Semiconductor device and manufacturing method thereof
View Patent ↗A semiconductor device includes: a semiconductor substrate having a first surface as a surface on which an element is formed, and a second surface opposite to the first surface; a through hole formed so as to extend through the semiconductor substrate from the first surface to the second surface; an insulating film formed on an inner wall of the through hole; and a conductive portion formed in a space surrounded by the insulating film in the through hole. The insulating film continuously extends on the inner wall of the through hole and on the second surface.
1. A semiconductor device, comprising:
a semiconductor substrate having a first surface as a surface on which an element is formed, and a second surface opposite to the first surface;
a through hole formed so as to extend through the semiconductor substrate from the first surface to the second surface;
an insulating film formed on an inner wall of the through hole; and
a conductive portion formed in a space surrounded by the insulating film in the through hole, wherein
the insulating film continuously extends on the inner wall of the through hole and on the second surface, and
the part of the conductive portion exposed at the second surface does not extend on a region of the insulating film located on the second surface.
2. The semiconductor device of claim 1 , wherein a diameter of the through hole decreases in a direction from the first surface toward the second surface, and the through hole has a smallest diameter at the second surface.
3. The semiconductor device of claim 1 , wherein the through hole has a larger diameter only in a portion near the first surface than in a remaining portion.
4. The semiconductor device of claim 1 , wherein the through hole has a larger diameter on the second surface side than on the first surface side.
5. The semiconductor device of claim 1 , wherein the insulating film continuously extends on the inner wall of the through hole and on the first surface.
6. The semiconductor device of claim 1 , wherein
the insulating film is formed by a first insulating film and a second insulating film, and
the second insulating film continuously extends on the inner wall of the through hole and on the second surface.
7. The semiconductor device of claim 6 , wherein the first insulating film continuously extends on the inner wall of the through hole and on the first surface.
8. The semiconductor device of claim 6 , wherein the conductive portion is formed by a first conductive portion and a second conductive portion.
9. The semiconductor device of claim 8 , wherein the first conductive portion is formed in a space surrounded by the first insulating film in the through hole.
10. The semiconductor device of claim 1 , wherein the conductive portion protrudes from the second surface side.
11. The semiconductor device of claim 1 , wherein
an interlayer insulating film is formed over the first surface of the semiconductor substrate, and
the through hole is formed also in the interlayer insulating film.
12. The semiconductor device of claim 1 , wherein
an interconnect is formed over the first surface of the semiconductor substrate, and
the conductive portion and the interconnect are connected together.
13. The semiconductor device of claim 1 , wherein the part of the conductive portion exposed at the second surface protrudes from the region of the insulating film located on the second surface.
14. The semiconductor device of claim 1 , wherein the conductive portion disposed in the through hole contacts the insulating film formed on the inner wall of the through hole.
15. A method for manufacturing a semiconductor device, comprising the steps of:
(a) forming a through hole so that the through hole extends through a semiconductor substrate that has a first surface as a surface on which an element is formed, and a second surface opposite to the first surface;
(b) forming an insulating film so that the insulting film continuously extends on an inner wall of the through hole and on the second substrate; and
(c) forming a conductive portion in a space surrounded by the insulating film in the through hole, wherein
the part of the conductive portion exposed at the second surface does not extend on a region of the insulating film located on the second surface.
16. The method of claim 15 , wherein the step (b) includes the step of forming the insulating film on the second surface and on the inner wall of the through hole from the second surface side.
17. The method of claim 16 , wherein the step (a) includes the step of forming the through hole so that a diameter of the through hole decreases in a direction from the first surface toward the second surface, and that the through hole has a smallest diameter at the second surface.
18. The method of claim 16 , wherein the step (a) includes the step of forming the through hole so that the through hole has a larger diameter only in a portion near the first surface than in a remaining portion.
19. The method of claim 16 , wherein
the step (a) includes the steps of
(a1) forming, from the first surface side, the through hole so that the through hole extends to an intermediate depth in the semiconductor substrate, and
(a2) thinning the semiconductor substrate from the second surface side to expose a bottom of the through hole, the method further comprising the steps of:
(d) burying a nonmetal material in the through hole between the steps (a1) and (a2); and
(e) removing the nonmetal material from the through hole between the steps (a2) and (b).
20. The method of claim 15 , wherein
the step (a) includes the steps of:
(a1) forming, from the first surface side, the through hole so that the through hole extends to an intermediate depth in the semiconductor substrate, and
(a2) thinning the semiconductor substrate from the second surface side to expose a bottom of the through hole, the method further comprising the step of:
(f) forming, from the first surface side, a first insulating film on the first surface and on the inner wall of the through hole between the steps (a1) and (a2), and
the step (b) includes the step of forming, from the second surface side, a second insulating film on the second surface and on the inner wall of the through hole so that the second insulating film is in contact with the first insulating film, thereby forming the insulating film that is formed by the first insulating film and the second insulating film.
21. The method of claim 20 , further comprising the step of:
(g) increasing a diameter of the through hole from the second surface side between the steps (a2) and (b).
22. The method of claim 20 , further comprising the steps of:
(h) burying a nonmetal material in the through hole between the steps (f) and (a2); and
(i) removing the nonmetal material from the through hole between the steps (a2) and (b).
23. The method of claim 20 , further comprising the step of:
(j) forming a first conductive portion in a space surrounded by the first insulating film in the through hole between the steps (f) and (a2), wherein
the step (c) includes the step of forming a second conductive portion in the space surrounded by the insulating film in the through hole, so that the second conductive portion is in contact with the first conductive portion, thereby forming the conductive portion that is formed by the first conductive portion and the second conductive portion.