Light emitting device, electronic device, and method of manufacturing light emitting device
View Patent ↗A light emitting device having at least one pixel having a light emitting element includes a substrate, a partition wall formed over the substrate, and a luminous layer of the light emitting element, where the luminous layer is formed in at least one groove partitioned by the partition wall. The partition wall has a plurality of first partition walls and at least one second partition wall. Each of the first partition walls is extending in the first direction and the second partition wall is formed to extend in a second direction orthogonal to the first direction and connect end portions of the plurality of first partition walls. A lyophobic degree of the second partition wall is lower than that of a center region between both ends of each of the first partition walls in the first direction.
1. A method of manufacturing a light emitting device having at least one pixel having a light emitting element, the method comprising:
a partition-wall forming step of forming a plurality of first partition walls in such a way as to extend in a first direction over a substrate and partition a luminous-layer forming region where a luminous layer of the light emitting element is to be formed, and at least one second partition wall in such a way as to extend in a second direction orthogonal to the first direction and connect end portions of the plurality of first partition walls;
a lyophobic-degree adjusting step of adjusting lyophobic degrees of the first partition walls and the second partition wall such that the lyophobic degree of the second partition wall becomes lower than that of a center region between both ends of each of the first partition walls in the first direction;
wherein the lyophobic-degree adjusting step includes a first plasma irradiation step and a second plasma irradiation step;
wherein the first plasma irradiation step includes a step of moving a spot type plasma irradiation unit, which locally discharges a plasma jet, along the first and second partition walls while discharging the plasma jet containing CF 4 plasma from the spot type plasma irradiation unit, thereby irradiating the CF 4 plasma onto each of the first and second partition walls selectively to vest each of the first partition walls and the second partition wall with a lyophobic property; and
wherein the second plasma irradiation step includes a step of moving the spot type plasma irradiation unit along the second partition wall while discharging the plasma jet containing oxygen plasma from the plasma irradiation unit, thereby irradiating the oxygen plasma onto the second partition wall selectively to lyophilize the second partition wall.
2. The method according to claim 1 , further comprising a third plasma irradiation step of irradiating oxygen plasma onto a surface of the luminous-layer forming region, each of the first partition walls, and the second partition wall to lyophilize the surface of the luminous-layer forming region, each of the first partition walls, and the second partition wall;
wherein the third plasma irradiation step is executed prior to the first plasma irradiation step.
3. A method of manufacturing a light emitting device having at least one pixel having a light emitting element, the method comprising:
a partition-wall forming step of forming a plurality of first partition walls in such a way as to extend in a first direction over a substrate and partition a luminous-layer forming region where a luminous layer of the light emitting element is to be formed, and at least one second partition wall in such a way as to extend in a second direction orthogonal to the first direction and connect end portions of the plurality of first partition walls; and
a lyophobic-degree adjusting step of adjusting lyophobic degrees of the first partition walls and the second partition wall such that the lyophobic degree of the second partition wall becomes lower than that of a center region between both ends of each of the first partition walls in the first direction;
wherein the lyophobic-degree adjusting step includes a first plasma irradiation step and a second plasma irradiation step;
wherein the first plasma irradiation step includes a step of irradiating oxygen plasma onto a surface of the substrate, each of the first partition walls, and the second partition wall to lyophilize the surface of the substrate, each of the first partition walls, and the second partition wall; and
wherein the second plasma irradiation step includes a step of moving a spot type plasma irradiation unit, which locally discharges a plasma jet, along a region including at least the center region of each of the first partition walls while discharging the plasma jet containing CF 4 plasma from the spot type plasma irradiation unit, thereby irradiating the CF 4 plasma selectively onto the region including at least the center region of each of the first partition walls to vest the region including at least the center region of each of the first partition walls with a lyophobic property.