. The method of claim 17 further comprising generating an electric current wave, wherein the current changes according to the controlled pattern.
27. The method of claim 26 further comprising monitoring a flow rate of the plasma-generating gas.