The present invention is to provide a TiO 2 —SiO 2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO 2 -containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
1. A TiO 2 -containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C., falling within a range of from 40 to 110° C., and an average coefficient of linear thermal expansion in a temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
2. The TiO 2 -containing silica glass according to claim 1 , wherein a TiO 2 content is from 7.5 to 12% by mass.
3. The TiO 2 -containing silica glass according to claim 1 , wherein a temperature width, in which a coefficient of linear thermal expansion becomes 0±5 ppb/° C., is 5° C. or greater.
4. The TiO 2 -containing silica glass according to claim 1 , wherein an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., is −120 ppb/° C. or higher.
5. The TiO 2 -containing silica glass according to claim 1 , which is free of an inclusion.
6. The TiO 2 -containing silica glass according to claim 1 , wherein a fluctuation of the fictive temperature is within 50° C.
7. An optical member for EUV lithography, comprising the TiO 2 -containing silica glass according to claim 1 .
8. The TiO 2 -containing silica glass according to claim 1 , wherein the temperature width, in which a coefficient of linear thermal expansion becomes 0±5 ppb/° C., is 8° C. or greater.
9. The TiO 2 -containing silica glass according to claim 1 , wherein the TiO 2 content is from 8.0 to 12% by mass.
10. The TiO 2 -containing silica glass according to claim 1 , wherein the fictive temperature is 900° C. or lower.