METHODS AND DEVICES FOR PROCESSING A PRECURSOR LAYER IN A GROUP VIA ENVIRONMENT
Methods and devices for high-throughput printing of a precursor material for forming a film of a group IB-IIIA-chalcogenide compound are disclosed. In one embodiment, the method comprises forming a precursor layer on a substrate, the precursor is subsequently processed in one or more steps in a VIA environment.
1 . A reactor used to react precursor material disposed over a continuous workpiece to form a solar cell absorber, the reactor comprising: a primary gap defined by a peripheral wall; an insert placed within the primary gap, wherein the insert includes a process gap through which the continuous workpiece travels between an entry and an exit of the insert, wherein the process gap is defined by a top wall, a bottom wall and side walls of the insert, wherein the process gap has an aspect ratio between 1:50 and 1:1000, and wherein an inner space exists between at least one of the walls of the insert and at least a portion of the peripheral wall.
2 . The reactor of claim 1 , wherein the at least one gas inlet is connected to the inner space.
3 . The reactor of claim 1 , wherein at least one exhaust opening connects the process gap and the inner space to outside of the reactor.
4 . The reactor of claim 1 , wherein the bottom wall of the insert includes rollers on which the continuous workpiece travels.
5 . The reactor of claim 1 , wherein the entry and the exit of the insert includes sealable doors.
6 . The reactor of claim 4 , wherein the bottom wall of the insert is disposed on a bottom portion of the peripheral wall.
7 . The reactor of claim 1 wherein the insert is made of quartz, graphite or ceramics.
8 . The reactor of claim 7 wherein the peripheral wall is made of stainless steel.
9 . A reactor used to react precursor material disposed over a continuous workpiece to form a solar cell absorber, the reactor comprising: a primary gap defined by a peripheral wall; an insert placed within the primary gap, wherein the insert includes a process gap through which the continuous workpiece travels between an entry and an exit of the of the insert, wherein the process gap is defined by a top wall, a bottom wall and side walls of the insert, wherein the process gap has an aspect ratio between 1:50 and 1:1000, and wherein the bottom wall of the insert includes thereon rollers on which the continuous workpiece travels.
10 . The reactor of claim 9 , wherein at least one exhaust opening connects the process gap to outside of the reactor.
11 . The reactor of claim 9 , wherein the entry and the exit of the insert includes sealable doors.
12 . The reactor of claim 9 , wherein the insert is made of quartz, graphite or ceramics.
13 . The reactor of claim 12 , wherein the peripheral wall is made of stainless steel.