Baffle plates for an ultraviolet reactor
View Patent ↗An ultraviolet reactor for treating a fluid. The reactor includes a vessel having an inlet for receiving fluid and an outlet for discharging fluid. The reactor further includes an ultraviolet light source and baffle plates. The baffle plates include holes arranged in a predetermined pattern for providing plug flow in areas in the reactor near the ultraviolet light source.
1. A reactor for treating a fluid, comprising:
a vessel having a first end, an inlet proximate to said first end for receiving fluid and an outlet for discharging fluid, said first end comprising a domed portion;
an ultraviolet light source located within said vessel;
a first baffle plate and a second baffle plate located within said vessel, wherein said first and second baffle plates include holes configured and arranged in a predetermined pattern; and
a diverter plate located on said first baffle plate, wherein said diverter plate is angled relative to said first baffle plate to redirect inlet fluid toward said domed portion of said vessel.
2. The reactor according to claim 1 , wherein an orientation of said diverter plate is adjustable.
3. The reactor according to claim 1 , further comprising side baffle plates constructed and arranged to close gaps between said first baffle plate and an interior wall of said vessel.
4. The reactor according to claim 3 , wherein said reactor includes three side baffle plates.
5. The reactor according to claim 1 , wherein said predetermined pattern of holes in said first and second baffles is configured to provide plug flow of said fluid.
6. The reactor according claim 1 , wherein said diverter plate further comprises a threaded rod configured to provide depth adjustment relative to said first baffle plate.